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Enhancements of the Electric Fields Near the Contact between a Metal and a Dielectric
Y. J. Jang · M. S. Chung ∗
Department of Physics, University of Ulsan, Ulsan 680-749
(Received 4 February, 2010 : revised 26 February, 2010 : accepted 11 May, 2010)
We investigated the behavior of the electric field near a junction composed of a metal, a dielectric, and vacuum. By using the two-dimensional model of a quadruple junction composed of a metal, vacuum, a dielectric, and vacuum, we calculated the electric field near the junction as a function of the configuration and the dielectric constant. We found that the obtained field was enhanced more strongly for the quadruple junction than for the associated triple junction.
PACS numbers: 77, 51.50, 52.80, 77.22, 79.70
Keywords: Electric field enhancement, Vacuum breakdown, Dielectric breakdown, Metal-dielectric contact, Triple junction
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