Substrate Bias Effects (BODY EFFECT)
- Previously we assumed that S was connected to the substrate B.
- In fact, there can be reverse bias between S and B(substrate) [NMOS in CMOS]
- The depletion region is widened and the VT must be increased to accommodate the larger Qd. - Assuming that W is widened uniformly along the channel,
As VB is increased -> more positive value of VT (increased VT) As the substrate doping (Na) is increased -> increase of VT.
For p-channel device, the bulk(substrate)-to-source voltage VB is positive for a reverse bias VB negative in reverse bias
38) - (6 C 2
Q C
Φ Q
V F
i d i
ms i
T
Fig. 6-37 Threshold voltage dependence on substrate bias resulting from application of a voltage VB from the substrate (i.e. bulk) to the source. For n channel, VB must be zero or
negative to avoid forward bias of the source junction. For p channel VB must be zero or positive.
Subthreshold Characteristics
- Previously in Eq. 6-53, ID abruptly goes to zero as soon as VG < VT
- In reality, there is still some drain conduction below threshold (subthreshold conduction) due to weak inversion in the channel (mainly diffusion current).
- Subthreshold swing
- S : a measure of the efficacy of the gate potential in modulating ID.
- Improved (decreased) S by reducing the oxide thickness (increase of Ci)
- The high value of S for heavy channel doping (increasing Cd) or for many fast interface states Dit (increasing Cit)
Capacitor divider ratio : the fraction of the applied gate bias, VG, appears at the Si-SiO2interface as the surface potential.
subthreshold swing (always larger than 60 mV/dec at RT)
- For a very small VG, the subthreshold current is reduced to the leakage current of the S/D jct.
- Standby power dissipation
- If VTis too low, it cannot be turned off fully at VG=0
- If VTis too high, one sacrifices drive current. => historically VT~ 0.7 V
Fig. 6-38 Subthreshold conduction in MOSFETs : (a) Semi- log plot of ID versus VG; (b) equivalent circuit showing capacitor divider which determines subthreshold slope.