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Illumination Intensity and Spectral Dependence of the Hole Capacitance of Amorphous Silicon in Metal-insulator-semiconductor Structure

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Fig. 1. The enlarged top view and cross-sections of Glass/ITO/n+-a-Si:H//a-Si:H/a-SiNx:H/Mo MIS struc- ture used in this study.

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수치

Fig. 2. Schematic diagram of the setup of the C–V mea- mea-surement using lock-in amplifier system.
Fig. 4. The overall C–V characteristics of a-Si:H-a- a-Si:H-a-SiNx:H MIS structure taken at five different illumination intensities at a fixed frequency of 11 Hz and at 30 ◦ C.
Fig. 7. Subband gap spectra (top) and their derivatives (bottom) of the hole capacitance of an a-Si:H-a-SiNx:H MIS structure taken at five different frequencies of the ac probe signal
Fig. 8. Schematic diagram of the five types of optical transitions. Here, E CT (E V T ) denotes the conduction (valence) band tail state.

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