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Optical Gain Characteristics of 1.3 and 1.55 µm GaAsSb/InGaNAs/GaAs Trilayer Quantum Well Structures
Seoung-Hwan Park ∗
Department of Electronics Engineering, Catholic Univ. of Daegu, Gyeongsan 712-702 (Received 20 August, 2010 : revised 15 September, 2010 : accepted 17 October, 2010)
The optical gain characteristics of 1.3 µm GaAsSb/InGaNAs/GaAs trilayer quantum well struc- tures were studied using multi-band effective mass theory. The results were compared with those of 1.55 µm GaAsSb/InGaNAs/GaAs trilayer quantum well structures. The transition wavelength gradually decreases with increasing carrier density due to the band-bending effect. In the case of the 1.3 µm GaAsSb/InGaNAs/GaAs trilayer quantumwell structure, the rate of decrease is shown to be smaller than that of the 1.55µm GaAsSb/InGaNAs/GaAs trilayer quantum well structure due to a reduced band-bending effect. Also, the 1.3 µm quantumwell structure shows a larger optical gain than the 1.55 µm quantumwell structure because the former has a larger optical matrix element than the latter. On the other hand, the quasi-Fermi level of the 1.3 µm quantum well structure is slightly smaller than that of the 1.55 µm quantumwell structure.
PACS numbers: 42.55.Px, 42.60.-v, 71.22.+i, 72.80.Ey
Keywords: Optical gain, GaAsSb, InGaNAs, GaAs, Quantum well
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