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1 MeV W ë sV R Ë Ä k È  º MOS} º 8 ý  ¹ ÅM X ì Ä — ¤V R Ë; c Q V À W ¥ „ ÇÊ Ý

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(1)

1 MeV W ë sV R Ë  Ä k È  º  MOS} º 8 ý  ¹ ÅM X ì Ä — ¤V R Ë; c Q V  À W ¥ „ ÇÊ Ý

™

»r )¬ £ · ™ »ª <‡ Ú ·  6 Ò` 9 Q  · { ¡Š û B+ ä 

é ß

–² D G @ /† < Ɠ § 6 £ x6   xÓ ü t o † < Æõ , " fÖ  ¦ 140-714 (2003¸   7 Z 4 10{ 9  ~ à Î6 £ §)

í ß

– o} Œ •_  ¿ ºa  85 ˚ A s “ ¦ > s à Ô_  ; Ÿ ¤ õ  U  ´s  y Œ •y Œ • 10 µmü < 5 µm“   NMOS, PMOS ™ è 

\

 € ª œ$ í  c ” _  › ¸ | ¾ Ó`  ¦    or & €  " f „  l & h  : £ ¤$ í    o\  ¦ ƒ  ½ ¨ % i  . € ª œ$ í  c ” _  \  -t   H 1 MeV s  9 › ¸ | ¾ ӓ É r 0.1, 0.5, 1, 5, 10, 50 Mrad s  . › ¸ | ¾ Ó\     ë  H) 3 „  · ú š, off-current, on-current, Gm(transconductance) 1 p x_  „  l & h  : £ ¤$ í \     o   z Œ ¤ . NMOS_   â Ä º › ¸ | ¾ Ós  7 £ x † < Ê\     ë

 H) 3 „  · ú šs  y Œ ™™ è   1 Mrad s Ê ê\   H  r  7 £ x    H rebound ‰ & ³ © œs  › ' a¹ 1 Ï÷ &% 3  . Off-current  H

›

¸ | ¾ Ós  7 £ x † < Ê\     / å L  y  7 £ x    1 Mrad s Ê ê\   H  r  y Œ ™™ è   H ‰ & ³ © œs  › ' a¹ 1 Ï÷ &% 3  .

On-current ü < Gm“ É r › ¸ | ¾ Ó_  7 £ x \     t 5 Å q& h Ü ¼– Ð y Œ ™™ è % i  . PMOS_   â Ä º › ¸ | ¾ Ós  7 £ x † < Ê

\

    ë  H) 3 „  · ú š_  ] X @ /° ú כs  t 5 Å q& h Ü ¼– Ð 7 £ x  % i “ ¦ off-current_     o  H NMOS \  q  # Œ B Ä º  Œ •

€

Œ ¤ . On-currentü < transconductance  H › ¸ | ¾ Ó_  7 £ x \     t 5 Å q& h Ü ¼– Ð y Œ ™™ è % i   H X < 1 Mrad s  Ê

ê\   H NMOS \  q  # Œ PMOS_  y Œ ™™ è; Ÿ ¤ s  ß ¼>    z Œ ¤ .

PACS numbers: 07.89, 61.80, 13.85.T, 87.53.P

Keywords: Radiation effect, Cosmic ray, MOSFET, Threshold voltage, Transconductance, On-current, Off- current, Degradation

I. " e  ] Ø

þ

j  H ² D G ? /\ " f• ¸ 0 A$ í `  ¦ s 6   xô  Ç Ä ºÅ Ò~ ½ Ó ‚   ¨ 8 Š â x 9 ì

 r$ 3 \  @ /ô  Ç ƒ  ½ ¨ › ' a d ” s  ÷ &“ ¦e ”   [1]. ì ø Í· ú ˜E $ ™@ /\  ¦ q  2

Ÿ

©ô  Ç t ½ ¨C • ¸\ " f î  r6   x ÷ &  H “  / B N0 A$ í “ É r “ ¦\  -t  „   { 9

  x 9 l   ~ ½ Ó ‚   ¨ 8 Š â \  ” ¸Ø  ¦ ÷ &# Qe ”  . s – Ð “  K  “   /

B

N0 A$ í _  Ù þ ˜d ”  Ҿ ¡ §“   ì ø ͕ ¸^ ‰ ™ è   H TID(Total Ionizing Dose) ´ òõ , SEE(Single Event Effect)\  _ K  ™ è _  „   l

& h  : £ ¤$ í s  \ P  o÷ &   š ¸1 l x Œ •`  ¦ { 9 Ü ¼~  ´ à º e ”   [2–4].

¢

¸ " é ¶  § 4  µ 1 τ  ™ è\ " f î  r6   x ÷ &  H l l   “ ¦\  -t _  { 9  

\

 ¦  6   x   H _ « Ñl l \  ? / © œ ) a ì ø ͕ ¸^ ‰ ™ è  % i r  “ ¦\ 



-t  „  { 9   x 9 ~ ½ Ó ‚  \  ” ¸Ø  ¦ ÷ &% 3 `  ¦ M : „  l & h  : £ ¤$ í s

    oô  Ç . s  Qô  Ç ¨ 8 Š â \   © œl & h Ü ¼– Ð ” ¸Ø  ¦ ÷ &% 3 `  ¦  â Ä

º TID ´ òõ  ×  æ כ ¹ >    è ß – . : £ ¤ y  V T (threshold voltage, ë  H) 3 „  · ú š), I ON (on-current), I OF F (off-current) x 9

Gm(transconductance) 1 p x_     o ¿ º× ¼ Q”   . s 



Qô  Ç : £ ¤$ í    o  H ™ è _  î ß –& ñ  ) a 1 l x Œ •`  ¦ ~ ½ ÓK  “ ¦ ™ èq 

„ 

§ 4 `  ¦ Z  } s  9 l l _  à º" î `  ¦ é ß –» ¡ ¤ r v   H é ß –& h s  e ”  .

‘

: r ƒ  ½ ¨\ " f  H Ä ºÅ Ò~ ½ Ó ‚   ¨ 8 Š â \ " f MOS(Metal Oxide Semiconductor) à Ô ½ ™t Û ¼' _  „  l & h  : £ ¤$ í    o\ 

E-mail: [email protected]

œ

í& h `  ¦ ´ ú Æ Ò% 3  . t  © œ\ " f Ä ºÅ Ò~ ½ Ó ‚   ´ òõ \  ¦ Å Òl  0 A K

 1 MeV € ª œ$ í  c ” _  › ¸ | ¾ Ó`  ¦    or &  €  " f NMOS x 9

PMOS ™ è _  „  l & h  : £ ¤$ í    o\  ¦ 8 £ ¤& ñ % i  .

II. ÷ m Ç ] M ö

Ä

ºÅ Ò~ ½ Ó ‚  õ  ° ú  “ É r “ ¦\  -t  „  { 9   MOS ™ è 

\

 p u   H % ò † ¾ Ó`  ¦ › ¸  l  0 A # Œ NMOS x 9 PMOS ™ è



\  ¦ ï  r q  % i  . ™ è _  1 l x Œ •„  · ú š“ É r 3.3 V s  9 > s à Ô í

ß – o} Œ •_  ¿ ºa   H 85 ˚ A s  . > s à Ô_  ; Ÿ ¤“ É r 10 µm, U  ´s 



 H 5 µm – Ð / B N ÷ &% 3 “ ¦ J v t  ÷ &t  · ú §“ É r J ?s ( + þ AI 

–

Ð z  ´+ « >\   6   x % i  . t ½ ¨C • ¸\ " f î  r6   x ÷ &  H “  / B N0 A

$ í

_   â Ä º “ ¦\  -t _  „  { 9   x 9 l   ~ ½ Ó ‚  \  ” ¸Ø  ¦

÷

&# Q e ”   H  כ `  ¦ y Œ ™î ß – # Œ › ¸ ‚  " é ¶“ É r 1 MeV_  € ª œ$ í  c ” 

`

 ¦  6   x # Œ  © œ“ : r \ " f ™ è \   s # QÛ ¼\  ¦ “   t  · ú §

“ É

r  © œI – Ð › ¸  % i  . y Œ • r « Ñ_  › ¸ | ¾ ӓ É r 0.1, 0.5, 1, 5, 10, 50 Mrad(Si) s  . „  l & h : £ ¤$ í _  8 £ ¤& ñ “ É r HP4155A semiconductor parameter analyzer\  ¦ s 6   x # Œ € ª œ$ í  c ” 

›

¸  ¢ - a « Ñ Ê ê\   © œ“ : r \ " f 8 £ ¤& ñ % i  . ü @ Җ РÒ' _  „   l

& h  F g† < Æ& h  % ò † ¾ Ó`  ¦ þ j™ è o l  0 A # Œ · ú ˜À Òp ³ o u Ü ¼– Ð 

`

‚  ) a  © œ  ? /\ " f 8 £ ¤& ñ `  ¦ ”  ' Ÿ  % i  .

-157-

(2)

Õ

ªa Ë > 1. (a) 1 MeV € ª œ$ í  c ”  › ¸ \    É r NMOS_  I ds - V gs : £ ¤$ í / B G‚   (V ds = 3.3 V). (b) 1 MeV € ª œ$ í  c ”  › ¸ \ 



 É r PMOS_  I ds -V gs : £ ¤$ í / B G‚   (V ds = −3.3 V).

III. + s ÇÊ Ý õ m Í w в  o

Õ

ªa Ë > 1“ É r 1 MeV € ª œ$ í  c ”  › ¸ \    É r I ds -V gs : £ ¤

$ í

/ B G‚  s  . Õ ªa Ë > 1(a)ü < Õ ªa Ë > 1(b)  H y Œ •y Œ • NMOSü <

PMOS ™ è \  K { © œ  9 › ¸ | ¾ ӓ É r 0.1, 0.5, 1, 5, 10, 50 Mrad(Si) s  . NMOS_   â Ä º V ds = 3.3 V s “ ¦ V gs   H 0 V \ " f 3.3 V t     or (   . PMOS_   â Ä º V ds =

−3.3 Vs  9 V gs   H 0 V \ " f −3.3 V t     or (   . Õ ª a Ë

> 1(a)_  NMOS_  I ds -V gs : £ ¤$ í / B G‚  \ " f  H ‰ & ³$ ô  Ç off- current_     o ˜ Ðs “ ¦ e ” Ü ¼ 9 Õ ªa Ë > 1(b)_  PMOS_  I ds -V gs : £ ¤$ í / B G‚  “ É r negative shift\  ¦ “ ¦ e ”  . s  Qô  Ç

 

 o\  @ /ô  Ç  8  [ jô  Ç ì  r$ 3 “ É r Õ ªa Ë > 2 ∼ 4\ " f “ ¦¹ 1 Ï % i 



.

Õ

ªa Ë > 2  H 1 MeV € ª œ$ í  c ”  › ¸ \    É r NMOS ü <

PMOS_  ∆V T (ë  H) 3 „  · ú š    o)\  ¦    · p . ∆V T   H € ª œ

$ í

 c ”  › ¸ \  _ K  µ 1 ÏÒ q t ) a ∆Q ot ( > s à Ôí ß – o} Œ • à Ôê Á œ„  

, gate oxide trap charge)ü < ∆Q it ( > €   à Ôê Á œ„   , in- terface trap charge)_  l # Œ\  _ K   A ü < ° ú  s  ³ ð‰ & ³ ) a

Õ

ªa Ë > 2. 1 MeV € ª œ$ í  c ”  › ¸ \    É r NMOS ü < PMOS _

 ë  H) 3 „  · ú š   o.



 [3].

∆V T = − 4Q ot

C ox − 4Q it

C ox

. (1)

#

Œl " f C ox   H é ß –0 A€  & h { © œ í ß – o} Œ •_  & ñ „  6   x| ¾ Ó`  ¦    · p



. ¸ ú ˜· ú ˜ 9”    ü < ° ú  s  í ß – o} Œ • à Ôê Á œ„     H € ª œ_  ° ú כ`  ¦

° ú

  H ì ø ̀  \  > €   à Ôê Á œ„     H NMOS_   â Ä º\   H 6 £ §_ 

° ú

כ`  ¦ PMOS_   â Ä º\   H € ª œ_  ° ú כ`  ¦ y Œ •y Œ • ° ú   H   [5]. Õ ª a Ë

> 2\ " f ˜ Ð1 p w s  NMOS_   â Ä º\   H 1 Mrad Â Ò   H  t  _  › ¸ | ¾ Ó\ " f  H ë  H) 3 „  · ú šs  y Œ ™™ è   Õ ª s  © œ_  › ¸



| ¾ Ó\ " f  H  r  7 £ x    H X <, s   H 1 Mrad Â Ò   H  t   H

€

ª œ_  ° ú כ`  ¦ ° ú   H í ß – o} Œ • à Ôê Á œ„    Ä º[ j “ ¦ Õ ª s  © œ_ 

›

¸ | ¾ Ó\ " f  H 6 £ §_  ° ú כ`  ¦ ° ú   H > €   à Ôê Á œ„   _  µ 1 ÏÒ q ts  Ä

º[ j # Œ      H rebound‰ & ³ © œÜ ¼– Ð K $ 3  ) a   [2,4]. ì ø Í

€ 

\  PMOS_   â Ä º\   H í ß – o} Œ • x 9 > €   à Ôê Á œ„    — ¸

¿

º € ª œ_  ° ú כ`  ¦ t Ù ¼– Ð ë  H) 3 „  · ú šs  6 £ §_  ~ ½ ӆ ¾ ÓÜ ¼– Ð > 5 Å q

# Œ 7 £ x  >  ÷ &  H X <, 1 Mrad\  ¦ t  €  " f Õ ª    o; Ÿ ¤ s  NMOS \  q  # Œ ß ¼>  Z O # Qt >   ) a   [6,7].

Õ

ªa Ë > 3“ É r 1 MeV € ª œ$ í  c ”  › ¸ \    É r NMOS I ON x 9 Gm_  q  Õ ªo “ ¦ PMOS I ON x 9 Gm_  q s  . NMOS _

 I ON “ É r V gs = 3.3 V, V ds = 3.3 V \ " f_  „  À Ó° ú כs  9, PMOS_  I ON “ É r V gs = −3.3 V, V ds = −3.3 V\ " f_ 

„ 

À Ó° ú כs  . I ON (before) ü < I ON (after)  H y Œ •y Œ • € ª œ$ í  c ” 

›

¸  „  õ  Ê ê_  I ON `  ¦    · p . Ÿ í o © œI \ " f_  „  À Ó I ON õ  Gm“ É r s  © œ& h “    â Ä º  A  d ” õ  ° ú  s    è ­ q à º e ”

 .

I ON = [W/(2L)]µC ox (V g − V T ) 2 , (2)

Gm = (∂I d /∂V g ) V

d

=const = (W/L)µC ox (V g − V T ). (3)

(3)

Õ

ªa Ë > 3. 1 MeV € ª œ$ í  c ”  › ¸  „  Ê ê_  NMOS x 9 PMOS I ON õ  Gm_  q .

#

Œl " f W ü < L“ É r > s à Ô_  ; Ÿ ¤ õ  U  ´s , µ  H H o # Q_  s  1

l

x • ¸, C ox   H é ß –0 A€  & h { © œ í ß – o} Œ •_  & ñ „  6   x| ¾ Ós   [8, 9].

d ”

(2)\ " fü < ° ú  s  I ON “ É r µ ü < (V g -V T ) 2 _  Y  L \  _ ” > r 

“

¦, d ” (3)\  _  # Œ Gm“ É r µ ü < (V g -V T )_  Y  L \  _ ” > r 

>

  ) a  . Õ ªa Ë > 3\ " f ˜ Ð1 p w s  NMOS I ON _   â Ä º 10 Mrad



t   H ¢ - aë ß –y  y Œ ™™ è   H  ⠆ ¾ Ós  ˜ Ðs  9, 50 Mrad\ " f  H /

å

L  y  y Œ ™™ èô  Ç . s   H 10 Mrad  t   H > €  à Ôê Á œ\  _  K

 G V , „   _  s 1 l x • ¸ q 2 Ÿ ¤ €  •ç ß – y Œ ™™ è  ) a  © œI s t ë ß – [10] ë  H) 3 „  · ú šs  y Œ ™™ è÷ &# Q e ”   H  © œI s Ù ¼– Ð s  ¿ º ´ òõ 

 × ¼Y U“   „  À Ó\  4 Ÿ ¤½ + Ë& h Ü ¼– Ð p u   H % ò † ¾ ÓÜ ¼– Ð K $ 3  ) a



. 50 Mrad_   â Ä º\   H s 1 l x • ¸ ß ¼>  y Œ ™™ è  ) a  © œI \ " f ë

 H) 3 „  · ú š % i r  × ¼Y U“   „  À Ó\  Ô  ¦ o ô  Ç % ò † ¾ Ó`  ¦ p u Ù ¼– Ð NMOS I ON s  / å L y  y Œ ™™ è >   ) a  . PMOS I ON _   â Ä º\ 



 H ë  H) 3 „  · ú š x 9 > €   à Ôê Á œ„   \  _ ô  Ç s 1 l x • ¸ › ¸ | ¾ Ó

\

    > 5 Å q # Œ PMOS I ON \  Ô  ¦ o ô  Ç % ò † ¾ Ó`  ¦ Å ÒÙ ¼– Ð PMOS I ON s  > 5 Å q # Œ y Œ ™™ è  9, Õ ª    o; Ÿ ¤ s  NMOS I ON \  q  >  ß ¼>    è ß – .

Gm“ É r > €  à Ôê Á œ„   _  % ò † ¾ Ó`  ¦ ~ à ÎÜ ¼Ù ¼– Ð NMOS_   â Ä

º > €  à Ôê Á œ„   _  % ò † ¾ Ós  & t   H 1 Mrad s  © œ_  › ¸ 

Õ

ªa Ë > 4. 1 MeV € ª œ$ í  c ”  › ¸ \    É r NMOS x 9 PMOS _

 I OF F _  q .

|

¾ Ó\ " f Gm_  y Œ ™™ è[ j S X ‰ “  ÷ & 9 PMOS\ " f  H Ë ¨ï  r y  y

Œ ™™ è   H — ¸_ þ v`  ¦ ˜ Ðs “ ¦ e ”  . PMOS  H Gm_  y Œ ™™ èÖ  ¦ õ

 € ª œ$ í  c ”  › ¸ „  Ê ê_  I ON _  y Œ ™™ èÖ  ¦ s  NMOS˜ Ð   8 ß

¼>       H X < 1 Mrad s  © œ_  › ¸ | ¾ Ó\ " f  H NMOS _

 ë  H) 3 „  · ú š  r4 Ÿ ¤ q Ö  ¦ ˜ Ð  PMOS_  › ¸ | ¾ Ó 7 £ x \   

 É

r ë  H) 3 „  · ú š  © œ5 p x q Ö  ¦ s  Z  } Ü ¼Ù ¼– Ð PMOS I ON _  y Œ ™™ èÖ  ¦ s

  8 ß ¼>    è ß – . s ü < ° ú  “ É r I ON õ  Gm_  y Œ ™™ è  H ™ è



_  1 l x Œ •5 Å q • ¸\  ¦ y Œ ™™ èr v    Ô  ¦î ß –& ñ ô  Ç 1 l x Œ •`  ¦ { 9 Ü ¼~  ´ Ã

º e ”   H X <, ’  ø @$ í 8 £ ¤€  \ " f PMOS_  $ í 0 p x $    H B Ä º d ”

y Œ • >   ) a  .

Õ

ªa Ë > 4  H 1 MeV € ª œ$ í  c ”  › ¸ \    É r NMOS I OF F _  q

 x 9 PMOS I OF F _  q s  . NMOS I OF F   H V gs = 0 V, V ds = 3.3 V \ " f_  „  À Ó° ú כs  9, PMOS I OF F   H V gs = 0 V, V ds = −3.3 V\ " f_  „  À Ó° ú כs  . I OF F (before) ü <

I OF F (after)  H y Œ •y Œ • € ª œ$ í  c ”  › ¸  „  õ  Ê ê_  I OF F \  ¦  

 · p . NMOS_   â Ä º › ¸ | ¾ Ós  7 £ x † < Ê\     ‰ & ³$ ô  Ç I OF F _     o ˜ Ðs “ ¦ e ”  . € ª œ$ í  c ”  › ¸  „  õ  q “ § 

#

Œ þ j@ / €  • 2,000C \  s Ø Ô  H I OF F _     o 1 Mrad\ " f

› '

a¹ 1 Ï ÷ & 9 Õ ª s  © œ_  › ¸ | ¾ Ó\ " f  r  y Œ ™™ èô  Ç . I OF F _  /

å

L  ô  Ç 7 £ x   H Õ ªa Ë > 5ü < ° ú  s  ™ è ç ß – ] X ƒ  `  ¦ 0 AK  + þ A$ í  ) a

€ 9

× ¼í ß – o} Œ • % ò % i \  € ª œ_  à Ôê Á œ„    » ¡ ¤& h ÷ &# Q µ 1 ÏÒ q t   H l

Ò q t& h “   ¾ º[ O „  À Ó ‰ & ³ © œs  Å Òכ ¹ô  Ç " é ¶ “  Ü ¼– Ð · ú ˜ 94 R e ” 



 [11]. s ü @\ • ¸ Pompl [12] 1 p x s  ƒ  ½ ¨ô  Ç > s à Ôü < × ¼ Y

U“   ×  æ^ o ? Òì  r \  + þ A$ í ÷ &  H SBD(Soft BreakDown): Ÿ x – Ð

\

 _ ô  Ç GIDL(Gate Induced Drain Leakage)_  l # Œü <, Scarpa [13] 1 p x s  ƒ  ½ ¨ô  Ç & ñ / B N à ÔA i ç \  _ K  Ä »• ¸÷ &  H „  



à Ôê Á œ µ 1 ÏÒ q t\  _ ô  Ç „    # Q} Û ¼w × ¼ ' V , a A 1 p x s  { 9 Â Ò l

# Œô  Ç “ ¦ · ú ˜ 94 R e ”  . PMOS_   â Ä º\   H € 9 × ¼í ß – o} Œ •

% ò

% i \  € ª œ_  à Ôê Á œ„    » ¡ ¤& h ÷ & 8 • ¸ ¾ º[ O „  À Ó_   ⠖ Ð

 + þ A$ í ÷ &t  · ú §Ü ¼Ù ¼– Ð › ¸ | ¾ Ós  7 £ x   8 • ¸ I OF F _ 

Õ

ªa Ë > 5. € 9 × ¼í ß – o} Œ •% ò % i \  + þ A$ í  ) a à Ôê Á œÜ ¼– Ð “  ô  Ç l

Ò q t& h “   ¾ º[ O „  À Ó_  > h¥ Æ • ¸.

(4)

 

 o ß ¼>     t  · ú §>   ) a  . ¢ ¸ô  Ç ë  H) 3 „  · ú š_     o

•

¸ I OF F \   H % ò † ¾ Ó`  ¦ p u >  ÷ &  H X < 1 Mrad s Ê ê_  › ¸



| ¾ Ó\ " f ë  H) 3 „  · ú šs   © œ ± ú  4 R e ” Ü ¼Ù ¼– Ð I OF F  þ j

@

/u \  ¦ ˜ Ðs “ ¦ e ”  . 1 Mrad s Ê ê_  › ¸ | ¾ Ó\ " f  H > €   à

Ôê Á œ„   _  µ 1 ÏÒ q ts   8 Ä º[ j Ù ¼– Ð ë  H) 3 „  · ú šs   r  7 £ x

 >  ÷ &“ ¦ ¢ ¸ s  Qô  Ç > €  à Ôê Á œ„    € 9 × ¼í ß – o} Œ •% ò % i 

\

 + þ A$ í ÷ &% 3 ~   € ª œ_  à Ôê Á œ„   \  ¦ % 3 ] j   H % i ½ + É`  ¦ > 

÷

&Ù ¼– Ð  r  I OF F  y Œ ™™ è >   ) a  . ì ø ̀  \  PMOS_   â Ä

º I OF F _     o ; Ÿ ¤ s  NMOS\  q  # Œ Á ºr ½ + É & ñ • ¸– Ð  Œ •

>

      H X <, PMOS_  ë  H) 3 „  · ú šs  NMOS\  q K  q 

“

§& h  Z  }`  ¦ ÷  rë ß –  m   › ¸ | ¾ Ó_  7 £ x \    É r ë  H) 3 „  · ú š _  t 5 Å q& h “   7 £ x \  _ K  I OF F _     o p p ô  Ç  כ Ü ¼– Ð

˜

Г   . : £ ¤ y  NMOS_   â Ä º\  e ” # Q" f s ü < ° ú  “ É r I OF F _ 

 

 o  H NMOS ™ è _  off1 l x Œ •\   H % ò † ¾ Ó`  ¦ z 5 g @ /l  © œ I

\ " f Ô  ¦€ 9 כ ¹ >  „  § 4 `  ¦ ™ è— ¸r v  9  â Ä º\     ™ è



_  š ¸1 l x Œ •`  ¦ Ä »• ¸½ + É Ã º• ¸ e ”  .

IV. + s Ç Â ] Ø

í

ß – o} Œ •_  ¿ ºa  85 ˚ A s “ ¦ > s à Ô_  ; Ÿ ¤ õ  U  ´s  y Œ • y

Œ • 10 µmü < 5 µm“   NMOS, PMOS ™ è \  1 MeV € ª œ$ í



c ” `  ¦ › ¸  # Œ(0.1, 0.5, 1, 5, 10, 50 Mrad) „  l & h  : £ ¤

$ í

   o\  ¦ ƒ  ½ ¨ % i  .

1. ë  H) 3 „  · ú š: NMOS_   â Ä º 1 Mrad Â Ò   H  t   H ë  H) 3 

„ 

· ú šs  y Œ ™™ è   Õ ª s  © œ_  › ¸ | ¾ Ó\ " f  H  r  7

£

x    H rebound‰ & ³ © œs    è ß – . s   H 1 Mrad Â

Ò   H  t   H € ª œ_  ° ú כ`  ¦ ° ú   H í ß – o} Œ •à Ôê Á œ„    Ä º [

j “ ¦ Õ ª s  © œ_  › ¸ | ¾ Ó\ " f  H 6 £ §_  ° ú כ`  ¦ ° ú   H > 

€ 

à Ôê Á œ„   _  µ 1 ÏÒ q ts  Ä º[ j l  M :ë  H s  . ì ø ̀  \  PMOS_   â Ä º\   H í ß – o} Œ • x 9 > €  à Ôê Á œ„    — ¸

¿

º € ª œ_  ° ú כ`  ¦ t Ù ¼– Ð à Ôê Á œ_  7 £ x \     ë  H) 3 „  

·

ú šs  6 £ §_  ~ ½ ӆ ¾ ÓÜ ¼– Ð > 5 Å q # Œ 7 £ x  “ ¦, 1 Mrad\  ¦ t

 €  " f Õ ª    o; Ÿ ¤ s  NMOS\  q  # Œ B Ä º ß ¼ .

2. On-current: I ON “ É r (V g -V T ) 2 õ  s 1 l x • ¸ µ\  4 Ÿ ¤

½ +

Ë& h Ü ¼– Ð % ò † ¾ Ó`  ¦ ~ à ΍  H  . NMOS_   â Ä º\   H 10 Mrad  t   H > €  à Ôê Á œ\  _ K  s 1 l x • ¸ q 2 Ÿ ¤ y Œ ™

™

è  ) a  © œI s t ë ß – V T % i r  y Œ ™™ è © œI \  e ” Ü ¼Ù ¼– Ð I ON _  y Œ ™™ è; Ÿ ¤ s  q “ §& h   Œ •Ü ¼ 9 50 Mrad\ " f  H s  1

l

x • ¸  8¹ ¡ ¤ y Œ ™™ è “ ¦ V T  7 £ x ô  Ç  © œI \  e ” Ü ¼Ù ¼

–

Ð I ON _  y Œ ™™ è; Ÿ ¤ s  ß ¼ . PMOS_   â Ä º\   H s 1 l x

•

¸_  y Œ ™™ èü < |V T |_  > 5 Å q& h “   7 £ x – Ð I ON s  > 5 Å q

# Œ y Œ ™™ è  9, Õ ª ; Ÿ ¤ s  NMOS\  q  # Œ ß ¼ .  



" f PMOS_  $ í 0 p x $    H ™ è _  1 l x Œ •5 Å q • ¸, ’  ø @

•

¸ 1 p x \  B Ä º d ” y Œ •ô  Ç % ò † ¾ Ó`  ¦ z } 9  à º e ”  .

3. à Ô ½ ™Û ¼†  ü ‡  Û ¼: > €  à Ôê Á œ“ É r NMOS, PMOS — ¸¿ º _

 Gm`  ¦ y Œ ™™ èr †   . NMOS_   â Ä º 10 Mrad  t

  H ¢ - aë ß –ô  Ç y Œ ™™ è › ' a¹ 1 Ï÷ &t ë ß – 50 Mrad\ " f  H /

å

L  y  y Œ ™™ è  9, PMOS\ " f  H 1 Mrad  t   H ¢ - a ë

ß –y  y Œ ™™ è t ë ß – s Ê ê / å L  y  y Œ ™™ è  9 y Œ ™™ è; Ÿ ¤ s  NMOS \  q  # Œ ß ¼>    z Œ ¤ .

4. Off-current: NMOS_   â Ä º ™ è ç ß – ] X ƒ  `  ¦ 0 AK  + þ A

$ í

ô  Ç € 9 × ¼í ß – o} Œ • % ò % i \  € ª œ_  à Ôê Á œ„    » ¡ ¤& h ÷ &

9 s – Г  K  l Ò q t& h Ü ¼– Ð ¾ º[ O „  À Ó + þ A$ í ÷ &>   ) a



. ¢ ¸ ë  H) 3 „  · ú š_  7 £ xy Œ ™\  _ ô  Ç 4 Ÿ ¤½ + Ë& h “   ´ òõ – Ð “   K

 › ¸ | ¾ Ó\    É r off-current_     o; Ÿ ¤ s  B Ä º & t 

>

  ) a  (1 Mrad\ " f €  • 2,000C _  7 £ x ). PMOS_ 

 â

Ä º\   H € 9 × ¼í ß – o} Œ • % ò % i \  € ª œ_  à Ôê Á œ„    » ¡ ¤

&

h ÷ & 8 • ¸ ¾ º[ O „  À Ó_   ⠖ Ð + þ A$ í ÷ &t · ú §“ ¦ ë  H) 3 

„ 

· ú šs  t 5 Å q& h Ü ¼– Ð 7 £ x † < ÊÜ ¼– Ð “  K  › ¸ | ¾ Ó\   



 off-current_   H    o › ' a¹ 1 Ï÷ &t  · ú §€ Œ ¤ .

P c

p 8 ý ò k >

s

 ƒ  ½ ¨  H 2002† < Ƹ  • ¸ é ß –² D G @ /† < Ɠ § @ /† < ƃ  ½ ¨q (ƒ  ½ ¨

¸ 

)_  t " é ¶ Ü ¼– Ð ƒ  ½ ¨ ÷ &% 3 6 £ §.

Y c

p w Š à U Ø ”  ô

[1] Y. H. Shin, K. W. Min, J. G. Rhee, S. H. Kim, H. S.

Kim, S. D. Park, D. K. Sung and S. D. Choi, IEEE Trans. Nucl. Sci. 46, 1586 (1999).

[2] T. P. Ma and P. V. Dressendorfer, Ionizing Radia- tion Effects in MOS Device and Circuits (J. Wiley

& Sons, New York, 1989), Ch. 5.

[3] M. Pejovic, G. Ristic and A. Jaksic, Applied Surface Science 108, 141 (1997).

[4] Ashok K. Sharma, Semiconductor Memories (IEEE PRESS, New York, 1997), Ch. 7.

[5] T. P. Ma and P. V. Dressendorfer, Ionizing Radia- tion Effects in MOS Device and Circuits (J. Wiley

& Sons, New York, 1989), Ch. 4.

[6] Kuei-Shu Chang-Liao and Huang-Ming Chang, Jounal of Nuclear Science and Technology 36, 630 (1999).

[7] Goran Ristic, Snezana Golubovic and Momcilo Pe-

jovic, Sensors and Actuators, A51, 153 (1996).

(5)

[8] John Y. Chen, CMOS Device and Technology for VLSI (Prentice-Hall, New Jersey, 1990), Ch. 2.

[9] Takeshi Ohshima, Masahito Yoshikawa, Hisayoshi Itoh, Yasushi Aoki and Isamu Nashiyama, Material Science and Engineering, B61-62, 481 (1999).

[10] Takashi Matsushita, Chikara Fukunaga, Hirokazu Ikeda and Yutaka Saitoh, Nuclear Instruments and Methods in Physics Research, A366, 369 (1995).

[11] Martin Denton, Radiation Effects on Electronics Components and Circuits, European Organization for Nuclear Research CERN Training (2000).

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[13] A. Scarpa, P. Riess, G. Ghibaudo, A. Paccagnella, G. Pananakakis, M. Ceschia and G. Ghidini, Micro- electronics Reliability, 40, 57 (2000).

1- MeV Proton-Beam Irradiation Effects on the Electrical Characteristics of MOS Devices

H. S. Kim, E. H. Kim, S. M. Han and S. J. Noh Department of Applied Physics, Dankook University, Seoul 140-714

(Received 10 July 2003)

The electrical characteristics of NMOS and PMOS devices of an 85-˚ A gate oxide thickness, a 10-µm gate width and a 5-µm gate length have been studied as a function of the proton beam irradiation dose. The proton beam energy was 1 MeV and the total irradiation doses were 0.1, 0.5, 1, 5, 10 and 50 Mrad espectively, The electrical characteristics, such as the threshold voltage, the off-current, the on-current and the transconductance were found to change with the proton beam irradiation. In the NMOS devices, while the threshold voltage was reduced and the off-current was drastically increased until 1 Mrad, the threshold voltage rebounded to increase and the off-current rebounded to decrease, respectively over a irradiation doses of 1 Mrad. Both the on-current and the transconductance of the NMOS devices decreased with increasing irradiation. In the PMOS devices, the absolute value of the threshold voltage increased with the irradiation and the off- current change was very small compared to that with the NMOS devices. Both the on-current and the transconductance of the PMOS devices decreased with increasing irradiation and their changes were large compared with those of the NMOS devices at doses over 1 Mrad.

PACS numbers: 07.89, 61.80, 13.85.T, 87.53.P

Keywords: Radiation effect, Cosmic ray, MOSFET, Threshold voltage, Transconductance, On-current, Off- current, Degradation

E-mail: [email protected]

참조

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