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MOCVD 0 n É® Žz º V R ËX ê sc Ü R Bi 2 Te 3 õ m Í Sb 2 Te 3 U c lT c l8 ý  Œ ºX ì Ä — ¤V R Ë

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MOCVD 0 n É® Žz º V R ËX ê sc Ü R Bi 2 Te 3 õ m Í Sb 2 Te 3 U c lT c l8 ý  Œ ºX ì Ä — ¤V R Ë

™ »+ ä 0 å  · + ä 6 0 ÷ 7 B · L |U 4 w H · ™ » . > „ ç ¡

ô

 Dz D G õ † < Æl Õ ü tƒ  ½ ¨" é ¶ ~ à Ì} Œ •F « у  ½ ¨G ' p' , " fÖ  ¦ 130-650

®

£( å  - ! H

“

¦ 9@ /† < Ɠ § „  l „   „   / B N † < ÆÂ Ò, " fÖ  ¦ 136-791 (2006¸   3 Z 4 7{ 9  ~ à Î6 £ §)

Bi

2

Te

3

x 9 Sb

2

Te

3

\ x  ~ à Ì} Œ •`  ¦ trimethylbismuth, triethylantimony, x 9 diisopropyltelluride`  ¦   6

 

x # Œ Ä »l F K5 Å q l  © œ 7 £ x ‚ à ÌZ O Ü ¼– Ð (001) GaAs é ß –  & ñ l ó ø Í 0 A\  $ í  © œ % i  . $ í  © œ  ) a Bi-Te >  ~ à Ì} Œ •

“ É

r 8 £ x  © œ ½ ¨› ¸\  ¦ s À Ò 9 c-» ¡ ¤ ~ ½ ӆ ¾ ÓÜ ¼– Ð C † ¾ Ó  ) a é ß –  & ñ e ” `  ¦ „   ‰ & ³p  â x 9 X-‚    r] X  ì  r$ 3   õ  S X ‰ “   ½ + É Ã

º e ” % 3  . 2 " é ¶ _  step-flow + þ AI – Ð $ í  © œs  { 9 # Qz Œ ¤6 £ §`  ¦ ~ à Ì} Œ •_  ³ ð€  + þ A © œ`  ¦ › ' a ¹ 1 Ïô  Ç   õ  S X ‰ “   ½ + É Ã º e ”

% 3  . Bi

2

Te

3

~ à Ì} Œ •_   â Ä º Sb

2

Te

3

ü <  H ² ú ˜o  à º¨ î ~ ½ ӆ ¾ ÓÜ ¼– Ð $ í  © œ 5 Å q • ¸_  s ~ ½ Ó$ í s  ” > r F † < Ê`  ¦ AFM ì 

r$ 3 `  ¦ : Ÿ x # Œ S X ‰ “   % i  . s  Qô  Ç \ P „  ™ èF _  ] j› ¸ / B N& ñ “ É r ~ à Ì} Œ •+ þ A \ P „  Í ‰ ty Œ • ™ è  x 9 µ 1 τ  ™ è _  ] j



Œ

•\  V , o  6 £ x6   x| ¨ c à º e ” `  ¦  כ Ü ¼– Ð l @ /  ) a  .

PACS numbers: 68.35.Bs, 68.55.Jk

Keywords: Bi

2

Te

3

, Sb

2

Te

3

, \ P „  F « Ñ, MOCVD

I. " e  ] Ø

Bi-Te >   o½ + ËÓ ü t“ É r  © œ“ : r   H ~ ½ Ó\ " f Ä ºÃ ºô  Ç \ P „  : £ ¤$ í `  ¦

˜

Ð# Œ ‰ & ³F  @ / Òì  r _  \ P „  Í ‰ ty Œ •™ è   H s  Ó ü t| 9 – Ð ] j› ¸÷ &

#

Qt “ ¦ e ”  . \ P „  F « Ñ_  $ í 0 p x t à º (figure of merit)  H Z (= α

2

σ/K; α = Seebeck > à º, σ = „  l „  • ¸• ¸, K = \ P 

„

 • ¸• ¸)° ú כ [1]Ü ¼– Ð ³ ð‰ & ³÷ & 9 ´ òÖ  ¦ s  Z  }“ É r \ P „  ™ è \  ¦ ] j



Œ

• l  0 AK " f  H Z ° ú כ`  ¦ 7 £ x r &   ô  Ç . \ P „   $ í 0 p x t  Ã

º\  ¦ þ j@ / o l  0 AK " f  H Seebeck > à º x 9 „  l „  • ¸• ¸

\

 ¦ ß ¼>  “ ¦ 1 l x r \  \ P „  • ¸• ¸\  ¦  Œ •>  # Œ  ô  Ç . Õ ª



Q  \ P „  $ í 0 p x t à º\  ¦ ³ ð‰ & ³   H „  l „  • ¸• ¸ü < \ P „  • ¸• ¸



 H " f– Ð 7 á x5 Å q& h “   : £ ¤$ í `  ¦ t “ ¦ e ”  . 7 £ ¤, Ó ü t| 9 _  „  l 

„

 • ¸• ¸\  ¦ ß ¼>  €   1 l x r \  \ P „  • ¸• ¸• ¸ 7 £ x  >   ) a  .

s

 Qô  Ç s Ä »– Ð 1950¸  @ / Bi-Te >  \ P „  F « Ñ > hµ 1 Ï  ) a s  A

– Ð é # Qo  + þ AI _  \ P „  F « Ñ_  \ P „  $ í 0 p x“ É r 1   H ~ ½ Ó_  ° ú כ Ü

¼– Ð ] jô  Ç÷ &# Q M ® o  .

Hicks ü < Dresselhaus [2]\  _ K  Z° ú כ`  ¦ † ¾ Ó © œr v l  0 A ô

 Ç D h– Ðî  r > h¥ Æ s  ™ è> h  ) a s Ê ê „  : Ÿ x& h “   \ P „  F « Ñ\  ¦ s  6

 

x ô  Ç $  " é ¶ ½ ¨› ¸_  ƒ  ½ ¨ Z° ú כ`  ¦ † ¾ Ó © œ r ~  ´ à º e ”   H  0

p x$ í M :ë  H \  B Ä º  Ö ¸ µ 1 Ïy  ”  ' Ÿ ÷ &“ ¦ e ”   [3]. Venkata- subramanian1 p x“ É r [4] 2 " é ¶ _  Bi

2

Te

3

/Sb

2

Te

3

œ í    ½ ¨

E-mail: [email protected]

›

¸\  ¦ ] j Œ • # Œ Z° ú כs  2.4 t  7 £ x † < Ê`  ¦ z  ´+ « >& h Ü ¼– Ð ] jr 

% i  . s [ þ t“ É r œ í   ½ ¨› ¸_  ¿ ºa \  ¦ \ P „  • ¸• ¸ x 9 „  l 

„

 • ¸• ¸\  ¦ { Œ ™{ © œ   H Ÿ í 7 H õ  „   _  ¨ î ç  H  Ä »' Ÿ – Ð_  ¿ ºa 

–

Ð ] jô  dž < ÊÜ ¼– Ð „  l „  • ¸• ¸  H Ä »t ô  Ç G  \ P „  • ¸• ¸\  ¦ % 3  ]

j # Œ \ P „  $ í 0 p x t à º\  ¦ ß ¼>  % i  . s  Qô  Ç œ í    ½ ¨

›

¸_  ] j Œ •`  ¦ 0 AK " f  H ~ à Ì} Œ •+ þ AI _  \ P „  F « Ñ $ í  © œl Z O s  ì ø

Í× ¼r  € 9 כ ¹  . ‰ & ³F  t  Bi-Te>  F « Ñ_  ~ à Ì} Œ •7 £ x ‚ à Ìl  Õ

ü

t“ É r Û ¼( ' a A, \ P 7 £ x ‚ à Ì, MBE, MOCVD 1 p x # Œ Q t  ~ ½ Ó Z O

[ þ t s   6   x ÷ &# Q M ® o  . Õ ª ×  æ \ " f• ¸ MOCVD [5,6]Z O “ É r Ã

º nm ¿ ºa _  · û ª“ É r Å Òl _  œ í   ½ ¨› ¸ ] j Œ •\  & h ½ + Ë  9, ¢ ¸ô  Ç ~ 1 >  í ß –\ O  o 0 p x ô  Ç $ í  © œl Z O s  .

‘

: r ƒ  ½ ¨\ " f  H Bi-Te >  Ó ü t| 9 _  œ í    ½ ¨› ¸_  ] j Œ •`  ¦ 3

l q& h Ü ¼– Ð Ä º‚   Bi

2

Te

3

x 9 Sb

2

Te

3

\ x  ~ à Ì} Œ •`  ¦ MOCVD Z O

Ü ¼– Ð 7 £ x ‚ Ã Ì % i  . l ó ø Í_  ~ ½ Ó0 A x 9 $ í  © œ“ : r • ¸\     $ í



© œ  ) a Bi

2

Te

3

x 9 Sb

2

Te

3

\ x ~ à Ì} Œ •_  ½ ¨› ¸& h  : £ ¤$ í `  ¦ „   

‰

&

³p  â x 9 X-‚    r] X  ì  r$ 3 `  ¦ : Ÿ x # Œ ¶ ú ˜( R˜ Ѐ Œ ¤Ü ¼ 9 $ í  © œ

 )

a ~ à Ì} Œ •_  ³ ð€   + þ A © œ“ É r AFM`  ¦ s 6   x # Œ › ' a ¹ 1 Ï % i  . s 



Qô  Ç z  ´+ « >`  ¦ : Ÿ x # Œ $  " é ¶ ½ ¨› ¸_  Bi-Te >  \ P „  ™ èF _  ]

j› ¸/ B N& ñ `  ¦ 0 Aô  Ç l ì ø Í/ B N& ñ `  ¦ S X ‰ w n  “ ¦  % i  .

II. ÷ m Ç] M öU ê s0 n É

Thomas Swan  \ " f ] j Œ •ô  Ç Ã º¨ î ì ø Í6 £ x› ' a d ”  MOCVD



© œq \  ¦ s 6   x # Œ  © œ· ú š\ " f Bi-Te >  ~ à Ì} Œ •`  ¦ $ í  © œ % i 

-463-

(2)

Fig. 1. Schematic of MOCVD reactor for Bi-Te related thin films.



. Bi, Sb x 9 Te F K5 Å q Ä »l  „  ½ ¨^ ‰– Ð Trimethylbismuth (TMBi), Triethylantimony (TESb), Diisoprophyle tel- luride (DiPTe)`  ¦  6   x % i Ü ¼ 9 † ½ ӓ : r › ¸\  ¦ s 6   x # Œ { 9 & ñ

“

: r • ¸`  ¦ Ä »t r (   . F K5 Å q Ä »l  „  ½ ¨^ ‰\  ¦ ì ø Í6 £ x› ' a Ü ¼– Ð s 5 Å x r

v l  0 AK  4N í  H • ¸_  à º™ è\  ¦ à º™ è& ñ ] jl \  : Ÿ x õ  r †   Ê

ê  6   x % i  . l ó ø ÍÜ ¼– Ѝ  H [010] ~ ½ ӆ ¾ ÓÜ ¼– Ð 4• ¸ s » 1 Ï  ) a (001) GaAs é ß –  & ñ J ?s ( \  ¦  6   x % i  . ‘ : r z  ´+ « >\ " f



6   x ô  Ç ì ø Í6 £ x› ' a _  ½ ¨› ¸\  ¦ Fig. 1 \    ? /% 3  . ì ø Í6 £ x› ' a

“ É

r $ 3 % ò Ü ¼– Ð ] j Œ •÷ &% 3 Ü ¼ 9 ¿ º > h_  < É Êƒ   " f! s s'  (suscep- tor)\  ¦  6   x % i  . RF  ï{ 9 – Ð \ P ÷ &  H ' Í   P : " f! s s' 



 H Ä »l F K5 Å q„  ½ ¨^ ‰ Ø  æì  r y  \ P ì  r K  ÷ &• ¸2 Ÿ ¤ 400

C – Ð Ä

»t r (  Ü ¼ 9 GaAs l ó ø Í`  ¦ ¿ º   P : " f! s s' \  0 Au r & 

\

x ~ à Ì} Œ • $ í  © œs  { 9 # Q • ¸2 Ÿ ¤ % i  . ¿ º " f! s s'   s \ 



 H $ 3 % ò Ü ¼– Ð ] j Œ •  ) a ì  r o @ /\  ¦ 0 Au r &  " f! s s' _  “ : r • ¸

 " f– Ð 1 l qw n & h Ü ¼– Ð ] j# Q | ¨ c à º e ” • ¸2 Ÿ ¤ % i  . \ x  ~ Ã Ì }

Œ

•_  › ¸$ í x 9 ¿ ºa _  ç  H{ 9 $ í † ¾ Ó © œ`  ¦ 0 A # Œ $ í  © œ ×  æ l ó ø Í

`

 ¦ …  ;…  ;y   r„  r (   . $ í  © œ  ) a ~ à Ì} Œ •_  p [ j½ ¨› ¸  H È Òõ 

„

   ‰ & ³p  â (Philips CM30)`  ¦ s 6   x # Œ › ' a ¹ 1 Ï % i Ü ¼ 9,

$ í

 © œ  ) a ~ à Ì} Œ •_   © œ`  ¦ S X ‰ “   l  0 AK  Cu-K

α

1 X-‚   c ” `  ¦



6   x # Œ X-‚    r] X  ì  r$ 3 `  ¦ % i  . $ í  © œ  ) a ~ à Ì} Œ •_  ³ ð€   + þ

A © œ“ É r AFM (Atomic Force Microscope)`  ¦  6   x # Œ › ' a

¹ 1 Ï % i  .

III. + s ÇÊ Ý õ m Í ß e Ȃ º

Fig. 2  H MOCVD Z O Ü ¼– Ð $ í  © œ  ) a Bi

2

Te

3

x 9 Sb

2

Te

3

\

x  ~ à Ì} Œ •_  X-‚    r] X  ì  r$ 3    õ \  ¦ ˜ Ð# ŒÅ ғ ¦ e ”  .

Bi

2

Te

3

_   â Ä º (006), (0015), (0018) €  s , Sb

2

Te

3

_   â Ä

º\   H (006), (009), (0012), (0015), (0018)€  _   r] X J 

‡

 s  ˜ Ð% i Ü ¼ 9 y Œ •y Œ •   & ñ €  \ " f_   r] X y © œ• ¸ q Ö  ¦“ É r ½ ¨

›

¸“    (structure factor)– Ð > í ß –  ) a JCPDS ° ú כõ  ¸ ú ˜ { 9 u 

% i  . s      õ   H $ í  © œ  ) a ~ à Ì} Œ •s  c-» ¡ ¤ Ü ¼– Ð C † ¾ Ó$ í `  ¦

° ú

  H é ß –  & ñ \ x  ~ à Ì} Œ •e ” `  ¦ ´ ú ˜K  Šғ ¦ e ”  .

Fig. 2. XRD patterns of Sb

2

Te

3

and Bi

2

Te

3

epilayers.

‘

: r z  ´+ « >\ " f  6   x ô  Ç l ó ø Í“ É r (001) GaAs €  \ " f 4• ¸ s 

»

1 Ï  ) a  כ Ü ¼– Ð X-‚    r] X  ì  r$ 3  r  €  $  l ó ø Í`  ¦ l Ö  ¦ # Q”   ì

ø Í@ / ~ ½ ӆ ¾ ÓÜ ¼– Ð 4• ¸  r„  r †   Ê ê l ó ø Í õ  X-‚   y Œ ™t l \  ¦ θ - 2θ – Ð  r„  r ( ” Ü ¼– Ð  r] X J ‡  `  ¦ % 3 `  ¦ à º e ” % 3  . s   H

Ä º 8 + þ AI _  r « Ñ  _ ” Ü ¼– Ð   & ñ €  `  ¦ X-‚   { 9  ~ ½ Ó

†

¾ ÓÜ ¼– Ð & ñ § > =K  Å Ò# Q  l  M :ë  H s  . s   H $ í  © œ  ) a \ x 

~ Ã

Ì} Œ •_  a » ¡ ¤ ~ ½ ӆ ¾ Ós  l ó ø Í_  (001)   & ñ €  õ  ¨ î ' Ÿ  >  $ í



© œ÷ &% 3 6 £ §`  ¦ _ p  ô  Ç .

Fig. 3“ É r GaAs l ó ø Í0 A\  $ í  © œ  ) a Bi

2

Te

3

_  “ ¦ì  r K  0

p x TEM ì  r$ 3    õ s  . Fig. 3\ " f l ó ø Í_  s » 1 Ï ~ ½ Ó0 A y

Œ

•\     + þ A$ í  ) a Û ¼9 \ œ_  0 Au \  ¦ " é ¶ Ü ¼– Ð ³ ðr  % i  .

Bi

2

Te

3

_  a » ¡ ¤ ~ ½ ӆ ¾ Ó      © œÃ º  H 4.385 ˚ A Ü ¼– Ð GaAs _ 

 

  © œÃ º 5.653 ˚ A ü < €  • 30 %_  s  e ” 6 £ § \ • ¸ Ô  ¦ ½ ¨ 

“

¦ l ó ø Íõ  ~ à Ì} Œ •_  > €  \ " f_  1 ∼ 2nm & ñ • ¸_  Ô  ¦ç  H{ 9 ô  Ç 8

£

x s Ê ê\   H c-» ¡ ¤ Ü ¼– Ð ¸ ú ˜ & ñ § > = ) a 8 £ x  © œ½ ¨› ¸\  ¦ ˜ Ð# ŒÅ ғ ¦ e ”

 . Bi

2

Te

3

_  c » ¡ ¤ ~ ½ ӆ ¾ Ó_      © œÃ º  H 30.48 ˚ A Ü ¼– Ð ˜ Ð

“

¦÷ &“ ¦ e ” Ü ¼ 9 Te(1)-Te(1) -Bi-Te(2)-Bi-Te(1)-Te(1) _ 

"

é

¶   ½ ¨› ¸– Ð C \ P ÷ &# Q e ”   [7]. # Œl " f Te(1) -Bi-Te(2)- Bi-Te(1)  H y © œô  Ç   ½ + Ë`  ¦ t   H é ß –0 A ! s q– Ð s  é ß –0 A ! s q[ þ t

“ É

r " f– Ð Te(1)-Te(1) ç ß –\  €  •ô  Ç Van der Waals   ½ + Ë`  ¦ 

(3)

Fig. 3. TEM image of Bi

2

Te

3

/GaAs interface. The circle indicates the step site introduced by the mis-orientation bewteen the Bi

2

Te

3

film and GaAs substrate. Marker indicates 2 nm.

Fig. 4. AFM images of (a) Sb

2

Te

3

and (b) Bi

2

Te

3

films grown at 380

C.

“

¦ e ”  . Õ ªa Ë >\ " f & h 8 £ x  † < Ê + þ AI \  ¦ ˜ Ðs   H  כ “ É r s  Qô  Ç

‘

: r` ç \  l “  ô  Ç  כ Ü ¼– Ð ó ø Íé ß –  ) a  .

Koma [8]1 p x“ É r $ í  © œ ~ ½ ӆ ¾ ÓÜ ¼– Ð Van der Waals   ½ + Ë`  ¦

“ ¦ e ”   H F « Ñ_   â Ä º q 2 Ÿ ¤ ~ à Ì} Œ •õ  l ó ø Íõ _      © œÃ º _

 s  ß ¼ 8 • ¸ \ x  ~ à Ì} Œ •_    & ñ $ í “ É r Ä ºÃ º† < Ê`  ¦ \ V 8

£

¤ % i  . ‘ : r z  ´+ « >   õ   H s [ þ t _  \ V8 £ ¤`  ¦ z ´ » ~ à Îg Ë >   H  כ Ü

¼– Ð, Van der Waals   ½ + Ë\  _ K  l ó ø ÍÜ ¼– Ð Â Ò'  È Òõ „  

Fig. 5. (a) Schematics of [001] view of low indexed cubic crystal planes (b) microstructure of (001) GaAs surface tilted toward [010], and (c) step bunched surface struc- ture due to lateral growth anisotropy between (111)A and (111)B step.

0

A, & h 8 £ x  † < Ê 1 p x _    † < Ê_  „    < ʓ É r     © œÃ º_  s \  _

ô  Ç Â Ò& ñ ½ + Ë „  0 A 1 p x   † < Ê_  + þ A$ í s  C F   ) a   õ   # Œ 

”

  .

Fig. 4  H 380

C \ " f $ í  © œ  ) a Sb

2

Te

3

x 9 Bi

2

Te

3

\ x 

~ Ã

Ì} Œ •_  ³ ð€  + þ A © œ`  ¦ AFM Ü ¼– Ð ì  r$ 3 ô  Ç   õ [ þ t s  . ¿ º r 

«

Ñ — ¸¿ º  r & h Ü ¼– Ð  Ö  ¦€  õ  ° ú  “ É r + þ A © œ`  ¦   ? /% 3  .

p

r & h Ü ¼– Ð ˜ Ѐ Œ ¤`  ¦ M : Bi

2

Te

3

_  ³ ð€  + þ A © œ“ É r { 9 & ñ ~ ½ ӆ ¾ ÓÜ ¼

–

Ð C † ¾ Ó  ) a _ … Û ¼ (terrace)ü < Û ¼9 \ œ (step) + þ AI \  ¦ ˜ Ðs “ ¦ e ”

Ü ¼ 9 _ … Û ¼  H ô  ÇA á ¤ ~ ½ ӆ ¾ ÓÜ ¼– Ð U  ´>  Z þ t # Q" f e ”   H + þ A © œ

`

 ¦   ? /% 3  . ì ø ̀  \  Sb

2

Te

3

_   â Ä º Bi

2

Te

3

\ " fü <  H

² ú

˜o  _ … Û ¼_  + þ AI   ™ è Ô  ¦ç  H{ 9  t ë ß –  y Œ •_  + þ AI 

\

 ¦ ˜ Ð# ŒÅ ғ ¦ e ”  . ¿ º r « Ñ — ¸¿ º\ " f 3 " é ¶& h “   Ù þ ˜Ò q t$ í

\

 l “  ô  Ç $ 3 [ þ t s  ½ + Ë^ ‰÷ &  H + þ AI _  $ í  © œs      2 " é ¶& h 

“

  layer-by-layer + þ AI _  $ í  © œs  s À Ò# Q & ’ 6 £ §`  ¦ · ú ˜ à º e ” 



.

~ Ã

Ì} Œ •_  AFM ³ ð€  + þ A © œ“ É r ‘ : r z  ´+ « >\ " f  6   x ô  Ç l ó ø Ís  (001)   & ñ €  \ " f 4• ¸ s » 1 Ï÷ &% 3 l  M :ë  H \    è ß –   õ 

–

Ð ó ø Íé ß –  ) a  . ‘ : r z  ´+ « >\ " f  6   x ô  Ç zinc blende ½ ¨› ¸\  ¦ ° ú 



 H GaAs l ó ø Í_  (001) €  õ  s Ö  ©   H ± ú “ É r t à º\  ¦ ° ú 



 H €  [ þ t`  ¦ ¨ î €  & h Ü ¼– Ð Õ ªo €   Fig. 5(a)ü < ° ú  s  ³ ðr  ½ + É

(4)

–

Ð ½ ¨ì  r ) a  . GaAs l ó ø Í_  (001)€  s  [110] ~ ½ ӆ ¾ ÓÜ ¼– Ð €  • ç ß

– s » 1 Ï÷ &% 3 `  ¦  â Ä º l ó ø Í_  ³ ð€  “ É r ½ ¨› ¸& h Ü ¼– Ð (001) _ …



Û ¼ü < (111)A_  Û ¼9 \ œ €  Ü ¼– Ð ³ ðr  | ¨ c à º e ” Ü ¼ 9 _ … Û ¼ _

 U  ´s (l) “ É r (α/2)cot α – Ð ³ ð‰ & ³÷ & 9 # Œl " f ፠ H     © œ Ã

º, ፠ H l ó ø Í_  l Ö  ¦ # Q”   y Œ •• ¸\  ¦    · p . ‘ : r z  ´+ « >\    6

 

x ô  Ç l ó ø Í_   â Ä º [010] ~ ½ ӆ ¾ ÓÜ ¼– Ð l Ö  ¦ # Q4 R e ” Ü ¼ 9 s   â Ä

º l ó ø Í_  ½ ¨› ¸  H Fig. 5(b) ü < ° ú  s   y Œ •_  ¨ î €   _ … Û ¼ ü

< [110] ~ ½ ӆ ¾ ÓÜ ¼– Ð + þ A$ í ÷ &  H Û ¼9 \ œ€  “ É r (111)A, [-110] ~ ½ Ó

†

¾ ÓÜ ¼– Ð + þ A$ í ÷ &  H Û ¼9 \ œ€  “ É r (111)B €  Ü ¼– Ð ½ ¨$ í  ) a   [9].

Fig. 4(a) \ " f ˜ Ð# Œt   H Sb

2

Te

3

~ à Ì} Œ •_  ³ ð€  + þ A © œ“ É r Fig. 5(b) _  l ó ø Í_  p r & h  + þ A © œ\ " f $ í  © œs  ”  ' Ÿ ÷ &€  " f

#

Œ Q > h_  Û ¼9 \ œ[ þ t s   µ 1 ϖ Ð Ó ü  # Œ”   (step bunching)  כ Ü

¼– Ð # Œ ”   . s   â Ä º  y Œ •+ þ AI _  _ … Û ¼\  ¦ Õ ª@ /– Ð Ä » t

 l  0 AK " f  H [110] x 9 [-110] ~ ½ ӆ ¾ ÓÜ ¼– Ð Ã º¨ î $ í  © œ (lat- eral growth) 5 Å q • ¸ Ä »  # Œ  ½ + É  כ s  9 ‘ : r z  ´+ « >    õ

, Sb

2

Te

3

~ à Ì} Œ •_  $ í  © œ\ " f  H à º¨ î ~ ½ ӆ ¾ ÓÜ ¼– Ð_  $ í  © œ5 Å q

•

¸  H ~ ½ ӆ ¾ Ó\  ß ¼>  _ ” > r t  · ú §6 £ §`  ¦ _ p  “ ¦ e ”  . Õ ª



Q  à º¨ î ~ ½ ӆ ¾ ÓÜ ¼– Ð $ í  © œ5 Å q • ¸_  s ~ ½ Ó$ í s  ” > r F    H  â Ä º Û

¼9 \ œs  ½ + Ë^ ‰÷ &# Q      H ³ ð€  + þ A © œ“ É r Fig. 5(c) ü < ° ú   s

 ô  ÇA á ¤ ~ ½ ӆ ¾ ÓÜ ¼– Ð |   f ”  y Œ •+ þ A + þ AI _  _ … Û ¼\  ¦   è ­ q

 כ

s   [10]. Fig. 5(c)_   â Ä º [110] ~ ½ ӆ ¾ Ó_  $ í  © œ5 Å q • ¸

[-110] ~ ½ ӆ ¾ Ә Ð    É r  â Ä º\  ¦ & ñ ô  Ç  כ s  . Fig. 4(b)\ 

˜

Г   Bi

2

Te

3

~ à Ì} Œ •_  ³ ð€  + þ A © œ“ É r _ … Û ¼_  + þ AI  ô  ÇA á ¤

~

½ ӆ ¾ ÓÜ ¼– Ð |   f ”  y Œ •+ þ A_  + þ AI \  ¦ ˜ Ðs “ ¦ e ” Ü ¼ 9 s   H à º

¨ î

~ ½ ӆ ¾ ÓÜ ¼– Ð $ í  © œ5 Å q • ¸_  s ~ ½ Ó$ í \  l “  ô  Ç  כ Ü ¼– Ð K $ 3 ÷ &

# Q ”   .

IV. ~ ¿ W d l



© œ“ : r \ " f \ P „  $ í 0 p x s  Ä ºÃ ºô  Ç Bi-Te>  ~ à Ì} Œ •`  ¦ MOCV DZ O Ü ¼– Ð GaAs l ó ø Í0 A\  $ í  © œ % i  . $ í  © œ  ) a Bi-Te > 

~ Ã

Ì} Œ •“ É r c-» ¡ ¤ Ü ¼– Ð C † ¾ Ó  ) a é ß –  & ñ e ” `  ¦ X-‚    r] X  ì  r$ 3  x 9

„

  ‰ & ³p  â ì  r$ 3 `  ¦ : Ÿ x # Œ S X ‰ “   % i  . ¢ ¸ô  Ç \ x  ~ à Ì} Œ • _

 a » ¡ ¤ ~ ½ ӆ ¾ ӓ É r l ó ø Í_  a » ¡ ¤ ~ ½ ӆ ¾ Óõ  à º¨ î `  ¦ s À Ò% 3 Ü ¼ 9

~ Ã

Ì} Œ •? /_  Te-Te ç ß –_  Van der Waals   ½ + ËÜ ¼– Ð “  K  l  ó

ø Íõ _   H     © œÃ º_  s \ • ¸ Ô  ¦ ½ ¨ “ ¦ € ª œ| 9 _    & ñ

$ í

`  ¦   ? /% 3  . $ í  © œ  ) a Sb

2

Te

3

x 9 Bi

2

Te

3

~ à Ì} Œ •_  ³ ð€   Ä

»Á º– Ð K $ 3 ÷ &# Q& ’  . s  Qô  Ç \ P „  ™ èF _  ] j› ¸ / B N& ñ “ É r

~ Ã

Ì} Œ •+ þ A \ P „  Í ‰ ty Œ • ™ è  x 9 µ 1 τ  ™ è _  ] j Œ •\  V , o  6 £ x6   x

| ¨

c à º e ” `  ¦  כ Ü ¼– Ð l @ /  ) a  .

P

c p 8 ý ò k >

‘

: r ƒ  ½ ¨  H õ † < Æl Õ ü t Â Ò 21C á ԏ : r w # Q ƒ  ½ ¨> hµ 1 Ï  

\ O

 \   ” ¸™ èF l Õ ü t > hµ 1 Ï \ O é ß –_  ( ï× ¼    ñ 05K1501- 02010) t " é ¶ \  _  # Œ ƒ  ½ ¨÷ &% 3 Ü ¼ 9 s \  y Œ ™ × ¼w n m  .

Y

c p w Š à U Ø ”  ô

[1] D. R. Lovett, Semi-Metals and Narrow-Band Gap Semiconductors, (Pion Limited, London, 1977), p.

181.

[2] L. D. Hicks and M. S. Dresselhaus, Phys. Rev. B 47, 631 (1993).

[3] M. S. Sander, R. Gronsky, T. Snads and A. M. Stacy, Chem. Mater. 15, 335 (2003).

[4] R. Venkatasubramanian, E. Siivola, T. Colpitts and B. Oïquinn, Nature 413, 597 (2001).

[5] A. Giani, A. Boulouz, F. Pascal-Delannoy, A.

Fousaram and A. Boyer, Thin Solid Films 315, 99 (1998).

[6] R. Venkatasubramanian, T. Colpitts, E. Watko, M.

Lamvik and N. El-Masry, J. Crystal Growth 170, 817 (1997).

[7] Y. Ueda, A. Furuta, H. Okuda, M. Nakatake, H.

Sato, H. Namatame and M. Taniguchi, J. Elec- tron Spectroscopy and Related Phenomena 101, 677 (1999).

[8] A. Koma, Thin Solid Films 216, 72 (1992).

[9] S. M. Hu, J. Appl. Phys. 45, 1567 (1974).

[10] Jin-Sang Kim, Jong-Hyeng Song and Sang-Hee Suh,

Materials Science in Semiconductor Processing 3,

201 (2000).

(5)

Structural Characteristics of Bi 2 Te 3 and Sb 2 Te 3 Films Grown on (001) GaAs Substrates Grown by Using MOCVD

Jeong-Hun Kim, Dae-Yong Jeong, Gi-Won Choi and Jin-Sang Kim

Thin Film Materials Research Center, Korea Institute of Science and Technology, Seoul 136-791

Byeong-Kwon Ju

Department of Electrical Engineering, Korea University, Seoul 136-791 (Received 7 March 2006)

Bi

2

Te

3

and Sb

2

Te

3

films were grown on (001) GaAs substrates by using the metal organic chemical vapor deposition (MOCVD) method. High resolution transmission electron microscopy (TEM) and X-ray diffraction (XRD) results revealed that the films had single-crystalline phases with a preferential c-orientation and with layered structures resulting from the Van der Waals bonding in these materials. The surface shapes of the Bi

2

Te

3

and the Sb

2

Te

3

films indicated that these films were grown in a two-dimensional step-flow growth mode. AFM showed that, contrary to the Sb

2

Te

3

films, the Bi

2

Te

3

films had a terrace width distribution, which might be related to the anisotropic growth rate in the crystal plane. We expect these results for thermoelectric materials to be applicable to thin-film cooling and power-generating devices.

PACS numbers: 68.35.Bs, 68.55.Jk

Keywords: Bi

2

Te

3

, Sb

2

Te

3

, thermoelectric material, MOCVD

E-mail: [email protected]

수치

Fig. 1. Schematic of MOCVD reactor for Bi-Te related thin films.
Fig. 5. (a) Schematics of [001] view of low indexed cubic crystal planes (b) microstructure of (001) GaAs surface tilted toward [010], and (c) step bunched surface  struc-ture due to lateral growth anisotropy between (111)A and (111)B step

참조

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