«Y c l Æ X Øy ¢ Q V À W ¥ ÇÊ Ý

(1)

°

Ç ¤ Ó Þu 0 n É® z º V R ËX ê sc Ü R ZnO x ¢ T c l6 8 ý ºX ì Ä ¤V R Ë; c nucleation layer8 ý

Ö

«Y c l Æ X Øy ¢ Q V À W ¥ ÇÊ Ý

: c+ ä · ¤ . > · % · n* × <P v ^∗ · »0 ï FV ^†

Â

Òí ß @ / < Æ § ¸& ñ Ð èF / B N < Æõ x 9 ¸Ö 6 x ½ + Ël Õ ü t < Æõ , x 9 ª 627-706

V ê T Ö h

Â

Òí ß @ / < Æ § ¸õ < Æl Õ ü t < ÆÂ Ò, x 9 ª 627-706

כ ÒU + Ö <

Â

Òí ß @ / < Æ § Ä » ^ Ó ü t$ í ½ ¨ è, Â Òí ß 609-735

» xZ 9 · Ð . > 0 ï F

Â

Òí ß @ / < Æ § Ó ü t o < Æõ , Â Òí ß 609-735 (2008¸ 10 Z 4 28{ 9 ~ Ã Î6 £ §)

:

r ½ ¨\ " f H Pt (111)/TiO

2

/SiO

2

/Si (100) l ó ø Í\ 7 £ x Ã Ì : r ¸\ ¦ o (100, 300, 600

^◦

C) r v " f ZnO nucleation layer\ ¦ ` O Û ¼ Y Us $ 7 £ x Ã ÌZ O Ü ¼ Ð $ 7 £ x Ã Ìô Ç 6 £ § \ P Ã º6 xÓ o ~ ½ ÓZ O ` ¦ s 6 x # ZnO

¸ } @ /\ ¦ ] j % i . 7 £ x Ã Ì : r ¸ Z }` ¦ Ã º2 ¤ c ~ ½ Ó ¾ Ó & ñ § > = ¸\ ¦ ZnO nucleation layer_ ¿ ºa ü <

Õ

ªY U _ ß ¼l x 9 ³ ð _ } 9 l 7 £ x % i . \ P Ã º6 xÓ o Z O ` ¦ s 6 x # ZnO ¸ } @ /\ ¦ ] j % i

`

¦ M :, nucleation layer ³ ð _ } 9 l & h ` ¦ Ã º2 ¤ Ó ü æg Ë > & ³ © s { 9 # Q t 2 £ § s H ZnO ¸ } @ /

]

j ÷ &% 3 . Õ ª Q nucleation layer ³ ð _ } 9 l 9 þ t Ã º2 ¤ t 2 £ § s É r ZnO ¸ } @ / + þ A$ í ÷ &

% 3 .

PACS numbers: 61.46.+w, 61.66.Fn, 68.55.J Keywords: í ß o ¸} @ /, 7 £ x Ã Ì : r ¸, \ P Ã º6 xÓ oZ O

I. " e Â ] Ø

ZnO H V , É r \ -t ½ × ¼Ì s (3.37 eV)` ¦ t ¦ e ¦,

© : r \ " f ¸ î ß & ñ ô Ç " l or : r ½ + Ë \ -t (60 meV)\ ¦

f ] X ;s ì ø Í ¸^ Ó ü t| 9 s . ¢ ¸ô Ç, ¸i ç Ó ü t| 9 \ ZnO ? /_ _ s 1 l x ¸\ ¦ ~ 1 > Ü ã J Ã º e # Q ì ø Í ¸^ F

K5 Å q $ í | 9 ` ¦ Ó ü t| 9 Ð ] j# Q 6 x s Ù ¼ Ð µ 1 Ï F g s

¸× ¼, Û ¼G ' p" fl , C o Û ¼' , ~ ½ ÓØ ¦ l 1 p x [1–4] F g

è _ èF Ð V , o 6 x ) a . þ j H ´ ú § É r ' a d _ @ / ©

2 ;¨ 8 â \ -t èF × æ % i « Ñ y 6 £ x+ þ A I ª t

\

" f TiO

2

\ ¦ @ /^ ½ + É Ó ü t| 9 Ð ¸ ´ ú § É r ½ ¨ ' ÷ & ¦ e

[5,6].

ZnO H wurtzite ½ ¨ ¸\ ¦ ñ 9 13t ~ ½ Ó ¾ ÓÜ ¼ Ð $ í

© H : £ ¤$ í ` ¦ t ¦ e # Q ª ô Ç ¸ ½ ¨ ¸Ó ü t ] j s

∗

E-mail: [email protected]

†

E-mail: [email protected]

0 p x . ¸ , ¸ c ± , ¸ 6 \ à Ô, ¸ Z þ t, ¸ á

Ô Ð: \ Q 1 p x ª ô Ç ¸ ½ ¨ ¸Ó ü t s ] j ÷ &# Q # Q 7 Hë H

`

¦ : x K è> h÷ &% 3 [7–9]. Õ ª × æ \ " f ¸ } @ / H { 9 & ñ ô Ç

~

½ Ó ¾ Ó$ í õ B Ä º V , É r ³ ð & h ` ¦ t ¦ e ¦, _ Á º 0

A& h î r1 l x` ¦ ] jô Ç # ô Ç ~ ½ Ó ¾ ÓÜ ¼ Ð â ì\ ¦ Ã º e > Ù ¼ Ð 6

£

x6 x$ í s Z } ´ ú §s ½ ¨÷ & H ¸ ½ ¨ ¸Ó ü t × æ \ s

. ¢ ¸ô Ç ZnO ¸ } @ / H Ä ºÃ ºô Ç $ í © ~ ½ Ó ¾ Ó$ í Ü ¼ Ð

#

TiO

²

¸ È ÓÚ Ô ] j ` ¦ 0 Aô Ç ¦& ñ % 7 e ¦a Å @Ü ¼ Ð 6 x ÷ &

l

¸ ô Ç [10]. ¸ } @ /\ ¦ ë ß × ¼ H ~ ½ ÓZ O \ H l o < Æ

&

h ~ ½ ÓZ O (electrochemical method), ì r Ä »l Ó ü t o < Æ 7 £ x

Ã

ÌZ O (molecular organic chemical vapor deposition), n

¸ Å Ò Ã º Û ¼( ' a A ~ ½ ÓZ O (radio-frequency sputtering method) 1 p x s e . : £ ¤ y , \ P Ã º6 xÓ o ~ ½ ÓZ O (hydrothermal method) É r ] j õ & ñ s ç ß é ß ¦, © · ú õ $ : r ¸| \

"

f ¸ ¸ } @ /\ ¦ ½ + Ë$ í ½ + É Ã º e ¦, @ / & h ] j s 6 x s

¦, q 6 x s & h > [ þ t # Q" f @ /| ¾ Ó Ò q tí ß _ © & h ¸ t m ¦ e Ü

¼ , ¸ } @ /_ x 9 ¸ü < ½ ©g Ë :$ í , ~ ½ Ó ¾ Ó$ í \ @ /ô Ç ] j# Q

-422-

(2)

ZnO nucleation layer ZnO nanorod arrays

Deposition Diameter Surface Number

temperature Thickness

of grain root-mean-square Length Diameter

Density

(

^◦

C) (nm) (nm) (nm) (µm) (nm) (number/µm

²

)

100 75 15.3 3.426 5.75 480 20

300 84 17.4 6.813 3.2 360 36

600 180 28.5 7.182 3.0 350 70

~ 1 t · ú § H é ß & h ¸ e . \ P Ã º6 xÓ o` ¦ s 6 x # ¸ }

@ /\ ¦ ½ + Ë$ í ¦ ½ + É M :, ì ø Í× ¼r l ó ø Í 0 A\ } × ¼ > r F

K ô Ç . } × ¼ H ¸ } @ / Ã º6 xÓ o 5 Å q \ " f ½ + Ë$ í | ¨ c Ã

º e ¸2 ¤ ¸ü <Å Ò H % i ½ + É` ¦ 9 } × ¼_ ½ ¨ ¸& h : £ ¤$ í s

¸ } @ /_ ½ ¨ ¸& h : £ ¤$ í ` ¦ & ñ ô Ç . } × ¼ 8 £ x _ e > ¿ º a

, ³ ð + þ AI , Õ ªY U 1 p x s ¸ } @ / µ 1 Ï_ $ í © \ % ò

¾ Ó` ¦ ï r H # Q ½ ¨ õ [11–13] Ð ¦÷ &% 3 Ü ¼ f

t # Q " כ ¹ \ @ /ô Ç { 9 ' a$ í e H $ í © : £ ¤$ í É r Ð ¦

÷

&t · ú § É r כ Ü ¼ Ð ó ø Íé ß ) a .

: r ½ ¨\ " f H 7 £ x Ã Ì : r ¸ É r ¸| \ " f $ í © ) a ZnO nucleation layer _ ½ ¨ ¸& h : £ ¤$ í õ ZnO nucleation layer 0 A\ \ P Ã º6 xÓ o ~ ½ ÓZ O ` ¦ s 6 x # $ í © ô Ç ZnO ¸ }

@ /_ ~ ½ Ó ¾ Ó$ í , Ã ºx 9 ¸, Õ ªo ¦ t 2 £ § \ p u H % ò ¾ Ó` ¦

½

¨ % i .

II. ÷ m Ç ] M ö

ZnO nucleation layer H ` O Û ¼ Y Us $ 7 £ x Ã ÌZ O (pulsed laser deposition method, s PLD)` ¦ s 6 x # Pt (111)/TiO

2

/SiO

2

/Si (100) 8 £ x l ó ø Í 0 A\ [ j t 7 £ x Ã Ì

: r ¸ (100, 300, 600

^◦

C) \ " f ] j ÷ &% 3 . Õ þ ! Q (chamber)

?

/\ 3.0 × 10

⁻²

Torr _ í ß è ì r 0 Al \ ¦ ¸$ í ¦ 30ì r 1

l

x î ß KrF Y Us $ (248 nm, COMpex 102)\ ¦ 6 x # 5 Hz Ð ZnO e ¦µ ¡ § (plume)` ¦ Ò q t$ í r ( . 0.04mol/L_ zinc nitrate hexahydrate [Zn (NO

₃

)

₂

· 6H

₂

O] ü < 0.04mol/L_ hexamethylenetetramine (HMT) [C

₆

H

₁₂

N

₄

] _ 6 xÓ o` ¦ D ¥

½

+ Ëô Ç Ê ê, D ¥ ½ + Ë 6 xÓ o 5 Å q \ ï r q ) a ZnO nucleation layer\ ¦ {

Õ ª ¦ 95

^◦

C Ð Ä »t ) a o Ð (furnace) 5 Å q \ " f 8r ç ß 1 l x î

ß ì ø Í6 £ x r ( . $ í © ) a ZnO ¸ } @ / r « Ñ H Í t y

r + ' 7 £ x À ÓÃ º Ð [ j' ¦ © · ú \ " f | ¸r (

. Nucleation layer 0 A\ $ í © ) a ¸ } @ /[ þ t _ ½ ¨ ¸

&

h : £ ¤$ í É r " é ¶ ç ß § 4 & ³p â (atomic force microscopy, AFM, Seiko Instruments SPA400), > ~ ½ Ó + þ A & ³p â (field emission scanning electron microscopy, FE-SEM, Hitachi S-4700) õ " l oÛ ¼ r] X ì rF g l (X -ray diffraction spectroscopy, XRD, Bruker D8 Advance, λ=1.54 ˚ A)\ ¦

6 x # ì r$ 3 % i .

Fig. 1. The XRD data of the ZnO seed layer with differ- ent deposition temperature.

III. + s ÇÊ Ý õ m Í ºÂ ] Ø

Fig. 1 É r ZnO nucleation layer _ X r] X θ − 2θ 8 £ ¤& ñ

õ s . Fig. 1\ " f l ó ø Í\ _ ô Ç x ß ¼ s ü @\ ZnO [002]

~

½ Ó ¾ Ó\ _ ô Ç x ß ¼ë ß ' a8 £ ¤ ÷ & H & h Ü ¼ Ð p À Ò# Q l ó ø Í 0 A

\

ZnO nucleation layer ¸ ú + þ A$ í ÷ &% 3 6 £ §` ¦ · ú Ã º e .

ZnO nucleation layer _ Õ ªY U (grain) ß ¼l H ZnO [002]

i

_ ì ø Íg Ë :; ¤ ° ú כ` ¦ Scherrer ~ ½ Ó& ñ d [14]\ & h 6 x # > í ß

% i . Õ ªY U _ f â É r 7 £ x Ã Ì : r ¸\ y y 15.3, 17.4, 28.5 nm s % 3 Ü ¼ 9, : r ¸ 600

^◦

C â Ä º 100

^◦

C { 9

M : Ð 2C & ñ ¸ 8 ( . " f Õ ªY U _ & h É r 4 C 7 £ x % i 6 £ §` ¦ · ú Ã º e .

Fig. 2 H 7 £ x Ã Ì : r ¸\ É r ZnO nucleation layer ¿ ºa ü

< Õ ªY U f â ß ¼l _ o\ ¦ · p Õ ªA á Ôs . 7 £ x Ã Ì

: r ¸ 100, 300, 600

^◦

C \ " f $ í © ) a nucleation layer _ ¿ º a

H y y 75, 84, 180 nms 9 Õ ªY U _ ß ¼l ¸ 7 £ x Ã Ì : r

¸ Z }` ¦ Ã º2 ¤ 15 nm \ " f 30 nm Ð & h & h & & .

Fig. 3 É r 7 £ x Ã Ì : r ¸ É r nucleation layer \ " f ê

ø Í ZnO ¸ } @ /[ þ t _ FE-SEM s p t s . Fig. 3 (a)

∼ (c) ? /\ ¶ ú { 9 ) a Õ ªa Ë >[ þ t × æ \ " f ý a8 £ ¤ © Â Ò_ y Õ ª

(3)

Fig. 2. The thickness of ZnO seed layer and grain size with different deposition temperatures.

a Ë

>[ þ t É r ZnO ¸ } @ /_ é ß s p t s ¦, ý a8 £ ¤ Â Ò _

y Õ ªa Ë >[ þ t É r ZnO nucleation layer _ s p t [ þ t s

. Ä º8 £ ¤ É r ZnO ¸ } @ /[ þ t _ s p t [ þ t s .

Fig. 3 (a) ∼ 3 (c) ý a8 £ ¤ Â Ò Õ ªa Ë >\ " f ^ ¦ Ã º e 1 p w s , 7

£

x Ã Ì : r ¸ Z }` ¦ Ã º2 ¤ nucleation layer _ ³ ð } 9 l

7 £

x % i Ü ¼ 9, Ä º8 £ ¤ Õ ªa Ë >\ " f H $ í © ) a ZnO ¸ } @ / _

t 2 £ § s nucleation layer ³ ð } 9 l 9 þ t Ã º2 ¤ t

H â ¾ Ó` ¦ Ð% i . Nucleation layer_ ³ ð © I ü < $ í

© ) a ZnO ¸ } @ / t 2 £ § _ ' a$ í ` ¦ ¸ l 0 A #

"

é

¶ ç ß § 4 & ³p â (AFM)` ¦ 6 x # nucleation layer ³ ð

} 9 l _ ¨ î ç H ] jY L H (root-mean-square)` ¦ 8 £ ¤& ñ

%

i . Table 1\ " f nucleation layer ³ ð } 9 l _ ¨ î ç H ]

jY L H É r nucleation layer _ ¿ ºa ¿ º 0 >| 9 Ã º2 ¤ 7 £ x

< Ê` ¦ S X % i . : r ½ ¨\ " f H 7 £ x Ã Ì : r ¸ © 5 p x

³

ð _ } 9 l ¸ 7 £ x % i H X <, s H ³ ð _ } 9 l ü <

7 £

x Ã Ì : r ¸_ { 9 ì ø Í& h © ' a õ ü < ¸ ú { 9 u ô Ç [15,16].

¢

¸ô Ç Table 1\ ZnO ¸ } @ /_ U ´s , t 2 £ §, Ã ºx 9 ¸ ¸

< Êa ³ ðr % i . 100

^◦

C \ " f nucleation layer\ ¦ $ í © r (

` ¦ â Ä º, ¸ } @ /_ U ´s H 300

^◦

C ü < 600

^◦

C \ " f nucleation layer\ ¦ $ í © r ( ` ¦ M :ü < q § # 2C & ñ

¸ U ´% 3 . : r z ´+ « >s 1 l x{ 9 ô Ç 0 l x ¸ü < ] j ¸| \ " f s À

Ò# Q& Ü ¼Ù ¼ Ð SEM s p t \ ¦ s 6 x # ¸ } @ /_ Ã º x 9

¸ü < Â Òx \ ¦ > í ß # 8 ú x ZnO ¸ } @ /_ Â Òx 1 l x { 9

< Ê` ¦ · ú Ã º e % 3 . " f ¸ } @ /_ Ã ºx 9 ¸ & h

É r 100

^◦

C \ " f 2C | ¸ } @ /\ ¦ ' a8 £ ¤ ½ + É Ã º e % 3 .

¢

¸ô Ç ZnO ¸ } @ /_ f â s nucleation layer_ 7 £ x Ã Ì

: r ¸ 7 £ x ½ + ÉÃ º2 ¤ y è H â ¾ Ó` ¦ Ð% i . Nucleation layer ³ ð s } 9 " é ¶ ì r é ß 0 A_ { 9 [ þ t s 2 ;

_ Y J s À Ò Â Òì r õ ° ú É r / B M \ ² D G è& h Ü ¼ Ð ¸# H é # Qo \ ¦ Ò q t$ í ¦ ¸ } @ /_ t 2 £ § s ¿ º 0 >| 9 כ Ü ¼

Fig. 3. The SEM images of the ZnO nanorod arrays with different deposition temperatures for the seed layers (a) 100

^◦

C (b) 300

^◦

C, and (c) 600

^◦

C. The inset images are the cross section of the ZnO nanorod (left-up) and the front view of the surface of the seed layer (left-down), respectively.

¸ } @ /\ ¦ ' a ¹ 1 Ï % i . Nucleation layer_ 7 £ x Ã Ì : r ¸

± ú ` ¦ â Ä º\ H ZnO _ c ~ ½ Ó ¾ Ó & ñ § > = ¸\ ¦ Õ ªY U s

_ ß ¼l ¦, ª ô Ç ~ ½ Ó ¾ Ó` ¦ ZnO Õ ªY U [ þ t s ì

(4)

&

h Ü ¼ Ð Ï ã T É r ¸ } @ / + þ A$ í ÷ &% 3 . ì ø Í , Z } É r : r ¸

\

" f H ZnO { 9 [ þ t s l ó ø Í_ ³ ð \ " f î r1 l x l \ Ø æì r ô

U _ ß ¼l ¸ & . Nucleation layer_ Õ ªY U _ ~ ½ Ó

¾ Ó$ í s Ä ºÃ º l M :ë H \ ¸ } @ / + þ A$ í ÷ & H õ & ñ \

"

2 £ § s É r ¸ } @ /[ þ t s ´ ú §s Ò q tl > ) a .

IV. + s Ç Â ] Ø

: r ½ ¨\ " f H 100, 300, 600

^◦

C \ " f ZnO nucleation layer\ ¦ ] j ¦ \ P Ã º6 xÓ o Z O ` ¦ s 6 x # ZnO ¸ }

@

/ µ 1 Ï` ¦ ] j % i . 600

^◦

º ¦ ¸ } @ /_ t 2 £ § s ¤~ ì ø Í , 100

^◦

C \ " f ] j

) a nucleation layer 0 A_ ZnO ¸ } @ /[ þ t É r íl Ù þ + þ A

$ í

õ & ñ \ " f Ø æì r ô Ç \ -t / B N/ å L ~ Ã Ît 3 l w # nucleation layer / B M/ B M \ ¸ } @ /\ ¦ + þ A$ í ¦ } @ / s ç ß \ Ó ü æ g Ë

, ¸ } @ / t 2 £ §, U ´s , ³ ð & h 1 p x \ H % ò ¾ Ó` ¦ z ' ¬ IÜ ¼ 9, nucleation layer ³ ð _ } 9 l \ ¸ íl ¸ } @ / + þ

A$ í \ Å Òכ ¹ô Ç % i ½ + É` ¦ % i .

P

c p 8 ý ò k >

: r ½ ¨ H Â Òí ß @ / < Æ § Ä »õ ] j < ÆÕ ü t ½ ¨q (2¸ )\ _

# ½ ¨÷ &% 3 6 £ §.

Y

c p w Ã U Ø ô

[1] Sun-Hong Park, Seon-HyoKim and Sang-Wook Han, Nanotechnology 18, 055608 (2007).

[3] R. T. Rajendra Kumar, Enda McGlynn, Conor McLoughlin, Subhananda Chakrabarti, Richard C.

Smith, J. David Carey, J. P. Mosnier and Martin O.

Henry, Nanotechnology 18, 215704 (2007).

[4] Yong-Jin Kim, Jinkyoung Yoo, Byoung-Hwa Kwon, Young Joon Hong, Chul-Ho Lee and Gyu-Chul Yi, Nanotechnology 19, 315202 (2008).

[5] M. Law, L. E. Greene, J. C. Johnson, R. Saykally and P. Yang, Nature Materials 4, 455 (2005).

[6] Brian O’Regan and Michael Gratzel, Nature 353, 737 (1991).

[7] Y.F. Hsu, A.B. Djuriˇ si´ c and K. H. Tam, J. of Crystal Growth 304, 47 (2007).

[8] Hong Jin Fan, Amanda S. Barnard and Margit Zacharias, Appl. Phys. Lett. 90, 143116 (2007) [9] Aleksandra B. Djuriˇ si´ c and Yu Hang Leung, Small

2, 944 (2006).

[10] Jijun Qiu, Zhengguo Jin , Zhifeng Liu, Xiaoxin Liu , Guoqi Liu ,Weibing Wu , Xia Zhang and Xiangdong Gao, Thin Solid Films 515, 2897 (2007).

[11] Jaejin Song and Sangwoo Lim, J. Phys. Chem. C 111, 596 (2007).

[12] Chun Li, Guojia Fang, Jun Li, Lei Ai, Binzhong Dong and Xingzhong Zhao, J. Phys. Chem. C 112, 990 (2008).

[13] Jun Liu, Juncong She, Shaozhi Deng, Jun Chen and Ningsheng Xu, J. Phys. Chem. C 112, 11685 (2008).

[14] B.E. Warren, X-ray Diffraction (Dover publications, Inc., New York, 1990), Chap 13, p. 253.

[15] Jeung Hun Park, Jong Moon Shin, Su-Young Cha, Jin Woo Park, Se-Young Jeong, Hyuk K. Park and Chae-Ryung Cho, J of Korean Phys. Soc. 49, S584 (2006).

[16] Xiao-Ping Zheng, Pei-Feng Zhang and Duo-Wang

Fan, in Proceedings of Nano-Optoelectronics Work-

shop, 2007.i-NOW’07. International (Beijing, 2007),

p. 308.

(5)

Effect of Deposition Temperature of the Nucleation Layer on the Structure of ZnO Nanorod Arrays Grown by Using a Hydrothermal

Method

Se-jeong Park, Weizhen He, Yoon-Hwae Hwang

^∗

and Hyung-Kook Kim

^†

Department of Nanomaterials Engineering & BK 21 Nano Fusion Technology Division,

Pusan National University, Miryang 627-706

Wan Namgung

School of Nanoscience and Nanotechnology, Pusan National University, Miryang 627-706

Jijun Qiu

Research Center for Dielectric and Advanced Matter Physics (RCDAMP) Pusan National University, Busan 609-735

Cheol Hwan Kim and Jin Hyung Cho

Department of Physics, Pusan National University, Busan 609-735 (Received 28 October 2008)

The effect of deposition temperature of the nucleation layer on the structure of ZnO nanorod arrays was studied. The ZnO nucleation layer was deposited on a Pt (111)/TiO

2

/SiO

2

/Si substrate at different temperatures by using a pulsed laser deposition method; then, ZnO nanorods were fabricated on top of the nucleation layer by using a hydrothermal method. We found from an X-ray experiment that the direction of the deposited ZnO nucleation layer was the [002] direction. We also found that the thickness and the surface roughness of the nucleation layer increased as the deposition temperature increased. The radius of the ZnO nanorod arrays depended inversely on the roughness of the seed layer; i.e., the radius of the ZnO nanorod was bigger when the roughness of the nucleation layer was smaller.

PACS numbers: 61.46.+w, 61.66.Fn, 68.55.J

Keywords: ZnO nanorod, Seed layer, Deposition temperature

∗

E-mail: [email protected]

^†

E-mail: [email protected]

«Y c l Æ X Øy ¢ Q V À W ¥  ÇÊ Ý

° 

Ç ¤ Ó Þu   0 n É® z º V R ËX ê sc Ü R ZnO x ¢ T c l6 8 ý   ºX ì Ä  ¤V R Ë; c nucleation layer8 ý

 Ö

«Y c l Æ X Øy ¢ Q V À W ¥  ÇÊ Ý





: c+ ä  · ­ ¤ . > · % · n* × <P v ∗ ·  »0 ï FV   †

Â

Òí ß @ / < Æ §  ¸& ñ  Ð èF / B N  < Æõ  x 9  ¸Ö 6 x ½ + Ël Õ ü t  < Æõ , x 9  ª  627-706





V ê T Ö h

Â

Òí ß @ / < Æ §  ¸õ  < Æl Õ ü t  < ÆÂ Ò, x 9  ª  627-706

כ ÒU + Ö <

Â

Òí ß @ / < Æ § Ä »  ^ Ó ü t$ í   ½ ¨ è, Â Òí ß  609-735

 »  xZ 9  ·  Ð . > 0 ï F

Â

Òí ß @ / < Æ § Ó ü t o  < Æõ , Â Òí ß  609-735 (2008¸  10 Z 4 28{ 9  ~ Ã Î6 £ §)

 :

r   ½ ¨\ " f  H Pt (111)/TiO

/SiO

/Si (100) l ó ø Í\  7 £ x  Ã Ì  : r  ¸\  ¦   o (100, 300, 600

C) r v   " f ZnO nucleation layer\  ¦ ` O Û ¼ Y Us $  7 £ x  Ã ÌZ O Ü ¼ Ð   $  7 £ x  Ã Ìô  Ç 6 £ § \ P Ã º6 xÓ  o ~ ½ ÓZ O `  ¦ s 6 x #  ZnO

 ¸ }  @ /\  ¦ ] j   % i  . 7 £ x  Ã Ì  : r  ¸ Z  }`  ¦ Ã º2  ¤ c ~ ½ Ó ¾ Ó & ñ § > = ¸\  ¦   ZnO nucleation layer_  ¿ ºa ü <

Õ

ªY U  _  ß ¼l  x 9 ³ ð  _   } 9 l  7 £ x  % i  . \ P Ã º6 xÓ  o Z O `  ¦ s 6 x #  ZnO  ¸ }  @ /\  ¦ ] j   % i 

` 

¦ M :, nucleation layer ³ ð  _   } 9 l  & h `  ¦ Ã º2  ¤ Ó ü æg Ë >  & ³ © s  { 9 # Q  t 2 £ § s   H ZnO  ¸ }  @ /

]

j  ÷ &% 3  . Õ ª Q  nucleation layer ³ ð  _   } 9 l  9 þ t Ã º2  ¤ t 2 £ § s     É r ZnO  ¸ }  @ / + þ A$ í ÷ &

% 3  .

PACS numbers: 61.46.+w, 61.66.Fn, 68.55.J Keywords: í ß  o    ¸}  @ /, 7 £ x  Ã Ì : r  ¸, \ P Ã º6 xÓ  oZ O 

I. " e Â ] Ø

ZnO  H V ,  É r \  -t   ½ × ¼Ì  s (3.37 eV)`  ¦ t  ¦ e   ¦,



©  : r \ " f ¸ î ß & ñ ô  Ç " l or  : r   ½ + Ë \  -t  (60 meV)\  ¦ 



 f  ] X   ;s  ì ø Í ¸^  Ó ü t| 9 s  . ¢ ¸ô  Ç,  ¸i ç Ó ü t| 9 \     ZnO ? /_     _  s 1 l x  ¸\  ¦ ~ 1 >   Ü ã J Ã º e  # Q ì ø Í ¸^   F

K5 Å q $ í | 9 `  ¦   Ó ü t| 9  Ð ] j# Q 6 x s  Ù ¼ Ð µ 1 Ï F g s 



¸× ¼, Û ¼G ' p" fl , C o Û ¼' ,     ~ ½ ÓØ  ¦ l  1 p x [1–4] F g 



 è _   èF  Ð V , o   6 x ) a . þ j   H ´ ú § É r  ' a d  _  @ / © 



  2 ;¨ 8  â \  -t   èF  ×  æ    % i « Ñ y  6 £ x+ þ A I  ª   t 

\

" f TiO

\  ¦ @ /^ ½ + É Ó ü t| 9  Ð ¸ ´ ú § É r   ½ ¨   '  ÷ & ¦ e  

 [5,6].

ZnO  H wurtzite ½ ¨ ¸\  ¦   ñ  9 13t  ~ ½ Ó ¾ ÓÜ ¼ Ð $ í



©    H : £ ¤$ í `  ¦ t  ¦ e  # Q  ª ô  Ç  ¸ ½ ¨ ¸Ó ü t ] j  s 

E-mail: [email protected]

E-mail: [email protected]

0 p x  .  ¸   ,  ¸ c ± ,  ¸ 6 \ à Ô,  ¸  Z þ t,  ¸ á

Ô Ð: \  Q 1 p x  ª ô  Ç  ¸ ½ ¨ ¸Ó ü t s  ] j  ÷ &# Q #  Q  7 Hë  H

`

 ¦ :  x K   è> h÷ &% 3   [7–9]. Õ ª ×  æ \ " f  ¸ }  @ /  H { 9 & ñ ô  Ç

~

½ Ó ¾ Ó$ í õ  B Ä º V ,  É r ³ ð  & h `  ¦ t  ¦ e   ¦,    _  Á º   0

A& h î  r1 l x`  ¦ ] jô  Ç #  ô  Ç ~ ½ Ó ¾ ÓÜ ¼ Ð â ì\  ¦ Ã º e  >  Ù ¼ Ð 6

£

x6 x$ í s  Z  }   ´ ú §s    ½ ¨÷ &  H  ¸ ½ ¨ ¸Ó ü t ×  æ \   s 

. ¢ ¸ô  Ç ZnO  ¸ }  @ /  H Ä ºÃ ºô  Ç $ í  ©  ~ ½ Ó ¾ Ó$ í Ü ¼ Ð   

#

 TiO

 ¸ È ÓÚ Ô ] j  `  ¦ 0 Aô  Ç  ¦& ñ % 7 e  ¦a Å @Ü ¼ Ð  6 x ÷ &

l

 ¸ ô  Ç  [10].  ¸ }  @ /\  ¦ ë ß × ¼  H ~ ½ ÓZ O \   H   l  o < Æ

&

h   ~ ½ ÓZ O  (electrochemical method), ì  r  Ä »l Ó ü t o < Æ 7 £ x

 Ã

ÌZ O  (molecular organic chemical vapor deposition),  n

 ¸ Å Ò Ã º Û ¼( ' a A ~ ½ ÓZ O  (radio-frequency sputtering method) 1 p x s  e   . : £ ¤ y , \ P Ã º6 xÓ  o ~ ½ ÓZ O  (hydrothermal method) É r ] j   õ & ñ s  ç ß é ß   ¦,  © · ú õ  $  : r  ¸| \ 

"

f ¸  ¸ }  @ /\  ¦ ½ + Ë$ í ½ + É Ã º e   ¦, @ /  & h ] j  s  6 x s 

 ¦, q 6 x s  & h >  [ þ t # Q" f @ /| ¾ Ó Ò q tí ß _   © & h  ¸ t m  ¦ e   Ü

«Y c l Æ X Øy ¢ Q V À W ¥ ÇÊ Ý

°

Ç ¤ Ó Þu 0 n É® z º V R ËX ê sc Ü R ZnO x ¢ T c l6 8 ý ºX ì Ä ¤V R Ë; c nucleation layer8 ý

Ö

«Y c l Æ X Øy ¢ Q V À W ¥ ÇÊ Ý

: c+ ä · ¤ . > · % · n* × <P v ^∗ · »0 ï FV ^†

Òí ß @ / < Æ § ¸& ñ Ð èF / B N < Æõ x 9 ¸Ö 6 x ½ + Ël Õ ü t < Æõ , x 9 ª 627-706

V ê T Ö h

Òí ß @ / < Æ § ¸õ < Æl Õ ü t < ÆÂ Ò, x 9 ª 627-706

כ ÒU + Ö <

Òí ß @ / < Æ § Ä » ^ Ó ü t$ í ½ ¨ è, Â Òí ß 609-735

» xZ 9 · Ð . > 0 ï F

Òí ß @ / < Æ § Ó ü t o < Æõ , Â Òí ß 609-735 (2008¸ 10 Z 4 28{ 9 ~ Ã Î6 £ §)

:

r ½ ¨\ " f H Pt (111)/TiO

/Si (100) l ó ø Í\ 7 £ x Ã Ì : r ¸\ ¦ o (100, 300, 600

C) r v " f ZnO nucleation layer\ ¦ ` O Û ¼ Y Us $ 7 £ x Ã ÌZ O Ü ¼ Ð $ 7 £ x Ã Ìô Ç 6 £ § \ P Ã º6 xÓ o ~ ½ ÓZ O ` ¦ s 6 x # ZnO

¸ } @ /\ ¦ ] j % i . 7 £ x Ã Ì : r ¸ Z }` ¦ Ã º2 ¤ c ~ ½ Ó ¾ Ó & ñ § > = ¸\ ¦ ZnO nucleation layer_ ¿ ºa ü <

ªY U _ ß ¼l x 9 ³ ð _ } 9 l 7 £ x % i . \ P Ã º6 xÓ o Z O ` ¦ s 6 x # ZnO ¸ } @ /\ ¦ ] j % i

`

¦ M :, nucleation layer ³ ð _ } 9 l & h ` ¦ Ã º2 ¤ Ó ü æg Ë > & ³ © s { 9 # Q t 2 £ § s H ZnO ¸ } @ /

j ÷ &% 3 . Õ ª Q nucleation layer ³ ð _ } 9 l 9 þ t Ã º2 ¤ t 2 £ § s É r ZnO ¸ } @ / + þ A$ í ÷ &

% 3 .

PACS numbers: 61.46.+w, 61.66.Fn, 68.55.J Keywords: í ß o ¸} @ /, 7 £ x Ã Ì : r ¸, \ P Ã º6 xÓ oZ O

ZnO H V , É r \ -t ½ × ¼Ì s (3.37 eV)` ¦ t ¦ e ¦,

© : r \ " f ¸ î ß & ñ ô Ç " l or : r ½ + Ë \ -t (60 meV)\ ¦

f ] X ;s ì ø Í ¸^ Ó ü t| 9 s . ¢ ¸ô Ç, ¸i ç Ó ü t| 9 \ ZnO ? /_ _ s 1 l x ¸\ ¦ ~ 1 > Ü ã J Ã º e # Q ì ø Í ¸^ F

K5 Å q $ í | 9 ` ¦ Ó ü t| 9 Ð ] j# Q 6 x s Ù ¼ Ð µ 1 Ï F g s

¸× ¼, Û ¼G ' p" fl , C o Û ¼' , ~ ½ ÓØ ¦ l 1 p x [1–4] F g

è _ èF Ð V , o 6 x ) a . þ j H ´ ú § É r ' a d _ @ / ©

2 ;¨ 8 â \ -t èF × æ % i « Ñ y 6 £ x+ þ A I ª t

" f TiO

\ ¦ @ /^ ½ + É Ó ü t| 9 Ð ¸ ´ ú § É r ½ ¨ ' ÷ & ¦ e

[5,6].

ZnO H wurtzite ½ ¨ ¸\ ¦ ñ 9 13t ~ ½ Ó ¾ ÓÜ ¼ Ð $ í

© H : £ ¤$ í ` ¦ t ¦ e # Q ª ô Ç ¸ ½ ¨ ¸Ó ü t ] j s

0 p x . ¸ , ¸ c ± , ¸ 6 \ à Ô, ¸ Z þ t, ¸ á

Ô Ð: \ Q 1 p x ª ô Ç ¸ ½ ¨ ¸Ó ü t s ] j ÷ &# Q # Q 7 Hë H

¦ : x K è> h÷ &% 3 [7–9]. Õ ª × æ \ " f ¸ } @ / H { 9 & ñ ô Ç

½ Ó ¾ Ó$ í õ B Ä º V , É r ³ ð & h ` ¦ t ¦ e ¦, _ Á º 0

A& h î r1 l x` ¦ ] jô Ç # ô Ç ~ ½ Ó ¾ ÓÜ ¼ Ð â ì\ ¦ Ã º e > Ù ¼ Ð 6

x6 x$ í s Z } ´ ú §s ½ ¨÷ & H ¸ ½ ¨ ¸Ó ü t × æ \ s

. ¢ ¸ô Ç ZnO ¸ } @ / H Ä ºÃ ºô Ç $ í © ~ ½ Ó ¾ Ó$ í Ü ¼ Ð

TiO

¸ È ÓÚ Ô ] j ` ¦ 0 Aô Ç ¦& ñ % 7 e ¦a Å @Ü ¼ Ð 6 x ÷ &

¸ ô Ç [10]. ¸ } @ /\ ¦ ë ß × ¼ H ~ ½ ÓZ O \ H l o < Æ

h ~ ½ ÓZ O (electrochemical method), ì r Ä »l Ó ü t o < Æ 7 £ x

Ã

ÌZ O (molecular organic chemical vapor deposition), n

¸ Å Ò Ã º Û ¼( ' a A ~ ½ ÓZ O (radio-frequency sputtering method) 1 p x s e . : £ ¤ y , \ P Ã º6 xÓ o ~ ½ ÓZ O (hydrothermal method) É r ] j õ & ñ s ç ß é ß ¦, © · ú õ $ : r ¸| \

f ¸ ¸ } @ /\ ¦ ½ + Ë$ í ½ + É Ã º e ¦, @ / & h ] j s 6 x s

¦, q 6 x s & h > [ þ t # Q" f @ /| ¾ Ó Ò q tí ß _ © & h ¸ t m ¦ e Ü

¼ , ¸ } @ /_ x 9 ¸ü < ½ ©g Ë :$ í , ~ ½ Ó ¾ Ó$ í \ @ /ô Ç ] j# Q

~ 1 t · ú § H é ß & h ¸ e . \ P Ã º6 xÓ o` ¦ s 6 x # ¸ }

@ /\ ¦ ½ + Ë$ í ¦ ½ + É M :, ì ø Í× ¼r l ó ø Í 0 A\ } × ¼ > r F

K ô Ç . } × ¼ H ¸ } @ / Ã º6 xÓ o 5 Å q \ " f ½ + Ë$ í | ¨ c Ã

º e ¸2 ¤ ¸ü <Å Ò H % i ½ + É` ¦ 9 } × ¼_ ½ ¨ ¸& h : £ ¤$ í s

¸ } @ /_ ½ ¨ ¸& h : £ ¤$ í ` ¦ & ñ ô Ç . } × ¼ 8 £ x _ e > ¿ º a

, ³ ð + þ AI , Õ ªY U 1 p x s ¸ } @ / µ 1 Ï_ $ í © \ % ò

¾ Ó` ¦ ï r H # Q ½ ¨ õ [11–13] Ð ¦÷ &% 3 Ü ¼ f

t # Q " כ ¹ \ @ /ô Ç { 9 ' a$ í e H $ í © : £ ¤$ í É r Ð ¦

&t · ú § É r כ Ü ¼ Ð ó ø Íé ß ) a .

: r ½ ¨\ " f H 7 £ x Ã Ì : r ¸ É r ¸| \ " f $ í © ) a ZnO nucleation layer _ ½ ¨ ¸& h : £ ¤$ í õ ZnO nucleation layer 0 A\ \ P Ã º6 xÓ o ~ ½ ÓZ O ` ¦ s 6 x # $ í © ô Ç ZnO ¸ }

@ /_ ~ ½ Ó ¾ Ó$ í , Ã ºx 9 ¸, Õ ªo ¦ t 2 £ § \ p u H % ò ¾ Ó` ¦

¨ % i .

ZnO nucleation layer H ` O Û ¼ Y Us $ 7 £ x Ã ÌZ O (pulsed laser deposition method, s PLD)` ¦ s 6 x # Pt (111)/TiO

/Si (100) 8 £ x l ó ø Í 0 A\ [ j t 7 £ x Ã Ì

: r ¸ (100, 300, 600

C) \ " f ] j ÷ &% 3 . Õ þ ! Q (chamber)

/\ 3.0 × 10

Torr _ í ß è ì r 0 Al \ ¦ ¸$ í ¦ 30ì r 1

x î ß KrF Y Us $ (248 nm, COMpex 102)\ ¦ 6 x # 5 Hz Ð ZnO e ¦µ ¡ § (plume)` ¦ Ò q t$ í r ( . 0.04mol/L_ zinc nitrate hexahydrate [Zn (NO

O] ü < 0.04mol/L_ hexamethylenetetramine (HMT) [C

] _ 6 xÓ o` ¦ D ¥

+ Ëô Ç Ê ê, D ¥ ½ + Ë 6 xÓ o 5 Å q \ ï r q ) a ZnO nucleation layer\ ¦ {

Õ ª ¦ 95

C Ð Ä »t ) a o Ð (furnace) 5 Å q \ " f 8r ç ß 1 l x î

ß ì ø Í6 £ x r ( . $ í © ) a ZnO ¸ } @ / r « Ñ H Í t y

r + ' 7 £ x À ÓÃ º Ð [ j' ¦ © · ú \ " f | ¸r (

. Nucleation layer 0 A\ $ í © ) a ¸ } @ /[ þ t _ ½ ¨ ¸