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NO Adsorption and Catalytic Reduction Mechanism of Electrolytically Copper-plated Activated Carbon Fibers

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      NO  

 

  J. Kawasaki*

  

*   

(2002 6 17 , 2002 9 23 )

NO Adsorption and Catalytic Reduction Mechanism of Electrolytically Copper-plated Activated Carbon Fibers

Soo-Jin Park, Yu-Sin Jang and Junjiro Kawasaki*

Advanced Materials Division, Korea Research Institute of Chemical Technology, Daejeon 305-600, Korea

*Department of Chemical Engineering, Tokyo Institute of Technology, Tokyo 152-8852, Japan

Received 17 June 2002; accepted 23 September 2002)

 

   (activated carbon fibers; ACFs) NO    

!"#$.  %&' () *+ ,-. /. 01 23 (456, . 78 9: ; <

=> ?,-@ A. BCD E&F G HI "4$.  JK LM, ACFs N ACFs/Cu OP ,- 500oCQ NOR ST%UI V NO N2N O2Q   WI X:4$. 9Y, ACFs/Cu OPR Z[\ ST OPST ]

<^ _R OP,- `ab cdI  W5Q e! f$. ' NO g  ACFsh ACFs/Cu OP Z ' $i Bj' g$ WI "b W5Q ^k $.

AbstractIn this work, the catalytic reduction mechanisms of NO over ACFs/copper prepared by electrolytic copper plat- ing has been studied. It was found that copper content on carbon surfaces increased with increasing the plating time. However, a slightly gradual decrease of adsorption properties, such as, BET specific surface area, was observed in increasing the plating times within the range of well-developed micropore structures. As experimental results, nitric oxide was converted into the nitrogen and oxygen on ACFs and ACFs/copper catalyst surfaces at 500oC. Especially, the surfaces of ACFs/copper catalyst were found to scavenge the oxygen released by catalytic reduction of NO, which could be explained by the presence of another nitric oxide reduction mechanism between ACFs and ACFs/copper catalysts.

Key words: Activated Carbon Fibers, Copper-Plating, Surface Properties, NO Reduction, Adsorption

1.  

       

,    ! "#$% & '() *+, SO2 , SO3- ./01(SOx), 2, 3/#4, 56) #/4/01, 7 89 NO% NO2 4/01(NOx) -3 :. 33 ! *+;

<, = >?@! A% B CDE FGH )I JK 3  @! LMN :[1-4].

OP, QR S4$! LMT U)#4(activated carbons; ACs)

9V 6W@! 6X  QR YZ 7 [\)3 ]^ _

 9 :. U)#4 ` = ab cS d) e f

gh8ij , k, lm, no , [pq  , k, r s - & tohu vwxe o 9 :[5]. U)#4 y z?@! J{, |j, |*} , ~ 8 YZ ab cS, 

= , 789 F€= hf ‚/ ƒ 7 d)3 ‚e „:. …O :†O ab8‡ ˆe abd) ‚/‰Š  @H[6-9], d‹

pq Œf YZ 7 S)3 E ƒ T:9 LMN :[3, 10-16].

3O pqŽ [ NOx k f ‘?K pq@! Cuf LM N , Cu‡ #4 Œfe *}@! Cu W’“, ” copper nitrates … copper sulfates‡ o• [ #4 –? … –W*

} 3oe Œfe *}3 :[12-16]. 3O 8 pq

ŒfO ~ IU) “ … = [ —8e Ž‡ |O :. 7˜ 3 *} #4ab cS(pq anchoring sites) ,  8*}(T=G … o• 8 |™) YZ DE š ›

œ žZ 8 ‰B \’eH, d‹ —8 j NOx,

To whom correspondence should be addressed.

E-mail: [email protected]

(2)

SOxf 6Xe f :. YZ Ÿ‰B ‘?@! Cu‡ #4

 Œfe *} , U)#4 n ab V'„ Cu O NO k zt ¡¢ž£ e ¤’ ƒu ¥ ¦\f :.

OP, W§ Vp ¨©WJ@!©ª «z  W(f ¬­(cathode) b x pq3®@! W3e 4x ¬­zt § ¬­ab p q¯°3 )  @! LMN :[11, 17]. ±$²³ #4${ [ U)#4 n 3o„ ´ µ @! LMN :.

¶ ¤’ NO‡ ·4‰¸ f ‘?K pq@! LMT Cu‡

U)#4 n Œfe ¹!« U)#4 ab8 *} ‰

º?3 :. ” W§ » Vp(electrolytic copper-plating)*} 3oe

 U)#4 n‡ ab8eb, W§ » Vp O U)#4 n

 ab , =d) ‚/, 789 3‡ 3oO NO Ž QJ zt

¡¢ž£ e 9¼§ ½¾:.

2. 

2-1.   

¶ ¿À oO U)#4 n(ACFs) Iab?3 2,100 m2· g−1K :=) Á ! Taiwan Carbon |O polyacrylonitrile(PAN) à AW2001 oeÄ@H, 1) Table 1 ˜ÅÆÇ:. ÈÉ 8 e³ Ê U)#4 n‡ ËÌ 2-3ÍÎ €ÏO ~ Ð 80oC oven

 24‰B 3 ™|e ÑIeÄ@H, 3‡ abh", W§ ’8V p, 789 NO k ‰À ÒÒ oeÄ:. NO k ‰À 300 , 1,000 ppm NO/He fg‡ 3oe ÓeÄ:.

2-2.  

U)#4 n ’8Vp †­ ¬­ ÔK»Õ U)#4 n

‡ ÒÒ oeÄ@H, ‰B 0, 5, 789 10 sec! ‚/‰¸b W

§Vp ‰Ö:. Vp• , |™ Table 2 ˜Å× |) , |™ 3 oeÄ@H, WÌØV 60 A · m−2! 9j‰Ù 8eÄ:. 3Ú W

§Vp 8„ U)#4 n €Ï pHf ‚e³ Ê <²³ Ë Ì  ÍÎ €Ïe 150oC T=™| ÛW‹ ™| ‰ Ü ~, ab h" , NO k ‰À oeÄ:. 5Ý , 10Ý »Þ  8„ U)#4 n ab Vp„ ’8 † J(Áhv

(atomic absorption spectrophotometry, AAS)‡ oe _KeÄ9, 3

 ÒÒ ACF/Cu5% ACF/Cu103Z ßßeÄ:.

2-3. 

W§ ’8Vp 8„ U)#4 n , NO k zt ~ ‰{ ab àj/V% ab)h J4 ‚/‡ c¼e xO wide angle X-á  âh"(XRD) eÄ@H, source! CuKα‡ ÂO Rigaku Model D/

MAX-III B h" I‡ 3oe ãjeÄ:.

2-4.  

Ò ‰{ 573 K äÌ åæ 10−3 torr3e! n³O  ! Ð 5-6‰B »Þ r‰Ü ~, ASAP 2010(Micromeritics Co.) 3o e 77 K åæ(P/P0) Yç N2“ ÁÂè ãjeÄ:.

Iab? BETé 3oe -®ÁÂ@!©ª ÃeÄ:[18].

2-5. NO   

NO QJzt ¡¢ž£ zt! ®V‡ 500oC! e 0-200 min

²³ ãje êë½¾:. ztc "Dc(I.D. Φ=9 mm) oeÄ 9, NO fg nè ènq|â(mass flow rate controller, MFC)

! 10 ml.min−1! |âeÄ:. zt W~ zt1 X)1 h"

fg !ìí7îï(GC; Donam Instrument Inc.)‡ 3oe h"e Ä@H, ð+ — ñð+(thermal conductivity detector, TCD)‡

3oeÄ:. h" W Ò ‰{ zt! zt®V! 1‰B »Þ òó@! ôõe h keÄ:.

3. 

3-1. ACFs/Cu  !

W§ ’8Vp ¨©WJ@!©ª «z  W(f U)#4 nf

©Â ƒ ¬­(cathode)b x ’83®@! W3e U)#4  nab ’8¯° )‰¸ @! :¬ é (1) &3 ˜Åö

 :.

†­/zt: Cu→Cu+++2e (1)

¬­zt: Cu+++2e→Cu (2)

U)#4 n 60 A·m−2 WÌØV! 0, 5, 789 10Ý »Þ Vp

8 eÄ@H, Fig. 1 Vp ‰B Yç U)#4 n V'„ ’8

 † ˜ÅÆÇ:. Fig. 1 ˜Å× ÷% &3, ’8Vp 8 ‰B 3 øƒù YZ úú Ëfe RE ½Ä@H, 10Ý »Þ 8O U)#4 n ’8% U)#4 n ûIf Ð 1:2²³ Ëf eÄ:.

W§ ’8Vp 8O U)#4 n Iab? ‚/‡ êë½ x

Table 2. Composition and operating conditions of copper electroplating bath

Composition CuSO4 10 g/l

H2SO4 20 ml/l

Conditions

pH 1.0

Temperature 25±1oC

Current density 60 A · m−2

Table 1. Characteristics of the activated carbon fibers studied Characteristics

Precursor Polyacrylonitrile(PAN)

Type Fabric

Specific surface area(m2· g−1) 2121 Total pore volume(m3· g−1) 1.216 Micropore volume(m3· g−1) 1.145

Average pore diameter(Å) 12.7

Weight(g · m−2) 45±5

Thickness(mm) 0.3

Fig. 1. Copper quantification of the electrolytic Cu-plated activated carbon fibers measured by AAS.

(3)

 40 6 2002 12

e 10−6-10o åæ N2ÁÂè ãje ÁÂ-®á ’ eÄ@H, 3!©ª BETé 3oe Iab? ’eÄ:. Fig. 2

Vp‰B Yç U)#4 n Iab? ‚/‡ ˜Å×:. Fig. 2

 ½ ÷% &3 Vp ‰B3 øƒü U)#4 n Iab

?3 ÐBý ·4e RE ˜ÅÆÇ:. 3 W§ ’8Vp@! K e BET Iab?3 2,000 m2·g13@! þ 6ÿ ƒ  U)#

4 n =3 úÍ ’8f Vp YZ ³k˜ … °‹

±3 6X < K @! { ƒT:[10].

3-2.   "  # $%& NO  '()*

#4${f QJSæ f³9 : ¿ 3F þ LMN :

[5, 19]. 3O #4${ QJæ § o• 2$e  a ÑWx 3® W(‡ =e 3® J(f‡  ƒ k˜, p q 3® R  3®3  J4pq@! QJ‰Ù  @!

LMN :[5, 19]. NO U)#4 - & Ž § 4%  4! QJ;  @H, ztX)1! N2, CO, 789 CO2- ©

1 6X‰Ü:. 789 Chen -[20] :¬ & NO% #4%

zt ÞO ÷ :.

NO+ACF-C→ACF-CO+1/2 N2 (3)

CO+ACF-CO→CO2+ACF-C (4)

ACF-CO→CO (5)

, ACF-C% ACF-CO ÒÒ U)#4 n ab #4% 4 cS‡ ˜Å×:.

¶ ¤’ 500oC NO‡ ACFs/Cu Ž% Ž‰Ù 6Xe

 ztX)1 Ì , lV% WQ ³ Ê NO lV‡ ãje

 Ž QJ dõ 9¼§ ½¾@H, Fig. 3-5 7 à‡ ˜ ÅÆÇ:. Ž YZ ð+„ ztX)1 Ì , zt ~ QJ ³ Ê NO lVf : ˜Å:. ACFs CO2, N2, 789 zt

~  NOf ð+ Ç@H, ACFs/Cu5 N2% NOf, ACFs/Cu10

 N2œ3 ð+ Ç:. 3 NOf U)#4 n , ACFs/Cu Ž

% Ž ‰ NOf N2, CO2! WQ„:  ½H, 8e³ Ê U)#4 n% ACFs/Cu Ž 3 :ç ¡¢ž£3 2$e

  ½Ñ:. …O, 500oC zt‰ Ž —h§f 6Xe

³ _K xe TGAh" eÄ:. TGA h" à 500oC — h§ O weight ¿  ‰P 5% 3e! zt  DE

 FG³ Ê @! X҄:.

Fig. 3 500oC NO‡ Ž% Ž‰Ü ~ zt‰B YZ äÌ

e NO lV‡ ˜Å× 3:. Fig. 3 ½ ÷% &3 ACFs

Ie ACFs/Cu Ž‡ 3oO zt äÌ NO lVf ±É‹ · 4e  _K¥  Ç:. ACFs Ý Ð 20h²³ ©h

NO‡ WQ‰Š  Ç@˜, 7 3~©ª úÍ 8 )S O · 4‡ ½Ä@H, Ð 160-180hR 3 ] 3 QJSæ ˜Å Ƴ eÄ:. 3 yz?K U)#4f ³ž9  QJSæ3 ¤ q?@! ³q ³ e < K @! {„:. zb, W§ » Vp O ACFs/Cu5 R , Ý zt‰B 50h²³ ©h3 WQ Ç

@˜ WQ ³ Ê NO lVf ÐBý Ëfe:f, 50h 3~

ÝlV 12% Ñ QJ ³ Ê NOf ¤q?@! 6XeÄ:.

e³œ, ACFs/Cu10 R  zt Ý©ª NO Wè3 ¤q?@! z tX)1! WQ Ç <  W ztB ˆe NOf ð+ ³ ʾ:. 3 ’8 Vp † Yç » Vp„ U)#4 n ŽQJ

¥3 ‚/ Ç:  ½H, yjè 3 Cu lV

Ãq?K NOQJ zt ¥   @! { ƒT:.

Fig. 4 500oC ACFs , ACFs/Cu‡ 3oO ‰B Yç NO Q JŽ zt 6XO N2 † ˜Å× 3:. Fig. 4 ½ ÷

% &3, ACFs/Cu10 zt‰B »Þ Ãq  Ñ N2f 6X eÄ@H, ACFs/Cu5 ACFs/Cu10 &3  Ñ@! 6Xe

 N2f zt‰B Ð 50h²³ ÐBý ·4O , 7 Ñ Ãq n³ eÄ:. zb, ACFs N26Xè3 úÍ ·4e RE ½Ä:.

3 3F Fig. 3 ˜Å× NO 6XèV þ yGe @!, NO Fig. 2. BET’s specific surface area of ACFs/Cu catalysts produced by

copper electroplating. Fig. 3. Time dependence of the NO conversion on the the ACFs/Cu

Catalysts by copper electroplating(reaction temp.: 500oC).

Fig. 4. Time dependence of the N2 released on the ACFs/Cu Cata- lysts by copper electroplating (reaction temp.: 500oC).

(4)

f ACFs˜ ACFs/Cuab QJ YZ ztX)1! N2f 6X eH, NO lV ·4e9 N2 lV Ëfe < K @! X Ò ƒ T:.

Fig. 5 500oC W§ » Vp 8O U)#4 n NO QJ

Ž zt 6XO CO2 6Xè ˜Å× 3:. Fig. 5 ½

÷% &3, CO2 W§’8 Vp 8O ACFs/Cu W 6Xe

³ Ê@˜, ACFs NOf U)#4 n ab QJzt3 yƒ

˜ »Þ 300-60 ppm Ñ@! 6Xe:f NO QJ Sæ ¿e

‰ú©ª ð+ ³ ʾ:. 3 U)#4 n ab V'„ Cu f NO QJzt Ž ¥ ÓÔ ƒ 3 ŽQJj 6 Xe 4‡  ¥ e < K @! {„:.

Fig. 3, 4, 789 5!©ª 500oC ACFs% ACFs/Cu O NO

 ŽQJ zt 6Xe X)1 Ñ  Ø O cà f  @! { H, W§Vp@! Cuf V'„ U)#4 n

(ACFs/Cu)% Cuf V' ³ Ê U)#4 n(ACFs) 3 !

:ç zt ¡¢ž£3 2$e @! XÒ ƒ T:.

3F é (4)% (5) ˜Å ÷% &3 U)#4% zt CO2

˜ CO 6X3 ´ã H, Fig. 5 CO2f 6Xe  _K O ÷

:. W§ ’8 Vp„ ACFs/Cu Ž R  CO2f 6Xe³ Ê

 @!  <, ACFs ›œ žZ CuV ƒ jV /  !

f @! XÒ ƒ T:.

ACFs/Cu% NO zt! 9¼e xe XRD ãj ˆe

ab ‚/‡ êë½¾:. Fig. 6 ACFs , Cu W§Vp † Yç ACFs/Cu X-á â RE ˜Å× 3:. Fig. 6 ½ ÷% &

3 ACFs 2θ=20 © #4 d) ¯ ‡ ˜ÅÆ ûj ¯ f

˜Å@H, ACFs/Cu ûj ¯ % Ô" 2θ=43 50 ©

Cu‡ ˜ÅÆ àj) ¯ f c¼ Ç:. 3 U)#4 n ab

pq ’8f 2$e  ½ @!, W§ » Vp ˆe

#ƒT U)#4 n ab V'„ ’8   $O pq Cu%

 L  Ç:.

Fig. 7 NO-ACFs … NO-ACFs/Cu QJŽzt ~ ACFs , ACFs/

Cu ‰{ X-á â RE ˜Å× 3:. Fig. 7 ½ ÷% &

3 ACFs X-á RE NOQJ ztW I&§ < nO ‚/f

˜Å˜³ Ê  _K¥  Ç:. zb, ACFs/Cu R  2θ=43

 50 © Cu‡ ˜ÅÆ àj) ¯ f 'è ·4Ô »‰

2θ=36 42© Cu2O‡ ˜ÅÆ àj) ¯ f ¹( ) Ç:.

3 U)#4 n V' Ç Cuf 500oC NO‡ QJ‰Š <, 6Xe 4‡   ¥ e < K @! { ƒT:.

NO% zt ‰ ‰B3 úú øƒü NO% ztO Cuf ]^ ]  /  ³‡ êë½ x§ 200h »Þ Ž QJzt 3ƒ ACFs/

Cu10 24‰B »Þ f Žzt ‰¸b ztX)1 lV‡ jè eÄ@H, 24‰B ~ X-á RE êë½¾:. 24‰B ~, zt X)1

 lV 200h 6XO ztX)1 nO Í3 µ3 Ãq 7  Ñ n³eÄ:. ”, NO, CO2, O2 ð+ µÇ@H N2œ ð+ Ç:.

Fig. 8 ACFs/Cu10 24‰B NOŽQJ zt ~ ab X-á R E ˜Å× 3:. Fig. 8 ½ ÷% &3 ûj ¯ % Ô"

2θ=43 50 © Cu‡ ˜ÅÆ àj) ¯ f c¼ Ç:. 3

ACFs/Cu10 ab  ’8   NO ŽQJ zt W 

»yO pq Cu  ! 2$e  ½ Ñ:9 e):. YZ

ACFs/Cu10 O NOŽQJ zt ƒ 6Xe 4 *+

 N(O)→ACF/Cu2(O)→ACF-C(O)K @! XÒ ƒ T:. 789 9® 4 lVf  R NOf #4 Á„ ~ N2 *+

Ô" #4ab /1 X)‰¸ @! LMN :[20, 21]. ¶

¤’ à , :ç ¤’[20, 21] à‡ 9M§  <, W§ ’8Vp

 ˆe )„ ACFs/Cu Ž U)#4˜ –? , ûW§ Vp

8 O Ž½: ]  QJæ f³H, :¬ & QJ ¡¢

ž£ f³ @! { ƒT:.

NO+ACF-Cu→ACF-Cu2O+1/2N2 (6)

ACF-Cu2O→ACF-Cu+ACF-CO+ACF-CO2 (7)

Fig. 5. Time dependence of the CO2 released on the ACFs/Cu Cata- lysts by copper electroplating (reaction temp.: 500oC).

Fig. 6. X-ray diffraction profiles of the ACFs/Cu catalysts by electro- lytic copper plating: (a) ACFs, (b) ACFs/Cu5 and (c) ACFs/Cu10.

Fig. 7. X-ray diffraction profiles after the NO-ACFs/Cu catalysts reac- tion at 500oC: (a) ACFs, (b) ACFs/Cu5 and (c) ACFs/Cu10.

(5)

 40 6 2002 12

Fig. 9 ACFs/Cu ab  ‡ ½ SEM T3:. Fig. 9

 ½ ÷% &3 ’8Vp 8 ‰B3 øƒù YZ úú Ëfe

 RE ½Ä@H, 3 Vp 8 ‰B ÿ8e ACFs V'

 Cu † |⥠ ¬ ½Ñ:. …O, ACF ab V'„

Cu § =3 '©h °, ± ˜Åö @! {„:.

4. 

¶ ¤’ W§ Vp ˆe ACFs/Cu Ž‡ |eÄ@H, 3‡ 3oe NO Á , QJk» FG DE e 9¼§

½¾:. W§Vp ‰B3 ËfÔ YZ #4ab ’8 † úÍ ËfeÄ@˜, U)#4 n Á d)K þ 6ÿ„ Iab? -

=’| ÐBý ·4e RE ½Ä:. U)#4 n , U)#4  n/Cu Ž ab 500oC! NO‡ zt‰Ö < NOf N2 , O2

! QJ   _KeÄ:. d‹, U)#4 n/Cu Ž‡ oO z t Žzt [ 6Xe 4‡ Žab  @!

˜Å:. 3 ¶ ¤’ à‡ 9M§  <, W§ ’8Vp ˆe

)„ ACFs/Cu Ž U)#4˜ –? , ûW§ Vp O Ž

½: ]  QJæ f³H 3 :ç QJ ¡¢ž£ f³

@! { ƒT:.

 

¶ ¤’ >-© >-. /(M1-0105-00-0059) ³ J e ÓeÄ@H, 3 · /0ž:.



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HWAHAK KONGHAK, 40, 133(2002).

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Chapman & Hall, London(1993).

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Fig. 8. X-ray diffraction profiles after the NO-ACFs/Cu10 catalysts reaction at 500oC in 24 h.

Fig. 9. SEM micrographs of ACFs and ACFs/Cu(×4,000): (a) ACFs, (b) ACFs/Cu5 and (c) ACFs/Cu10.

수치

Table 2. Composition and operating conditions of copper electroplating bath Composition CuSO 4 10 g/l   H 2 SO 4  20 ml/l Conditions pH 1.0Temperature  25 ± 1 o C Current  density 60 A · m−2
Fig. 4. Time dependence of the N 2  released on the ACFs/Cu Cata- Cata-lysts by copper electroplating (reaction temp.: 500 o C).
Fig. 8  ACFs/Cu10 24‰B NOŽQJ zt ~ ab X-á R E ˜Å× 3:. Fig. 8 ½ ÷% &amp;3 ûj ¯	% Ô&#34;
Fig. 8. X-ray diffraction profiles after the NO-ACFs/Cu10 catalysts reaction at 500 o C in 24 h.

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