LiF/Al 2 O 3 /Al - V c p ú n Þ Ö ¨ £ ;ù p § T Ó Þ X ¢ Organic Light Emitting Diode
"
k ¤) o · 0 å · ¤r )) ç · , > ò 6 B) כ · ý ¡ . > ¬ £ · = r )Ù v ∗
í
H ; ¾ Ó@ / < Æ § Ó ü t o < Æõ , í ß 336-745
» ç ¡z
í
H ; ¾ Ó@ / < Æ § & ñ Ðl Õ ü t/ B N < ÆÂ Ò, í ß 336-745 (2006¸ 5 Z 4 2{ 9 ~ Ã Î6 £ §)
Ä
»l Ó ü t µ 1 Ï F g è (Organic Light Emitting Diodes, OLED)\ " f 6 £ §F G Ü ¼ ÐÂ Ò' Å Ò{ 9 ` ¦ 7 £ x @ / r
v l 0 A # Ã º5 Å x8 £ x õ 6 £ §F G s \ · ú º ú o ½ + É s × ¼ (Alkali halide) Pt, Carbon < Ê É r í ß o Ó
ü
t 1 p x` ¦ ¶ ú { 9 # s × æ 6 £ §F G (bilayer cathode)` ¦ ´ ú §s 6 x ô Ç . Ä ºo H í ß o} Al
2O
3ü < e ¦ Ð s
×
¼ ~ Ã Ì} LiF\ ¦ Al õ < Êa 6 x # × æ 6 £ §F G` ¦ ½ ¨$ í # LiF_ l 0 p x` ¦ ¦ % i . Ã º 5
Å
x8 £ x tris (8-quinolinolato) aluminum (Alq
3) \ $ LiF\ ¦ 7 £ x Ã Ì ô Ç Ê ê Al
2O
3(0, 0.5, 1.0, 1.5 nm) ü <
Al` ¦ Y V Ð 7 £ x Ã Ì # ë ß H LiF/Al
2O
3/Al ½ ¨ ¸_ × æ 6 £ §F G õ ü < Al
2O
3ü < LiF_ 7 £ x Ã Ì í H " f\ ¦ Ë ¨
#
Q ë ß H Al
2O
3/LiF/Al ½ ¨ ¸_ × æ 6 £ §F G x 9 s × æ 6 £ §F G Al
2O
3/Al` ¦ 6 x # ë ß H è _ : £ ¤$ í ` ¦
"
f Ð q § % i . LiF/Al
2O
3/Al` ¦ 6 x ô Ç è Al
2O
3/LiF/Al\ ¦ 6 x ô Ç è Ð 1 l x · ú s ± ú
¦ À Ó´ òÖ ¦ s Z } . ¢ ¸ô Ç Â Ò ¸^ í ß o} _ ¿ ºa & | 9 Ã º2 ¤ LiF \ _ ô Ç Å Ò{ 9 s t H â ¾ Ó
`
¦ Ð . Al
2O
3/LiF/Al × æ 6 £ §F G è ü < LiF\ ¦ É s × æ 6 £ §F G Al
2O
3/Al` ¦ 6 x ô Ç è \ ¦ q §
Al
2O
3_ ¿ ºa 1.0 nm s \ " f H LiF \ _ ô Ç Å Ò{ 9 ¾ Ó © s s × æ 6 £ §F G` ¦ 6 x ½ + É M : Ð H ß
¼ .
PACS numbers: 78.66.Qn, 78.60.Fi, 73.61.Ph
Keywords: Ä »l µ 1 Ï F g, Å Ò{ 9 , ½ + É Ð p o · ú º ú o , í ß oÓ ü t
I. " e  ] Ø
Ä
»l Ó ü t µ 1 Ï F g è \ ¦ ] j ½ + É M : Alq
3ü < < Êa ± ú É r { 9 < Ê Ã
º\ ¦ ° ú H F K5 Å q` ¦ 6 £ §F G F G Ü ¼ Ð 6 x À Ó ¸ ú â ì Ø
Ô ¦ µ 1 Ï F g ´ òÖ ¦ s a % ~ H z ´s ¸ ú · ú 94 R e [1- 3]. s H s [ þ t 6 £ §F G` ¦ ½ ¨$ í H F K5 Å q[ þ t ÐÂ Ò' Å Ò { 9
(electron injection)s ¸ ú ÷ & ¦ e 6 £ §` ¦ · p . s
Qô Ç F K5 Å q Ü ¼ Ð H K, Na, Li, Mg, Ca 1 p x Ü ¼ Ð" f · ú º ú o F
K5 Å q < Ê É r · ú º ú o Ð (alkali earth)F K5 Å q [ þ t Ð" f o < Æ& h Ü ¼
Ð B Ä º Ö ¸$ í s ß ¼ 9 Ô ¦ î ß & ñ # 4 x t } ` ¦ (Ä ºt · ú § ¦ z
´] j 6 £ §F GÓ ü t| 9 Ð 6 x l H # Q§ > . UPS (UV Photo- electron Spectroscopy) ¢ ¸ H XPS (X-ray Photoelectron Spectroscopy) ½ ¨\ _ s [ þ t F K5 Å q[ þ t õ Alq
3y © ô
Ç © ñ 6 x` ¦ # HOMO (highest occupied molecular orbital) Y U6 \ s ½ + Ë\ -t 8 & A á ¤ Ü ¼ Ð s 1 l x % i 6
£
§` ¦ Ð [4]. ¢ ¸ô Ç, D h Ðî r Ì s © I F K t @ / (forbid- den bands) ? /\ ë ß [ þ t # Q4 R e 6 £ §` ¦ ' a8 £ ¤ ½ + É Ã º e . s Ì s
∗
E-mail: [email protected]
© I H s p s 1 l x ô Ç D h Ðî r HOMO Y U6 \ ÐÂ Ò' 1.6 eV
&
ñ ¸ 0 A\ > r F 9 0 A\ " f 6 x H ¸ H F K5 Å q[ þ t \ " f µ
1 Ï| ) a . s H F K5 Å q õ Alq
3ì ø Í6 £ x # Alq
3−
ª s
: r (cation) s ë ß [ þ t # Qt l M :ë H s 9 s : r& h > í ß õ { 9 u
< Ês µ 1 ß) 4 R e [4].
LiF\ ¦ Al õ Alq
3s \ · û ª> 7 £ x Ã Ì À Óü < ´ òÖ ¦ s
@
/é ß y 7 £ x ô Ç H z ´s ¸A Â Ò' · ú 94 R M ® o Ü ¼ 9 Õ
ª " é ¶ ` ¦ µ 1 ßy l 0 Aô Ç ½ ¨ ´ ú §s s À Ò# Q4 R M ® o [5-7].
UPS Ð ½ ¨ô Ç \ _ · ú º ú o < Ê É r · ú º ú o Ð F K5 Å q [
þ
t s Alq3\ 7 £ x Ã Ì | ¨ c M : { 9 # Q H & ³ © õ Ä » > LiF
\
¦ 7 £ x Ã Ì # ¸ HOMO Y U6 \ s s 1 l x H כ õ Ì s © I
>
á
¤ ° ú É r 0 Au \ " f µ 1 Ï| ) a . ì r C ¸ > í ß \ _ LiF
ÐÂ Ò' Li ì r K ÷ &# Q Alq
3ü < ì ø Í6 £ x # Alq
3−÷ & H כ s
\ -t & h Ü ¼ Ð ) 6 x ) a [8]. 7 £ ¤, [ j o½ + ËÓ ü t Alq
3, LiF Õ ªo ¦ Als ° ú s > r F ½ + É M : LiF ì r K ÷ & H ì ø Í6 £ x s
0 p x H כ s . s z ´_ S X É r HREES Ð S X ÷ &
%
3 [8]. s × æ 6 £ §F G Ü ¼ Ð" f LiF/Al` ¦ 6 x ½ + É M : Å Ò { 9
7 £ x @ /´ òõ H HOMO Y U6 \ s ± ú f \ l ô Ç .
-542-
"
f LUMO (lowest unouccpied molecular orbital) Y U6 \ s
± ú
f ` ¦ _ p 9 band bending s l Ð H F K5 Å q _
`
Ø Ôp ï r 0 A (Fermi level)ü < Ä »l Ó ü t _ LUMO Y U6 \ _ s
t H level alignment \ K { © ô Ç ¦ : r . LiF
\
¦ @ /é ß y · û ª> (@ /| Ä Ì 1 ˚ A& ñ ¸) 7 £ x Ã Ì # ¸ Å Ò{ 9 _
7 £ x @ / & ³ © É r { 9 # Qè ß . s X O > e ¦ Ð s × ¼ ~ Ã Ì} ` ¦ · û ª
>
7 £ x Ã Ì # Å Ò{ 9 ` ¦ & ³$ y 7 £ x r v H ~ ½ ÓZ O s >
/ B N < Æ& h Ü ¼ Ð ´ ú § É r s 6 x s ÷ & ¦ e .
LiF\ ¦ 7 £ x à ̽ + É M : Alq
3ü < ì ø Í6 £ x # Li " é ¶ Ä »\ v >
÷
&# Q Alq
3A á ¤ Ü ¼ Ð S X í ß ÷ &# Q [ þ t # Q 9 S X í ß ÷ &# Q [ þ t # Qç ß Li
"
é
¶ [ þ t É r _ s 1 l x ¸\ ¦ 7 £ x r & Å Ò H % i ½ + É` ¦ # õ
& h Ü ¼ Ð µ 1 Ï F g ´ òÖ ¦` ¦ 7 £ x r & ï r H Ð ¦ ¸ e [9].
Zhou 1 p x _ ½ ¨\ _ LiF8 £ x s ' V , a A (tunneling)8 £ x Ü
¼ Ð 6 x # & h ] X ô Ç ¿ ºa \ " f _ Å Ò{ 9 ` ¦ ¸ü <Å Ò 9 ' V , a A þ j& h o ¿ ºa \ ¦ Å # Q Å Ò{ 9 ` ¦ & ³$ y b
# Qä ¼ 2 ; H Ð ¦\ ¦ % i [10].
¢
¸ _ " é ¶ Ü ¼ Ð UPS ½ ¨\ _ Alq
3/LiF/Al s Alq
3/Al \ " f © F G 8 £ x + þ A$ í \
É
r 0 A s × æ 6 £ §F G \ " f H 1.6 eV, Al F G É r 1.0 eV
÷
& H כ ` ¦ 8 £ ¤& ñ % i [11,12]. s כ É r / B N Y U6 \ \ @ /
#
LUMO Y U6 \ _ \ -t ç ß s © F G 8 £ x \ _ ô Ç \ - t
ë ß p u ± ú f ` ¦ _ p # ² D G _ Å Ò{ 9 © # 4 _ y
èü < ° ú É r _ p ) a .
s
× æ 6 £ §F G` ¦ 6 x # _ Å Ò{ 9 ` ¦ 7 £ x @ /r v H ~ ½ Ó Z O
É r í ß oÓ ü t` ¦ 6 x K ¸ % 3 # Q| 9 Ã º e . Shinar 1 p x É r Al
2O
3\ ¦ LiF @ / 7 £ x Ã Ì # z ´+ « >ô Ç õ 1.2 nm & ñ ¸\
"
f þ j@ / H d` ¦ Ð# Å Ò% 3 [13]. Al
2O
3 H B Ä º î ß & ñ ô Ç í
ß oÓ ü t Ð" f · û ª É r 8 £ x` ¦ : x # _ ' V , a A\ _ ô Ç
Å Ò{ 9 _ 7 £ x \ l ô Ç . < Ê É r Alq
3/Al > \ > r F
> ÷ & H " l or : r (exciton)` ¦ èY > r v H 8 £ x (quenching layer)` ¦ í ß oÓ ü t Al
2O
3} Å Ò H % i ½ + É` ¦ ô Ç . s Q ô
Ç Al
2O
3 H / B N l × æ \ " f B Ä º î ß & ñ ÷ &Ù ¼ Ð è _ ? /Â Ò
Ð S X í ß g Ë >È Ò H í ß è à ºì r` ¦ é ß H % i ½ + É ¸ ½ + É Ã º e
.
Ä
ºo H _ Å Ò{ 9 ` ¦ 7 £ x @ /r v H LiF ü < í ß o }
Al
2O
3\ ¦ < Êa 7 £ x Ã Ì # LiF/Al
2O
3/Al s Al
2O
3/LiF/Al _ × æ 6 £ §F G` ¦ 6 x # e ¦ Ð s × ¼ ~ Ã Ì }
õ í ß o} _ % i ½ + É` ¦ Ð " î S X y ¦ % i . 7 £ ¤, Alq
3ü < ´ ú ² ú ¢ É r ~ Ã Ì} _ 7 á x À Ó\ É r è : £ ¤$ í õ LiF
Alq
3ü < ² ú ¢ e t · ú § ¸ Å Ò{ 9 % i ½ + É` ¦ Ö ¼ H
כ s .
II. ÷ m Ç ] M ö
z
´+ « >\ 6 x ) a l ó ø Í É r ITO Ä »o l ó ø Í\ ïh A ) a $ í
ï_ ç _ כ ` ¦ 6 x % i Ü ¼ 9, $ ½ Ó 10 Ω/¡, ITO ¿ º a
180 nms . z ´+ « >\ e l \ $ í Ð o èÕ ª A
x / B N& ñ \ ´ ú H 80 mm × 80 mm _ ß ¼l Ð ITO / å J A Û
¼\ ¦ Ø Ô ¦, Positive PR ` ¦ 1.2 µm _ ¿ ºa Ð ¸ í % i
. Õ ª 6 £ § É r \ P % o õ & ñ Ü ¼ Ð 100
◦C _ \ P §ì ø Íl 0 A
\
" f 1ì r 20 í 1 l x î ß \ P % o ô Ç Ê ê, í Ð Û ¼ß ¼\ ¦ & ñ \ P
¦ UV\ ¸Ø ¦ r . s Ê ê [ j P : õ & ñ Ü ¼ Ð & ³ © Ó o\ 1ì r 1 l x î ß { ½ ¨ ¦ ¸Ø ¦ ) a  Òì r _ PR (photo-resist)` ¦ ] j
> ÷ &# Q PRs " é ¶ H ¸ ª @ / Ð z > ) a l ó ø Í É r 110
◦
C _ \ P §ì ø Íl 0 A\ " f 5ì r 1 l x î ß × ¼ Z s ( ç ¦, HCl : HNO
3: DI (Deionized) water\ ¦ y y 10 : 2 : 5_ q Ö ¦
Ð [ O # Q, 7ì r 1 l x î ß \ g Aô Ç . s X O > J ) a l ó ø Í É r [
j : r Ü ¼ Ð z e H PR` ¦ ] j % i .
J
) a l ó ø Í\ 7 £ x Ã Ì l \ 20 mm × 20 mm Ð ¸ ú
[ j : r, 9 þ t Ð Ð í2 £ §, [ j : r, B j 9 · ú ï` ¦, s èá Ô Ð
9
· ú ï` ¦ í H Ü ¼ Ð 60
◦C _ í6 £ § [ j' l \ " f y y _ 6 x Ó
o 15ì r 1 l x î ß í6 £ § [ j' ` ¦ ¦ t } Ü ¼ Ð | 9 è
Û ¼ Ð | ¸r ( .
Ä
»l Ó ü t 7 £ x Ã Ì É r / B N7 £ x à Ì~ ½ ÓZ O Ü ¼ Ð % i Ü ¼ 9, 7 £ x Ã Ì r
/ B N ¸ H 5 × 10
−6Torr s \ " f % i . ½ ¨o á Ô» 1 Ï
Ð s (Copper Phthalocyanine, CuPc), N’-diphenyl- benzidine (NPB), Alq
3_ 7 £ x Ã Ì r 7 £ x Ã Ì 5 Å q ¸ H 1 ∼ 1.5
˚ A/sec Ð { 9 & ñ > Ä »t % i ¦ y y 20 nm, 40 nm, 60 nm Ð 7 £ x Ã Ì % i . LiF, Al
2O
3 H } _ ¿ ºa · û ªl M :ë H
\
& ñ S X ô Ç ¿ ºa \ ¦ 0 AK ± ú É r 7 £ x Ã Ì 5 Å q ¸ 0.1 ˚ A/sec Ð LiF
H 1.5 nm, Al
2O
3 H 0 ∼ 1.5 nm Ð ~ Ã Ì} ` ¦ + þ A$ í % i .
Al
2O
3 H Al } ` ¦ + þ A$ í ô Ç Ê ê @ /l × æ \ 15ì r ç ß ¸Ø ¦ r & Al
2O
3~ Ã Ì} ` ¦ + þ A$ í % i . Shinar 1 p x _ ½ ¨\ _
¿
ºa 1.5 nm s _ Al ~ Ã Ì} É r / B N l × æ \ " f 10 ∼ 20ì r
¸Ø ¦ ÷ &% 3 ` ¦ M : í ß o÷ &% 3 [14]. 6 £ §F G É r Ä »l Ó ü t < H © ` ¦ Ä
º 9 # 10 nm | ¨ c M : t H 1 ∼ 3 ˚ A/sec _ q §& h
± ú
É r 7 £ x Ã Ì 5 Å q ¸ Ð 7 £ x Ã Ì % i ¦, 10 nm s © \ " f H 10 ∼ 15 ˚ A/sec _ 7 £ x Ã Ì 5 Å q ¸ Ð Ø Ô> 7 £ x Ã Ì % i . ] j ô Ç è
_ ½ ¨$ í É r ITO/CuPc/NPB/Alq
3/LiF/Al
2O
3(0, 0.5, 1.0, 1.5 nm)/Al ü < ITO/CuPc/NPB/Alq
3/Al
2O
3(0, 0.5, 1.0, 1.5 nm)/LiF/Al s 9, ¿ º è \ " f Al
2O
3_ 0 Au
oü < 0 ∼ 1.5 nm_ ¿ ºa o\ ¦ Å Ò# Q ] j % i . CuPc, NPB, Alq
3, Al1 p x` ¦ í < Ê # è _ ½ ¨ ¸\ ¦ Fig. 1 \
? /% 3 .
]
j ) a è [ þ t _ : £ ¤$ í É r Fig. 2 \ " fü < ° ú s ½ ¨$ í ÷ &# Q e
H © q [ þ t Ð 8 £ ¤& ñ % i . è \ Keithley 236 source-
measure unit Ü ¼ Ð · ú ` ¦ ¦ è µ 1 Ï F g H 1 l x
Fig. 1. Structures of the device with the triple layer cathode. (a) A-type triple layer cathode : ITO/ CuPc/NPB/Alq
3/LiF/Al
2O
3(0, 0.5, 1.0, 1.5 nm)/Al, (b) B-type triple layer cathode : ITO/CuPc /NPB/Alq
3/Al
2O
3(0, 0.5, 1.0, 1.5 nm)/LiF/Al.
Fig. 2. Schematic diagram for measurement of I-V-L of OLED with triple layer cathode.
î
ß © î ß _ Photo diode_ F g À Ó\ ¦ Keithley 487 pico ammeter Ð 8 £ ¤& ñ # 6 f ¸ Ð ¨ 8 í ß ô Ç õ \ ¦ ¸m '
\
Ø ¦§ 4 # I-V-L` ¦ 1 l x r \ 8 £ ¤& ñ % i . Photo diode H
³
ðï r F g " é ¶ \ Ð& ñ s ) a CS-1000 õ q §· Ð& ñ # F g À
Ó_ ° ú כ` ¦ 6 f ¸ Ð ¨ 8 í ß % i . I-V-L 8 £ ¤& ñ É r Lab view á Ô
ÐÕ ªÏ þ ` ¦ s 6 x K GPIB H s ^ ¦ Ð © q \ ¦ z ´r ç ß Ü ¼ Ð ] j
#
Q % i . { 9 & ñ À Ó\ ¦ ¦ · ú ` ¦ 8 £ ¤& ñ ½ + É M : H è
_ Ã º" î ` ¦ 8 £ ¤& ñ % i .
III. + s Ç Ê Ý
Fig. 1 \ " fü < ° ú s × æ 6 £ §F G _ ½ ¨$ í É r Alq
30 A\ LiF\ ¦ Ð 7 £ x Ã Ì ô Ç Ê ê Al F G` ¦ 7 £ x Ã Ì ô Ç כ ` ¦ A- type (ITO/CuPc/NPB/Alq
3/LiF/Al
2O
3(0, 0.5, 1.0, 1.5 nm)/Al) % i ¦ Alq
30 A\ Al
2O
3ü < Al í H " f Ð 7 £ x à Ìô Ç
כ
` ¦ B-type (ITO/CuPc/NPB/Alq
3/Al
2O
3(0, 0.5, 1.0,
Fig. 3. Current density versus voltage of devices with triple layer cathodes. (a) Devices with A-type triple layer cathode : ITO/CuPc/NPB/Alq
3/LiF/Al
2O
3(0, 0.5, 1.0, 1.5 nm)/Al, (b) Devices with B-type triple layer cathode : ITO/CuPc/NPB/Alq
3/Al
2O
3(0, 0.5, 1.0, 1.5 nm)/LiF/Al.
1.5 nm)/LiF/Al) s % i . ] j ô Ç r ¼ # _ l & h : £ ¤
$ í
Ü ¼ Ð" f ü @Â Ò · ú \ @ /ô Ç À Óx 9 ¸ü < µ 1 Ï F g [ jl \ ¦ 8 £ ¤
&
ñ # Fig. 3ü < Fig. 4\ y y ? /% 3 . Ã º5 Å x8 £ x
Alq
3ü < e ¦ Ð s × ¼ ~ Ã Ì} LiF ´ ú ² ú ¢ > ` ¦ + þ A$ í
H A-type _ â Ä º Al
2O
3_ ¿ ºa ¿ º 0 > | 9 Ã º2 ¤ À Ó x 9
¸ í H & h Ü ¼ Ð × ¦ # Q[ þ U` ¦ · ú Ã º e . À Óx 9 ¸ 7 £ x
l r H · ú É r í ß o} _ ¿ ºa \ ß ¼> _ > r t
· ú § ¦ ¸¿ º 10 V \ " f r ÷ & ¦ e . Õ ª Q B-type_
× æ 6 £ §F G` ¦ 6 x H â Ä º 7 £ ¤, Ã º5 Å x8 £ x Alq
3ü < í ß
o} Al
2O
3´ ú ² ú ¢ e ¦ LiF Õ ª 6 £ § Ü ¼ Ð 7 £ x à Ìs
)
a â Ä º H À Óx 9 ¸ 7 £ x l r H · ú s 15 V s
© Ü ¼ Ð s 1 l x K e 6 £ §` ¦ · ú Ã º e . í ß o} \ _ # À
Óx 9 ¸ & ³$ y × ¦ # Q[ þ t # Qe . s H · ú ¡" f / å L ô Ç ½ ¨
[ þ t _ õ ü < q 5 p w ô Ç õ Ð" f Alq
3/LiF > \ " f + þ A
$ í
÷ & H gap state ü < HOMO Y U6 \ s ± ú t H ´ òõ \ _
# level alignment s À Ò# Q M :ë H Ü ¼ Ð Û ¦ s ) a . 7 £ ¤,
Fig. 4. Luminance versus voltage of devices with triple layer cathodes. (a) Devices with A-type triple layer cath- ode : ITO/CuPc/NPB/Alq
3/LiF/Al
2O
3(0, 0.5, 1.0, 1.5 nm)/Al, (b) Devices with B-type triple layer cathode : ITO/CuPc/NPB/Alq
3/Al
2O
3(0, 0.5, 1.0, 1.5 nm)/LiF/Al.
Fig. 5. Current efficiency versus voltage devices with triple layer cathodes. (a) Devices with A-type triple layer cathode : ITO/CuPc/NPB/Alq
3/LiF/Al
2O
3(0, 0.5, 1.0, 1.5 nm)/Al (b) Devices with B-type triple layer cathode : ITO/CuPc/NPB/Alq
3/Al
2O
3(0, 0.5, 1.0, 1.5 nm)/LiF/Al.
_ Å Ò{ 9 © # 4 s ± ú ´ òõ s . ë ß LiF 6 £ § \ Al
2O
3í ß o} _ % ò ¾ ÓÜ ¼ Ð # À Ó è × ¦ # Q× ¼ H
â
¾ Ó` ¦ Ð .
µ
1 Ï F g _ [ jl H Fig. 4 \ " fü < ° ú s A-type_ × æ 6 £ §F G
`
¦ 6 x % i ` ¦ M : Ð B-type_ × æ 6 £ §F G` ¦ 6 x % i
`
¦ M : & ³$ y b # Q . í ß o} _ ¿ ºa ¿ º 0 > | 9 Ã º 2
¤ µ 1 Ï F g 6 f ¸ ± ú t 9 B-type â Ä º A-type Ð b # Q t
H & ñ ¸ d . s H % i r è \ â ìØ Ô H À Óx 9 ¸
B-type × æ 6 £ §F G _ OLED Ð A-type × æ 6 £ §F G` ¦
6 x ô Ç OLED\ " f s ` ß ¼l M :ë H \ Õ ª\ É r photon Ò q
t$ í s & & Ü ¼ 9 Õ ª\ É r µ 1 Ï F g 6 f ¸ & & l M :ë H s
. À Ó´ òÖ ¦ / B G ` ¦ Fig. 5 \ ? /% 3 . í ß o} _ ¿ º a
& | 9 Ã º2 ¤ ´ òÖ ¦ s & h y èô Ç . A-type Ð H B- type` ¦ 6 x H â Ä º\ í ß o} _ ¿ ºa y è\ É r
À
Ó´ òÖ ¦ _ y è H & ñ ¸ d . A-types B-type
¸¿ º í ß o} s e ` ¦ M : í ß o} s \ O H s × æ 6 £ §F G è (7 £ ¤, Al
2O
3¿ ºa = 0 { 9 M :) Ð ´ òÖ ¦ s y è % i .
LiF\ ¦ 6 x t · ú § ¦ Al
2O
3ü < Alë ß Ü ¼ Ð 6 £ §F G` ¦ ½ ¨$ í
# Al
2O
3/Al s × æ 6 £ §F G` ¦ 6 x % i ` ¦ M : í ß o} _ ¿ º a
\ ¦ 3 ∼ 20 ˚ A Ü ¼ Ð or v " f ] j ) a è _ µ 1 Ï F g ´ ò Ö
¦` ¦ Fig. 6 \ ? /% 3 . s M : NPB_ ¿ ºa H 40 nm, Alq
3 H 60 nm Ð # ITO/NPB/Alq
3/Al
2O
3/Al è
½
¨ ¸ Ð ½ ¨$ í ÷ &% 3 . Al
2O
315 ˚ A ¿ ºa \ ¦ | 9 M : ] j { 9
´ òÖ ¦ s & f ` ¦ Ðs ¦ e . × æ 6 £ §F G x 9 s × æ 6 £ §F G
\
" f Al
2O
3í ß o} _ ¿ ºa o\ É r ´ òÖ ¦ _ o\ ¦ Table 1 õ Table 2 Õ ªo ¦ Fig. 7\ ? /% 3 . B-type
× æ 6 £ §F G õ s × æ 6 £ §F G Al
2O
3/Al\ ¦ 6 x ô Ç â Ä º\ ¦ q
§ í ß o} _ ¿ ºa 1.0 nm { 9 M : t × æ 6 £ §F G` ¦
Table 1. The voltage and the current density when the efficiency of the devices with the triple layer cathode is shown maximum.
Thickness A-type triple layer cathode B-type triple layer cathode
(nm) η
max(cd/A) V
max(V) J
max(mA/cm
2) η
max(cd/A) V
max(V) J
max(mA/cm
2)
0 4.21 9.5 14.60 4.21 9.5 14.60
0.5 3.83 9.5 7.38 2.99 8.7 0.20
1.0 2.56 10.6 9.48 1.58 7.3 0.03
1.5 2.55 10.7 4.92 0.20 12.4 0.86
Fig. 6. Current efficiency versus voltage curve of OLED with double layer cathode - Al
2O
3/Al. The thickness of Al
2O
3was varied from 0.3 to 2 nm.
Fig. 7. The maximum current efficiency of the devices with the triple and double layer cathode is presented against the variation of the thickness of Al
2O
3. The efficiency of the device with A-type cathode is shown higher than that with double layer cathode and triple layer cathode B-type. For B-type triple layer cathode device, the efficiency is higher than the device with dou- ble cathode until the thickness of Al
2O
3is 1.0 nm. The effect of LiF is kept until the protecting insulator is not thicker than 1.0 nm.
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Table 2. The voltage and the current density when the efficiency of the devices with the double layer cathode is shown maximum.
Thickness Double layer cathode
(nm) η
max(cd/A) V
max(V) J
max(mA/cm
2)
0 1.17 15.4 14.46
0.3 0.81 14.4 1.21
0.5 0.96 15.3 2.58
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1.5 2.46 12.4 0.90
2.0 2.44 12.8 2.29
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Organic Light-Emitting Diodes with Triple Layer Cathode of LiF/Al 2 O 3 /Al
Yu-Suk Seo, Hoon Park, Hee-Sung Yu, Dong-Seop Shin, Jin-Soo Hong and Hee-Baik Chae
∗Department of Physics, Soonchunhyang University, Asan 336-745
Chang-Kyo Kim
Department of Technology Engineering, Soonchunhyang University, Asan 336-745 (Received 2 May 2006)
In order to increase the injection of electrons from the cathode (organic light-emitting diodes), we inserted not only a thin layer of an alkali halide (LiF, CsF, etc.) but also an insulating material (SiO
2, Al
2O
3, etc.) between the emitting layer and the cathode. Al
2O
3, LiF, and Al were used to form a triple-layer cathode to investigate the effect of LiF. The thickness of Al
2O
3was varied from 0.5 to 1.5 nm, and the deposition sequence for the triple-layer cathode was LiF/Al
2O
3/Al or Al
2O
3/LiF/Al. The efficiency of the device with the former triple-layer cathode was higher, and the operating voltage was lower, which indicates that LiF in contact with the emitting layer is more important than Al
2O
3in contact with the emitting layer. A double-layer cathode of Al
2O
3/Al was also fabricated to compare with the triple-layer cathode. The effect of LiF was still observed until the thickness of the insulating layer, Al
2O
3, had reached than 1.0 nm. The efficiency of the device with a triple-layer cathode was larger than that of the device with a double-layer cathode when the thickness of Al
2O
3was thinner than 1.0 nm. The injection of electrons was still enhanced even when an insulation layer of Al
2O
3was deposited between the electron transporting layer and the LiF, provided the thickness of Al
2O
3was thinner than 1.0 nm.
PACS numbers: 78.66.Qn, 78.60.Fi, 73.61.Ph
Keywords: Organic light emitting diodes, Electron injection, Alkali halide, Oxide
∗