NO
†Kawasaki, J.*
305-600 100
*
(2003 5 19 , 2003 9 20 )
NO Removal of Electrolessly Copper-plated Activated Carbons
Soo-Jin Park†, Byung-Joo Kim and Junjiro Kawasaki*
Advanced Materials Division, Korea Research Institute of Chemical Technology, 100, Jang-dong, Yusong-gu, Daejeon 305-600, Korea
*Department of Chemical Engineering, Tokyo Institute of Technology, Ookayama, Meguroku, Tokyo 152-8852, Japan
Received 19 May 2003; accepted 20 September 2003)
! Cu" # ACs $%& NO '( )* + ,-./. Cu" # ACs 0 FT-IR 1 scanning electron microscope(SEM)2 $% 3-.4, N2/77 K 56 78 0 BET9, D-R plot, H-K ! BJH 92 $% :;.,, NO '(<=0 ">?@ABCD $% EF./. GHI1, J$ K"L M N ACs Cu O0 PQ K".R, ACs 78 ; S T, UV 5 W XYZ [
\]2 ^./. ) NO '(<=0 # Cu O$ K"L MN S_T K".4, $`& I1 ACs
# Cu Cu-ACs NO '( )*$ "abc de fg#/.
Abstract−In this study, the activated carbons (ACs) containing copper metal were prepared by electroless copper plating technique, in order to remove NO. The surface and structural properties of the ACs were determined by FT-IR and scanning electron microscope (SEM), respectively. N2/77 K adsorption isotherm characteristics, including the specific surface area and pore volume, were investigated by BET, D-R plot, H-K, and BJH methods. And NO removal efficiency was confirmed by gas chromatographic technique. The copper content on ACs increased as the plating time increased. However, a slightly gradual decrease of adsorption properties, such as BET’s specific surface area and total pore volume, was observed in ACs in the pres- ence of copper metal. NO removal efficiency of all Cu-ACs was higher than that of untreated ACs, and increased with the cop- per content on ACs. These results indicated that copper metal on Cu-ACs strongly accelerated catalytic reduction of NO on Cu- ACs surfaces, though it caused the decrease of the adsorption properties of original ACs.
Key words: Activated Carbon, Copper Metal, Adsorption, NO Removal
1.
! ", #$ %& '( )* ++, -./
;<# => ?, / @' >A8=B #$ C D
EFG& HI- J, KL MNB OPQR ST U5[2-3].
>A8=1 V/ W XYZQR [B \]7 -^_
RJ, - ? `abc1 de-f, cgh(molecular sieve), i#j
A % kB lmn -o @p- q_ 5[4-6]. _r - : lm ghrR G Vst *7 RJ, - ue l mn vh9 9: 7_ w C i#- x =>1 Dy \]
7 z{ |5. - ? }Q~ w- Cu, Ag, Ni, Fe, Co G Pt
%-J Cu G & u st#- ST T J, G 7- 9 QR B 7L7 5 5 [7-10].
lm i#jA Cun Dy @pB / \] u
U 47_ 5. }Q~ @pB mpR, - i#
jAn Cu w `a 3 C R v 0 8 @ pR @p.& 6# QR [- to @p-5.
_r - @pB m3 w- i#jA& K)/1 (.
1 5 - u5. ¡¢ @pR i#jAn
†To whom correspondence should be addressed.
E-mail: psjin@krict.re.kr
41 6 2003 12
5. - @pB st7E ®¯ bcr w- Dy
.o8 i#jAn }rR w¥; i#jAn
° 5 N1 7_ s w c¤n ±/7 ² 5 1 7z5. ³_ @pB wDwpR §Dwp ´
§ Dwp- 5. §DwpB bDh~ i#jA §/Q µ1 -o9 ¶® w1 Dy @pR /.¬mp kB N1 7_ @p-5. 6 ´§ wDwpB mp §Dwp&
wr1 i#jA Dy @pR, - @pB i#jA& $}
Q& ¼A7 U_ ½ K)/ª_ w- ¾ ¿À N1 7z5[11-14].
- Á \], Cun ´§ wDw @pR ACs Dy 9 NOV st G =Â8¹Q lmÃÄ ¯SQ ºÃÄ 1 ÅÆÇRJ, Cun i#jA Dy3 È i#jA& /
#1 ÉÊ¥R, ´§ CuDw i#jA& NOVo lm
,& 7Ã# , Ê9 Ç5.
2.
2-1.
Á !Ë, Oo i#jA(ACs) 5# lm 8×16 mesh U /& ÌjA(H), ¸1 OoÍ5. !Ë Î, Æ´Ï
7 _ ½B i#jAn 3q ¬Ð , 2-3¡ )Ñ 0 80oC&
Ò, 483 -. @L3¦ 0 OoÍ5. Cu& ´§
DwB i#jAn Ó 10%& HCl oÔ, 30c § 0 ! 3ÍRJ, - Oo DwÕ C DwB Table 1 ÖY×5.
Dw3B 5, 15 G 40cR ÍRJ, K 361 ¤¥9
as-received, Cu-5, Cu-15 G Cu-40R ØØÍ5. i#jA
Dw Cu& ÌB atomic absorption spectrophotometry(AAS)n O o9 cÙÍ5.
2-2.
Cu7 Dy ACs& È8 }#1 ÅÆ/ W FT-IR
scanning electron microscope(SEM)n Ú ÉÊÍ5. Cu Dy 0 i#jA }& AÉÃ/& ÌQ~ È8n ÉÊ/ W X-ray photoelectron spectroscope(XPS)n -o9 jA A& aÛ Q Ü1 ÝaÍ5. - source MgKαn -o9 LAB MK-II (VG Scientific Co.) cÙN$n -o9 ÝaÍRJ, chamber Y&
ÞÄB 10−6-10−9 torr ß9 ÝaÍ5.
2-3.
3à«B 300oC, áÐ ÞÄ1 10−3 torr- ;_ .â ã 5-6 3 ä/3å 0, ASAP 2010(Micromeritics Co.)1 -o9 77 K, .ÞÄ(P/P0) u N2/h& lmÛ1 ÝaÍ5. $}
2-4. NO
NO VêB He ëÏE 1,000 ppm ìD& NO 7En Oo9 7 EU³íGî(DS 6200, Dï~Ef^Óf) st §·0& st=
ð#=& cÙR ÝaÍRJ, detector thermal conductivity detector(TCD)Í columnB Hayesep A(30 ft, inner dia: 0.085 inch)n -oÍ5. !Ë ? st& D 500oC ;_ÍRJ, è st 3B 203R Í5. st3 ;y NO 7E& ;B M.F.C.
(mass flow controller; GMC1000, MLS)n Oo9 ÚÍRJ, 10 ml ·min−1R ;_3ñ5. cÙ § 3à«B st D, 13
HeR òó9 c1 ô§ V9 NO 7E& NLY lm
& qn õA8 0 OoÍ5.
3.
3-1. Cu
ACs& ´§ Cu DwB `sQR º C /Ö 7& s tR ö÷ st- ;_r õø ±_ ¸B Cu ùâ -
G .Q 7L v_pR,& 7Ln _ú5 û RJ, G st aB Æî k5[19].
Cu2+ü2e−ýCuþ(Reduction)
E0=ü0.34 V (1)
2HCHOü4OH−ý2HCOO−üH2ü2H2Oü2e− (pH=14)
E0=ÿ1.07 V (2)
HCHOüH2OýHCOOHü2H+ +2e− (pH=0)
E0=ü0.056 V (3)
- k- ACs& } Cu(27)n Dy/ W, & §g 7 ¨©J, - §g«B ¤Å7 ¤R 8R 5. - Table 1, Ö k- DwÕ& pH7 Å
#1 st- `5. -: -; Å# o Ô, ¤Å& }8 §W& Ü- Cu2+ - & }8
§W5 °/ æ (1), (2) st1 V Cu2+ - - ¾ Cu wR º5. _r s #oÔ, ¤Å- º7 _ ½ æ (3) kB st1 `R4 5.
Table 1. Composition and operating conditions of electroless Cu plating bath
Composition CuSO4: EDTA Na2:HCHO 1.0:2.50:1.31
Distilled water 980 ml
Conditions pH 120
Temperature 401oC
Fig. 1. Cu quantification of the electrolessly Cu-plated activated car- bons measured by AAS.
Fig. 1B W, ´§ Cu Dwp1 Ú Cu-5, Cu-15 G Cu-40& Cu ¥Û& AA cÙÜ1 Ö ¸-5. /ÁQR
Cu& DyÛB Dw3- ¬7 ue ¬7 ¸1
×5. _r ¬7$, 3 DwÛ& $Q~ É* ã&
ôr 1 G ¸- ×5. - ´§ wDw
5 «, _Q - ´§ wDw& T s Dwh }& - /1 w yg7 T, 3°57
5[20].
3-2.
´§ Cu DwR È8 Cu-ACs& }Ý#1 FT-IR, XPS C SEMR ÉÊÍ -? IR& Ü1 Fig. 2 ÖY×5. ´§
Cu Dw Cu-ACs& IRÜ1 û Cu gh& Un
_r 3,450 cm−1b& U7 ´§ Cu Dw 0 §s§R x R ¬7 ¸1 ×RJ, Dw3- ¬7 ue w ¬7 - ×5. - U K ACs & T −OH
U7 Ö +-J, ´/=- 7×1 T ´/& U7 Ö +-5. 3,450 cm−1b& U& B ¬7
−OH U& Kã ¬7 ´/- ù#×/ R
5. ´§ Cu Dw1 Ú » Cu r Æ!e `aÛ& CuxOy ùâ& complex7 ù#×/ R 5[21].
Table 2 ´§ Cu Dw §0& Cu-ACs }& C, O C Cu&
#È8n ÉÊ/ W XPS cÙ& aÛÜ1 Ö ¸-5.
ÜRbç Dw- z{ ue Cu2p& Ì- x R ¬7
¸1 ×RJ, O1s& ÜD ã ¬7 ¸1 É Ê ×5. 6 C1s& ÜB §sQR ¼AÍ5. DwR ~
È8 A& ¥Û C ]& ¥Û1 ÉÊ/W O1s/C1sÜ C Cu2p/C1sÜ1 ]Ç5. & Ü1 û /ÁQR Dw3- ¬
7 ue Ü F ¬7×RJ, ue, Cu-40, 7N B Ü
~ 0.138 C 0.061n ÖY×5. -bç W, k- Cu Fig. 2. FT-IR results of the electrolessly Cu-plated activated carbons.
Table 2. Chemical composition of electrolessly Cu-plated activated carbons
Sample O1s (%) C1s (%) Cu2p (%) O1s/C1s Cu2p/C1s
as-received 9.6 89.8 - 0.107 -
Cu-5 10.7 85.6 2.9 0.125 0.034
Cu-15 11.0 84.4 4.2 0.130 0.049
Cu-40 11.6 83.6 5.1 0.138 0.061
Fig. 3. Copper subpeaks in Cu2p XPS spectra as a function of the plat- ing time.
41 6 2003 12
& Dw 3 » CuZ CuxOyùâD " aD Dy5
J, - Fig. 2 Ö ´/ U& ¬7 .Ú É Ê5. 8 ]& #n é~/W XPS& Cu2pU& sub- peakn *QR cÍ -n Fig. 3 ÖY×5. ÉÊ , D w3- ¬7¥ ue Cu metal& .Q~ Ì5 Cu(OH)2& Ì-
qQR ¬7 ¸1 ×5. -: Î, Cu7 Dw i#jA& A¥Û- ¬7 C 8]& #
$ b% ¸R 5.
Fig. 4 ´§ Cu Dw §0& ACsn ÉÊ ¸-5. ÉÊ }
- $&Q '( K 36 $ Cu-5 Cu-15& T ã&
particle«- ÉÊ ×RJ, Cu-40B )E* - +;ù1 , =
>«- ð ¸- ÉÊ×5. -: ´§ Dw3 ÛR
ù# Cuyg«- ACs } ¬m_ - , ./ 0 ù
# ¸R ÉÊ5.
3-3.
Fig. 5 ´§ Cu DwpR Cu-ACs& 77K/N2% lm
1 Ö ¸-5. _ ½B 36 1_ Cun Dy 3 6« F / 2B .Þ, lmÛ- .357 G - 0 .Þ1 * d4D -. ¬7_ ½ 5ù.â D
¥- ÉÊ×RJ, - BET cÐ ? K)/- $
Type 161 é~ ×5[15]. - k- K)/R -^z
jA#à& /, lm& 7 lm> cg& ~Ä, lm N- ?8 - *,& lm9B 85. lm9& 8 ¡
lm cg äm/ 4:_J, - lm cg $
äm cg& $7 ; °Æ_ lm& lmÄ- 8
5. ºHù F<, /& cg& => s& $7 3- `
, -: (.B ST U ` J, - ue % lmB º
, .3 Type 1& % lm1 ÖY 5[22].
Fig. 6B 36& K)/bn D-R plotR Ö ¸-5. h K)/ ]n ? lm & lmB 2B .ÞÄ , lm> & )t@ &, -0 lm },& 5 cgA lm- ð ¸R 5. D-R plot & K) /& b*B Æî& æ (4)n Ú9 P/P0=0.001-0.05 O-,
±z ÜR ¶& GîBn ± Yß6 Ü1 Ôh>A& /hb
9 ]Í, è /b õø lmÛ È . (0.001547)1 C9 ]ÍRJ, - Ü«B Table 3 ÖY×5.
(4) 9/, W .Þ u lm b, W0 K)/b, B
structural constant, β affinity coefficient G T D-5.
Fig. 7B Horvath-Kawazoe& slit pore F<& æ (5) /9 /
¶- 2 nm -~ K)/«& @Q/b(cumulative pore volume)n Ö GD-5.
(5)
9/, 2d /& ¶1 &K5.
Fig. 7, ACs& K)/- H 3-10 E aD U/n 7_ /
R ]# 5 ¸1 é~ ×RJ, 4 E -& /U/
n 7_ /& $ê- F1 Å ×5. Fig. 6& Ü1 Ú Cu-5 36& T K 36 K)/& b C /& c
¤7 V& q-n -_ ½ s Cu-15 Cu-40& T K)/
W
log =logW0–B T( ⁄β)2log2(P0⁄P)
Ψ( )2d P P0 ---
ln
=
62.38 2d 0.64– ---
– 1.895 10× –3 2d 0.32–
( )3
--- 2.7087 10× –7 2d 0.32–
( )9
---
– –0.05014 =0
Fig. 4. SEM images of the electrolessly Cu-plated activated carbon sur- faces.
Fig. 5. Adsorption isotherms of N2 at 77 K on the electrolessly Cu- plated activated carbons.
Fig. 6. D-R plots for N2 at 77 K on the electrolessly Cu-plated acti- vated carbons.
GH& b7 x R IJ ¸1 Å ×5. -: ¼AK-
´§ Cu Dw1 Ú i#jA& K)/ GH `b / µ- `L5 5. - Fig. 4& % lm, sb&
log scale Ü1 û lm& 3° ÞÄB Dw- z{ ue 3 6, ÞMR [- LTL ¸- × - lm9& ¼ A C lmÄ- ¼A ~¥R z5. .Þ- 10−6 b, ÉÊ ,NK)/ & lm- Cu-15 C Cu-40, V& Ö_ ½B ¸1 ÉÊ W, _Q ´§ Cu D w & K)/ µR /~ (.-e 5.
Fig. 8B Kelvinæ / BJHp1 -o9 ´§ Cu Dw
§·0& Cu-ACs& ?/ È8Ü1 @Q/b Ü1 Ú9 ÉÊ
Ü-J, ÜB Æî& æ (6), (7) G (8) /9 ]Í5.
(6)
(7)
(8)
9/, rk Kelvin s_, rBJH BJHp & /& s_, VmB
lm>& Ob, σ lm>& }NÄ, RB /h. , t t-plot
& P G T Dn &K5.
W æ«bç ±B Fig. 8& Ü, K)/& È8K- $ Q Cu Dw3- ¬7 ue /& b7 ¼A 1
×5. _r K)/& T Cu-15 C Cu-40- Cu-5
$ x R ¼AÍ ?/& T G ¼A K-7 $&Q $ QÍ5. _r Cu-40& T / s_- 10 Å b, b&
¬77 V& ¸1 ×5. - 5 36«, RÆ û (.R ƳD Fig. 4& SEM Oz,D ÉÊ ×-
D Cu Dw & ù# Cu yg« & K)/ ?/
O-& GH, / ¶- 10-20 Å b& /«& µ- U `
¸R ÉÊ5.
Table 3B ACs& ´§ CuDw §·0& $}Q& È8, è/b, /s_, BET . C G »lm9(neat heat of adsorption)%1
Ö ¸R -n Ú ]hQ~ /#& È8n 5.
$}Q& T Cu-5ª_ x ¼A7 Ö_ ½ÇR Cu-40&
T ã 26%& $}Q ¼A7 ðÍ5. -S x & $}
Q ¼A Î, _QÍ- Dw & T K)/ C 10-20 Å U/& /«& µ- H -; ð ¸R, -: $}Q
& ¼A UK è/b C K)/ bD $Q R É Ê×5. 6 BET . CÜ C »lm9& T Dw3- ¬7
ue ã ¼A ¸1 ×, - -K Í- Dw- z{ ue ,N K)/«- µ- ` §s QR lmÄ& ¼A7 ðÍ/ R é~×5.
3-4. NO
Chen %[23]& u NO i#jA kB jA* ¯S
&, >A A ºJ, - stð#= N2C COx k B b=1 ð34J, Æî kB *!V1 3Í5.
NOüC-ACsWCO-ACsü1/2 N2 (9)
COüCO-ACsWCO2üC-ACs (10)
CO-ACsWCO (11)
9/,, C-ACs CO-ACs i#jA+; }& jA C AÉ
RT P
P0 ---
ln 2σVm
rk --- –
=
rk 4.14 P P0 ---
log
=
rBJH rk t P P0 ---
+
=
Fig. 7. Cumulative micropore volume distribution of the electrolessly Cu-plated activated carbons.
Fig. 8. Cumulative mesopore volume distribution of the electrolessly Cu-plated activated carbons.
Table 3. Textural properties of the electrolessly Cu-plated activated carbons
as-received Cu-5 Cu-15 Cu-40 Specific surface area (m2·g−1) 1,162 1,123 954 861 Total pore volumea (cm3·g−1) 0.484 0.460 0.398 0.357 Micropore volumeb (cm3·g−1) 0.450 0.437 0.376 0.343 Micropore volume fraction (%) 93.8 94.3 94.5 96.1 Mesopore volumec (cm3·g−1) 0.034 0.023 0.022 0.014 Mesopore volume fraction (%) 7.0 5.0 5.5 4.0
Micro-/Mesopore ratio 13.2 19.0 17.1 24.5
Average pore radiusd (Å) 8.33 8.01 8.39 8.29
BET’s constant: C 948 945 940 932
Neat heat of adsorptione (kj·mol−1) 4.403 4.401 4.397 4.392
aV
ads
molar Volume of liquid N2 molar Volume of gaseous N2 ---
× From D-R plot,
b Vtotal ads×0.001547
Total pore volume
c –Micro volume
d2 Vtotal SBET ---
×
∆
e E=E0–EL=RTln(CBET)
41 6 2003 12
Ã/n Ö5. 6 Park %[24]& \] u Cu7 Dy ACF
,& NO V st& T Æî& *!V1 u ¸R XYZ5.
NOüCu-ACFWCu2O-ACFü1/2N2 (12)
2Cu2O-ACFW4Cu-ACFüCO2-ACF (13)
kB [\, eû ´§ Cu Dw Cu-ACs& T ACs }
» Cu C ã& 8 Cu7 #J, NO& =Q l m C ºB NO-Cu-ACs, NO-CuxOy-ACs C NO-C-ACs& st 1 Ú ` ¸R ]Ý5.
Fig. 9 K C ´§ CuDw- !3 Cu-ACsn -o9 ´
A, He ëÏE& 1,000 ppm ìD& 7En -o9 NO V
!Ë1 !3 Ü-5. K 36& T 90c^, M-
ð9 NO& ìD7 53 ¬7 1 Ö s
Cu-5 150c G Cu-15 200c aD, M- ÖLRJ, Cu-40& T M- 93, ÖL5.
Fig. 10 11B '],& N2C CO2ìDn Ö ¸-5. Fig. 10
& N2& È81 û , K 361 Z Cu7 Dy 36«
& T / 500 ppm 7ª_ N2ìDn Í5. - W,
*!V `L 2& NOcg7 c & N2
cgn ù# ¸R 5. st3- ¬7 ue K
36& T / 350 ppm aD& Ü1 -57 q ¼ A×5. - Chen& k- i#jA ghD ã& ºÄ1
-/ -J, N2ìD& ¼A .QR D7 "` ºst5 D7 a NO& =Q lmR ~ a M
55b/ R 5. s Cu7 Dy i#jA«B Cu NO
& 8¹Q~ º°oR ~ G N2ìD& ¼A7 K36c
`_ ½ ¸- ×5. Fig. 10& CO2ðÛ1
K 36& T7 7N Ö s DwÛ- ¬7 ue
qQR CO2& Ì- ¼A - ÉÊ ×5. - K 3 6& T /& º°oR ã& CO2n ð34_r d M
-: G Ì- ¼A ¸-J, Cun ¤¥ 36«&
T i#jA gh& ºÄ & / ã& CO2n ð34 _r, Park%- 3 *!Vc ð CO2«- =QR i#
jA lm G Ì- U Q_ ¸-e 5. eQR
NO V stB K<Cu-5<Cu-15<Cu-40 »R ÖLRJ, -
/ÁQR Dy ]& Ì $ ¸R ÉÊ×5. _r
Cu-40& T Mr1 û 5 365 x R G Vê-
.3Í -: -; Æî& OfR z5.
Table 3, micro-/mesopore& $Ü1 û Cu-40& T G Ü- 24.5 5 36 $ % UJ, -n Ú K)/& cê- .QR B ¸1 Å 5. NO& lm3 NO gh K)/
& lm- bc-_r NO cg7 K)/ 55/ W,
G Ú7 ?/ C /& cê- ?©5 5 [22]. - ?/- /& cê- g´ 1 T lm NO c g«- K)/ª_ -_ - ? lm 0 ¾ äm h 7 Ã#- # 5. _r Cu-40& T Dy Cu & K)/
5 ?/& µ- U `LRJ - K)/& cê - .QR ¬7×5. lm NO& äm- o-_ ½Ç 1 ¸R 5. 6 Î, Íi k- Cu-40& T 5 36 $ Cu(OH)2& ¥Û- .QR ÇRJ, -
T#ÉÃ/ NO& =Q~ interaction- 8×1 ¸R ]Ý
J, -7 Cu-40& NO Vst, ©~R °oj1 ¸R
5[25].
-.R, ACs& ´§ CuDwB _ ½B 36 $ NO
V "ê- §sQR ¬7×RJ, Cu-40& T M r1 û
K $ G "ê- 400% -. ¬7 ¸- ÉÊ×5. -
¸R Æ i#jA& ´§ DwB ;o } @p ?&
e 5. -: (.& -; /ÁQR Dy Cu
& Ì &J, b QR micro-/mesopore& $ G T#Éà / & NO& ~Ä % Ék- ¸R ÉÊ×5. _r Fig. 9. Outlet concentration of NO as a function of plating time.
Fig. 10. Outlet concentration of N2 as a function of plating time.
Fig. 11. Outlet concentration of CO2 as a function of plating time.
Cu& Dy ue ACsgh& lmÃ, $}Q K)/b % B ¼AÍ5. NO& V st- NO-C-ACs NO-Cu-ACs, 3
` ¸1 ¼ 5Û& Cu DyD l¶_r lm g h& lmÃ1 U ¼A34_ ½ IW Y, Cu& Dy- -^
_ ¸- 7N -.Q` ¸R ÉÊ5.
4.
Á \], ACs ´§ DwpR Cun DyÍRJ, -n -o9 NO lm C ºV KL G 9 ÊÍ5.
Dw 3- ¬7¥ ue ACs } Dy Cu& ÌB ¬7, s ACs& $}Q, / b %& lm#>- ¼A ¸- É Ê×5. -n -o9 NO V !Ë1 , Cu7 Dy
FJ 36«B Dy_ ½B ¸ $ B NO Vê1 ÍRJ,
Cu-40 36& T K 36 $ G "ê- 400% m ÖL5. _r NO& V7 lm gh,D ð ¸1 ¼
Cu& DyB lm gh& lmÃ1 U ¼A_ ½ IW Y
, -^_ ¸- õQ-e ÉÊ5.
Á \] ¹/nb& ¹/nX8O (M1-0105-00-0059)&
_º &9 {ÍRJ, - ¼Oo!5.
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