º ºP U ² Ó Þù o Þ0 n É ù p § T Ó Þ X ¢ Õ ×P c l] k ù Q : g Ö כ 9 0° Ç < gX c l
+ ä
< g Y @ · T r )* å · ® £* å ¦
â
· ¡ ¤ @ / < Æ § Ó ü t o §¹ ¢ ¤ < Æõ , @ /½ ¨ 702-701
(2011¸ 12 Z 4 14{ 9 ~ Ã Î6 £ §, 2012¸ 1 Z 4 5{ 9 Ã º& ñ : r ~ Ã Î6 £ §, 2012¸ 3 Z 4 2{ 9 > F S X & ñ )
p
[ j E $ Ý ¼ C \ P _ G ¹ ¡ § q Ö ¦` ¦ Z } s l 0 A # ¹ ¢ ¤ y + þ A p [ j E $ Ý ¼\ ¦ PR(photoresist) 6 xÖ 6 xZ O ` ¦ s 6 x
# ë ß [ þ t% 3 . $ , í Ðo èÕ ª x / B N& ñ ` ¦ s 6 x # PR` ¦ ¹ ¢ ¤ y l Ñ ü æ ¸ ª Ü ¼ Ð ë ß [ þ t% 3 . PR J
É
r ¿ ºa 17 µms ¦ f â s 500 µms . PR J ` ¦ 170 ¸\ " f 6 xÖ 6 x ¹ ¢ ¤ y + þ A p [ j E $ Ý ¼ C \ P s
ë ß [ þ t # Q . ] j ) a ¹ ¢ ¤ y + þ A p [ j E $ Ý ¼_ G ¹ ¡ § q Ö ¦ É r 90 % s © s . PR p [ j E $ Ý ¼ H z ´o B H ] t
×
¼\ ¦ ë ß [ þ t l 0 AK 6 x ÷ &% 3 ¦, ] t × ¼\ ¦ \ ; ¤ r Ð G 0 >" f È Ò" î ô Ç ¹ ¢ ¤ y + þ A p [ j E $ Ý ¼ C \ P ` ¦ % 3 % 3 . \
;
¤ r p [ j E $ Ý ¼_ í& h o H 2.0 mm Ð" f > í ß ° ú כ 1.9 mmü < q 5 p w % i . PR J _ ¿ ºa ü < ß ¼ l
\ ¦ ¸] X p [ j E $ Ý ¼_ í& h o \ ¦ or ~ ´ Ã º e .
Ù þ
d # Q: Photoresist, Reflow, ¹ ¢ ¤ y + þ A, p [ jE $ Ý ¼ C \ P
Fabrication of a Hexagonal Microlens Array by Using the Photoresist Reflow Method
Jea-Hun Jung · Hee-Young Lee · Young-Gu Ju ∗
Department of Physics, Kyungpook National University, Daegu 702-701 (Received 14 December 2011 : revised 5 January 2012 : accepted 2 March 2012)
We fabricated hexagonal microlens by using a PR (photoresist) reflow method to enhance the fill factor. Firstly, the PR was patterned in the shape of a hexagonal pillar by using photolithography.
The thickness and the diameter of the PR pattern were 17 µm and 500 µm, respectively. Melting at a temperature of 170
◦C shapes the PR pattern into a hexagonal microlens array. The fill factor of the fabricated hexagonal lens amounts to more than 90 %. The PR microlens was used to make a silicone mold. Filling the mold with epoxy replicated a transparent hexagonal microlens array.
The measured focal length of the epoxy microlens was 2.0 mm, which was close to the value of 1.9 mm obtained from the calculation. Variations of thickness and the size of PR patterns could be used to control the focal length of the hexagonal microlens array.
PACS numbers: 42.70.Gi, 42.15.Eq, 78.20.Bh
Keywords: Photoresist, Reflow, Hexagonal lens, Microlens array
∗
E-mail: [email protected]
-275-
I. " e  ] Ø
µ
1 Ï F g s ¸× ¼(LED, light emitting diode)\ ¦ 6 x #
< H 1 p x ¢ ¸ H K × ¼ s à Ôü < ° ú É r ¸" î © u \ ¦ ë ß [ þ t M :, E $ Ý
¼\ ¦ 6 x > ) a . E $ Ý ¼ H F g " é ¶ \ " f ¸ H y n C` ¦ ¸" î 0
Au t ¸ Å Ò H % i ½ + É` ¦ > ÷ &Ù ¼ Ð, ¸" î 3 l q ³ ð 0 Au _
¸ ¸\ ¦ µ 1 ß> Ð ¸" î 0 Au \ © s Ò q tl l ~ 1
. ¢ ¸ô Ç E $ Ý ¼ â Ä º Ï ã J] X & ³ © ` ¦ s 6 x H X < Ï ã J] X Ò ¦ É r
© \ ² ú 4 R" f ' õ AÒ os 8 ´ ú §s Ï ã J] X ÷ & ¦ & h Ò os & h
>
Ï ã J] X # © o  Òì r \ " f ¸ê ø ÍÒ oõ ' õ AÒ o_ {
Ò q
tl H Ò o ì r o & ³ © s Ò q tl l ~ 1 .
s
Qô Ç ë H ] j& h ` ¦ K H ~ ½ ÓZ O × æ _ H p [ j E $ Ý
¼ C \ P ` ¦ 6 x H כ X <, Ã ºu ½ ¨ â (numerical aper- ture) s É r p [ j E $ Ý ¼\ ¦ ¸" î > \ " f 6 x H Å Ò E $ Ý ¼ ü
< < Êa 6 x p [ j E $ Ý ¼\ ¦ : x õ H c [ þ t s { 9 & ñ ô Ç y
¸ Ð ( 4 R" f © s Ò q tl H כ ` ¦ ~ ½ Ót ¦, Å Ò p [ j E $ Ý
¼_ F g µ 1 Ïõ [ O s H 6 x` ¦ { 9 Ü ¼( Ü ¼ Ð+ Ò o ì r o
&
³ © ¸ t > ) a .
Õ
ª Q " é ¶+ þ A p [ j E $ Ý ¼ C \ P ` ¦ 6 x ½ + É â Ä º, " é ¶+ þ A p [
j E $ Ý ¼ s \ / B N ç ß s µ 1 ÏÒ q t # , Õ ª / B N ç ß ` ¦ : x õ
H F g [ þ t É r p [ j E $ Ý ¼ ´ òõ \ ¦ { 9 Ü ¼v t · ú § ¦ # y
Å Ò E $ Ý ¼\ _ ô Ç © ´ òõ ü < Ò o ì r o & ³ © ` ¦ { 9 Ü ¼v H X
< l # > ) a . " é ¶+ þ A E $ Ý ¼\ ¦ & ñ y + þ A \ C u ½ + É
â
Ä º, G ¹ ¡ § q Ö ¦(fill factor)` ¦ © Z }{ 9 Ã º e H ô Ç> H 78 % & ñ ¸s . s כ É r ì ø Ít 2 £ § s 1 " é ¶ õ _ U ´s
2 & ñ y + þ A_ & h q Ö ¦ \ " f % 3 ` ¦ Ã º e H ° ú כs . Õ ª
Q s ° ú כ ¢ ¸ô Ç " é ¶+ þ A E $ Ý ¼ © o s _ o \ ¦ 0 Ü ¼
Ð ë ß [ þ t% 3 ` ¦ M : % 3 ` ¦ Ã º e H ° ú כÜ ¼ Ð" f, z ´] j ] j \ " f, p
[ j E $ Ý ¼_ G ¹ ¡ § q Ö ¦ É r @ /| Ä Ì 70 % s ¦ ^ ¦ Ã º e
. G ¹ ¡ § q Ö ¦` ¦ Z } s l 0 AK " f H " é ¶+ þ A E $ Ý ¼\ ¦ y + þ AÜ ¼
Ð ¸ ú " f C u H ~ ½ ÓZ O s e Ü ¼ / B N s j Ë µ[ þ t ¦
¸ Z } t H é ß & h s e . p [ j E $ Ý ¼\ ¦ ë ß [ þ t l © ç ß é
ß ô Ç ~ ½ ÓZ O × æ H í ÐY Ut Û ¼à Ô(photoresist, PR)ü <
° ú
É r y F g$ í e ¦ o Q Ð " é ¶ l Ñ ü æ J ` ¦ + þ A$ í ô Ç Ê ê, 0 l q y H 6
xÖ 6 x(reflow)Z O s e Ü ¼ 9 [1,2], s ~ ½ ÓZ O Ü ¼ Ð H G ¹ ¡ § q Ö ¦
`
¦ Z } s H X < ô Ç> e . í Ðo èÕ ª x / B N& ñ _ : £ ¤$ í Ü
¼ Ð K , " é ¶+ þ A J s ç ß s PR ¿ ºa ë ß p u µ 1 ÏÒ q t l
M :ë H s . ² D G 30 % & ñ ¸_ y n C É r p [ j E $ Ý ¼_ ´ òõ
\
¦ ^ ¦ Ã º \ O l M :ë H \ p [ j E $ Ý ¼\ ¦ 6 x # ¸" î ç H{ 9
¸\ ¦ 7 £ x r v ¦ Ò oì r o \ ¦ } H ´ òõ H ì ø Íy | ¨ c à º µ 1 Ú\
\ O
.
: r ½ ¨\ " f H G ¹ ¡ § s q Ö ¦ s Z } É r p [ j E $ Ý ¼\ ¦ ë ß [ þ t l
0 AK " f l > r _ " é ¶+ þ A p [ j E $ Ý ¼ @ / ¹ ¢ ¤ y + þ A ¸ ª _ p [
j E $ Ý ¼\ ¦ ] j % i [3,4]. ] j ~ ½ Ód Ü ¼ Ð H PR reflow
~
½ ÓZ O ` ¦ 6 x % i Ü ¼ 9 J _ ß ¼l ü < PR_ ¿ ºa \ ¦ ¸] X
Table 1. The calculated fill factor of the hexagonal mi- crolenses with various gaps and diameters.
Gap between Diameter of the Fill the patterns (µm) circumscribed circle (µm) factor (%)
8 50 71.2
10 100 80.4
15 200 84.7
20 500 91.4
# p [ j E $ Ý ¼_ í& h o \ ¦ ¸] X ½ + É Ã º e H ¸| ` ¦ ¸ Ø
¦ % i . ¢ ¸ô Ç PR Ð ë ß H p [ j E $ Ý ¼ H f ¨ Ã º ´ ú §l M : ë
H \ s \ ¦ × ¦ s l 0 AK " f z ´o B H ] t × ¼\ ¦ s 6 x # \ ; ¤ r
F | 9 _ p [ j E $ Ý ¼ Ð 4 ¤ H ~ ½ ÓZ O ` ¦ Ã º' ¦ ' aº
)
a õ \ ¦ ] jr % i .
II. T Â ] Ø
"
é
¶+ þ A p [ j E $ Ý ¼\ q K " f ¹ ¢ ¤ y + þ A p [ j E $ Ý ¼(hexagonal microlens) 8 H G ¹ ¡ § q Ö ¦` ¦ t t ë ß ¹ ¢ ¤ y + þ A E $ Ý ¼ _
G ¹ ¡ § q Ö ¦ s 100 %\ ¸² ú l 0 AK " f H ¹ ¢ ¤ y + þ A J
s _ ç ß s \ O # Q ô Ç . Õ ª Q PR 6 xÖ 6 xZ O ` ¦ s 6
x # s ß ¼ Ð E $ Ý ¼\ ¦ ] j ½ + É â Ä º, o èÕ ª x l Õ ü t _
à ºï r \ J s _ ç ß s ² ú t > ) a . Ð :
x J _ þ j è ç ß É r PR ¿ ºa \ q Y V l M :ë H \ s
ß ¼ Ð E $ Ý ¼ ] j õ ° ú s ¿ º î r PR J ` ¦ 9 כ ¹ Ð
H â Ä º\ H J ç ß ¢ ¸ô Ç 7 £ x > ) a . " f J
s _ ç ß s 7 £ x < Ê\ G ¹ ¡ § q Ö ¦ s # Qb G>
H t p o > í ß ½ + É 9 כ ¹ e .
E $
Ý ¼_ ß ¼l | 9 Ã º2 ¤ E $ Ý ¼ s _ / B N ç ß s & t
l M :ë H \ J _ ß ¼l \ ´ ú 2 X" f J s _ ç ß ` ¦ a
% v ) é ß 0 A & h { © E $ Ý ¼_ q Ö ¦` ¦ Z }{ 9 Ã º e % 3 . 6 £ § É r J
_ ß ¼l \ É r ^ & h { © E $ Ý ¼ & h _ q Ö ¦ s
. G ¹ ¡ § q Ö ¦ É r E $ Ý ¼ t H & h \ " f ^ & h ` ¦
¾ º ¦ 100` ¦ Y L # ( G ' pw t Ð ¨ 8 í ß % i . Table 1\
H Y > t J ç ß õ ¹ ¢ ¤ y + þ A E $ Ý ¼_ ß ¼l \ @ /ô Ç G
¹
¡
§ q Ö ¦` ¦ > í ß ô Ç ° ú כ` ¦ Ðs ¦ e . ¹ ¢ ¤ y + þ A E $ Ý ¼_ ß ¼ l
H ¹ ¢ ¤ y + þ A\ ü @] X H " é ¶ _ f â Ü ¼ Ð ³ ðr % i . > í
ß ô Ç õ \ ¦ Ð J ç ß s 15 µm { 9 â Ä º, J f
â
s 200 µm s G ¹ ¡ § q Ö ¦ s 84 % µ 1 Ú\ î ß ÷ & H כ ` ¦
· ú
à º e . G ¹ ¡ § q Ö ¦` ¦ 90 % s © Ü ¼ Ð ` ¦ o l 0 AK " f
H J ç ß ` ¦ × ¦ s H t J f â ` ¦ 500 µm & ñ ¸ Ð 7 £ x
r v H כ s & h ] X . Ð: x p [ j E $ Ý ¼ J ` ¦ 0 AK " f
10 µm s © ¿ ºa _ PR ïh A` ¦ Ù ¼ Ð J ç ß É r 10
Table 2. The focal lengths of the microlenses calculated from the height and the diameter of PR pattern. Refrac- tive index = 1.5.
Diamter Thickness Height of Radius of Focal F/#
(µm) of PR (µm) lens (µm) curvature length (µm) (µm)
500 17 33 960 1900 3.9
200 17 33 170 340 1.7
100 10 21 70 140 1.4
50 10 17 26 53 1.1
µm s © s . " f G ¹ ¡ § q Ö ¦` ¦ Z } s l 0 AK " f H p [
j E $ Ý ¼_ f â ` ¦ 500 µm & ñ ¸ Ð ½ + É 9 כ ¹ e .
PR 6 xÖ 6 xZ O \ _ ô Ç ¹ ¢ ¤ y + þ A p [ j E $ Ý ¼_ ] j É r PR J
` ¦ ¹ ¢ ¤ y l Ñ ü æ ¸ ª Ü ¼ Ð $ ë ß [ þ t ¦ ¸ É r \ " f : r ¸\ ¦
`
¦ 9 0 l q y H ~ ½ ÓZ O ` ¦ 2 [ H X <, ³ ð © § 4 \ _ K " f
&
h Ü ¼ Ð Ò q tl H / B G s s À Ò# Qt ¸2 ¤ ô Ç . " f E $ Ý ¼ _
/ B GÒ ¦ ì ø Í â ¢ ¸ H í& h o \ ¦ ¸] X l 0 AK " f H PR J
_ f â õ Z } s \ ¦ ¸] X < ÊÜ ¼ Ð+ 0 p x . ] j
\
p o PR J _ ¸ ª \ É r p [ j E $ Ý ¼_ F g < Æ & ñ Ð
\
¦ · ú Ã º e " é ¶ H $ í 0 p x _ E $ Ý ¼\ ¦ 3 l q ³ ð Ð ] j ` ¦ r
¸½ + É Ã º e .
¹
¢
¤ y + þ A p [ j E $ Ý ¼_ í& h o \ ¦ PR J _ ¸ ª Ü ¼ Ð
³
ð & ³ l H Ã ºd s 4 ¤ ¸ ú K t l M :ë H \ ¹ ¢ ¤ y + þ A l Ñ ü æ @ /
ü @] X H " é ¶ Ü ¼ Ð s À Ò# Q " é ¶ l Ñ ü æ _ ^ & h s Ð > r ÷ &
#
Q ½ ¨ ` ¦ + þ A$ í ô Ç ¦ & ñ % i . ¹ ¢ ¤ y l Ñ ü æ õ " é ¶ l Ñ ü æ
s \ H ^ & h _ s l H t ë ß Õ ªX O > ß ¼t · ú §
¦ & ñ ¦ > í ß ` ¦ é ß í H o l 0 AK s Qô Ç ~ ½ ÓZ O ` ¦ r
¸ % i . PR E $ Ý ¼_ í& h o ü < / B GÒ ¦ ì ø Í â ` ¦ 6 £ § d
\
? /% 3 .
f = r
n − 1 , r
c= h
2+ r
22h (1)
#
l " f f H E $ Ý ¼_ í& h o , r É r J _ ì ø Ít 2 £ § s 9, n É r E $ Ý ¼_ Ï ã J] X Ò ¦, h H E $ Ý ¼_ Z } s , r
c H E $ Ý ¼_ / B GÒ ¦ ì
ø Í â s . E $ Ý ¼_ Z } s H E $ Ý ¼_ Z } s \ ¦ Ã º Ð ¦ E $ Ý
¼_ Â Òx \ ¦ ½ ¨ô Ç Ê ê z ´ 2 ; 8_ Â Òx ü <_ § & h ` ¦ ¹ 1 Ô E $
Ý ¼_ Z } s \ ¦ ½ ¨ % i . E $ Ý ¼_ Â Òx H d (2)ü < ° ú É r
~
½ ÓZ O Ü ¼ Ð ½ ¨ % i .
V
l= π × 1
2 r
2h + 1 6 h
3V
c= π × r
2h
0(2) V
l É r E $ Ý ¼_ Â Òx s 9, r É r J _ ì ø Ít 2 £ §, h H E $ Ý ¼_ Z
} s s . V
c H z ´ 2 ; 8_ Â Òx s 9, r É r J _ ì ø Ít 2 £ §, h
0 É r z ´ 2 ; 8_ Z } s , 7 £ ¤ PR _ ¿ ºa s . Table 2\ H PR _
¿ ºa ü < J _ s Ý ¼\ É r p [ j E $ Ý ¼_ í& h o _
> í ß ° ú כs .
Fig. 1. (Color online) Process of Micro lens array : (a) PR coating on glass, (b) UV exposure, (c) Development of PR pattern, (d) Thermal reflow, (e) Making PDMS mold, (f) Detaching PDMS mold from the PR lens, (g) Filling epoxy and curing, (h) Detaching epoxy microlens array from the mold.
III. ÷ m Ç ] M ö
PR E $ Ý ¼_ ] j õ \ ; ¤ r E $ Ý ¼_ ] j / B N& ñ É r Fig.
1 \ e . s z ´+ « >\ " f H 1000 rpm _ spin speed Ð 1ì r ç ß PR` ¦ glass \ ïh A % i ¦, ïh A Ê ê\ 100
◦