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ËX ê s ì ŕ ¤; c  \ ¥ ZnO 2 U c lT c l  Œ ºÑ ÷ ƒ »ì Å; c å ¾ ˔ X ¢ Ž ì ŏ Œ

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ËX ê s  ì ŕ ¤; c   \ ¥ ZnO 2 U c lT c l  Œ ºÑ ÷ ƒ »ì Å; c å ¾ ˔ X ¢ Ž ì ŏ Œ

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2

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ñ $ í s  a % ~ € Œ ¤“ ¦, ~ à Ì} Œ •_  7 £ x ‚ Ã Ì r ç ß – 9 þ t M :  H / B N/ å L ÷ &  H 0 >_  [ jl  ß ¼“ ¦ 7 £ x ‚ Ã Ì “ : r • ¸ 9 þ t à º2 Ÿ ¤   & ñ $ í s

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ç ß –, / B N/ å L ÷ &  H 0 >_  [ jl \  q Y V # Œ { 9  _  ß ¼l   H & & ’ t ë ß – Ä »| ¾ Ó_  [ jl \   H q Y V # Œ 7 £ x ÷ &

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Ùþ

˜d”#Q: ZnO2,~ÃÌ}Œ•, RF Û¼(', XRD, SEM, e¦ݼ

A Study on the Dependences of the Structures and Surface of ZnO 2 Thin Films on the Growth Variables

Jin Jeong · Do-Sun Na · Bong Ju Lee

Department of Physics, Chosun University, Gwangju 501-759 (Received 1 June 2011 : revised 27 June 2011 : accepted 25 July 2011)

The ZnO

2

thin film formed a crystallized well when the deposition time was short, the intensity of the supplied power was low, and the temperature of the thin film was low. However, at the same time, the ZnO

2

thin film crystallized better for a longer deposition time, a greater a intensity of the supplied power, and a higher temperature of the thin film. This demonstrated the double behavior of ZnO

2

. The surface of the thin film was examined using scanning electron microscopy (SEM).

According to the results of the examination, the grain size increased in proportion to the deposition temperature, the deposition time and the supplied power, but had no proportional relation to the intensity or the flow rate.

PACS numbers: 50,61

Keywords: ZnO2, Thin films, Sputter, Growth deposition

I. " e  ] Ø

ZnO

2

~ à Ì} Œ •“ É r È Ò" î „  F G, I € ª œ„  t , Û ¼G ' p" f 1 p x \  ´ ú § s

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„

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, ~ à Ì} Œ •_    † < Ê 1 p x s  ×  æ כ ¹   [4]. ZnO

2

~ à Ì} Œ •_  ½ ¨› ¸& h 

E-mail: [email protected]

:

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 כ s  .

-904-

(2)

Table 1. The condition of ZnO

2

thin films.

Deposition Substrate Flow Gas

Power Sample Time Temperature Quantity

(W) (min) (

C) N : O(sccm)

S300-60 60 300 10:10 75

S400-60 60 400 10:10 75

S450-60 60 450 10:10 75

S400-120 120 400 10:10 75

S450-120 120 450 10:10 75

Table 2. The condition of ZnO

2

thin films.

Deposition Substrate Flow Gas

Power Sample Time Temperature Quantity

(min) (

C) N : O(sccm) (W)

S300-75 120 300 10:10 75

S300-50 120 300 10:10 50

S400-50 120 400 10:10 50

S450-50 120 450 10:10 50

‘

: r  7 Hë  H“ É r RF Û ¼( ' \  ¦  6   x # Œ 7 £ x ‚ Ã Ì “ : r • ¸, r ç ß –, / B N /

å

L ) a 0 >[ jl , Ä »{ 9 ÷ &  H í ß –™ è| ¾ Ó\  ¦    or &  ZnO

2

~ à Ì} Œ •

`

 ¦ ë ß –[ þ t # Q { 9   — ¸€ ª œõ    & ñ $ í  © œ 1 l x \  @ / # Œ ƒ  ½ ¨ 

%

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 â `  ¦ : Ÿ x # Œ › ¸  % i “ ¦, › ¸| \    É r ~ à Ì} Œ •_    & ñ $ í



© œ€  “ É r X‚    r] X  © œu \  ¦ : Ÿ x # Œ ì  r$ 3  % i  .

II. ÷ m Ç] M ö U ê s0 n É

ZnO

2

~ à Ì} Œ •“ É r R-F Û ¼( ' \  ¦ s 6   x # Œ Si[110]l ó ø Í 0 A\  7

£

x ‚ Ã Ì % i  . ' ‘  Û ¼– Ѝ  H “ ¦í  H • ¸ í ß –™ èÛ ¼\  ¦  6   x 

%

i “ ¦  ¿ “ É r Zn `  ¦  6   x % i  . ZnO

2

~ à Ì} Œ •“ É r 7 £ x ‚ Ã Ì “ : r • ¸, 7

£

x ‚ Ã Ì r ç ß –, / B N/ å L ) a 0 >_  [ jl , Ä »{ 9  > hÛ ¼ Ä »| ¾ Ó 1 p x`  ¦   



or &  $ í  © œ % i  . Table 1“ É r z  ´+ « >\ " f  6   x ) a ~ à Ì} Œ •_  r

« Ñ s  9, Table 2  H S300-75, S300-50, S400-50 Õ ªo “ ¦ S450-50 r « ћ ¸| s  .

ZnO

2

~ à Ì} Œ •_    & ñ ½ ¨› ¸  H X‚    r] X  © œu (XRD, Rigagu, Rix-2000, Japan)\  ¦ : Ÿ x # Œ › ' a ¹ 1 Ï % i “ ¦, ~ à Ì} Œ •_ 

³

ð€   + þ A © œ“ É r È Òõ  „    ‰ & ³p  â (SEM, Phillips, Technai, F20)`  ¦ s 6   x # Œ ~ à Ì} Œ •`  ¦ › ' a ¹ 1 Ï % i  .

III. + s ÇÊ Ý õ m Í À X Ø8 ý

Figure 1 “ É r S300-60, S400-60 Õ ªo “ ¦ S450-60 ~ à Ì} Œ •_  XRD  ”  s  . 7 £ x ‚ Ã Ì “ : r • ¸  © œ@ /& h Ü ¼– Ð Z  }“ É r ~ à Ì} Œ •\ " f

Fig. 1. X-ray diffraction patterns of S300-60, S400-60.

~ Ã

Ì} Œ •_    & ñ $ í “ É r a % ~ t  · ú §€ Œ ¤ . S300-60 ~ à Ì} Œ •“ É r S400-60 õ  S450-60 ~ à Ì} Œ •õ   H  Ø Ô>  (101)€  õ  (102)€   (203)€  s  Ø  ¦

‰

&

³ # Œ 7 £ x ‚ Ã Ì “ : r • ¸ ± ú “ É r “ : r • ¸\ " f ~ à Ì} Œ •_    & ñ $ í s   © œ

@

/& h Ü ¼– Ð a % ~“ É r   õ \  ¦ ˜ Ð% i  .

Figure 2  H S400-120 Õ ªo “ ¦ S450-120 ~ à Ì} Œ •_  XRD 

”

 s  . Fig. 1õ   Ø Ô>  7 £ x ‚ Ã Ì r ç ß –s  120ì  r Ü ¼– Ð 7 £ x 

(3)

Fig. 2. X-ray diffraction patterns of S400-120 and S450- 120 thin films.

| ¨

c M : 7 £ x ‚ Ã Ì “ : r • ¸ 7 £ x  H † d \    " f ~ à Ì} Œ •_    & ñ $ í s  a % ~



f ” `  ¦ ˜ Ð# ŒÅ ғ ¦ e ”  . S450-120“ É r (100), (101), (102), (110), (112) Õ ªo “ ¦ (203)€  s  Ø  ¦‰ & ³ % i  . ~ à Ì} Œ •“ É r 7 £ x ‚ à Ì

“

: r • ¸ 7 £ x  ½ + É M :  H (002)€  Ü ¼– Ð Ä º‚   $ í  © œ H † d s  › ' a ¹ 1 Ï

÷

&% 3  .

Figure 3“ É r S300-50 Õ ªo “ ¦ S300-75~ à Ì} Œ •_  XRD  ”   s

 . ¿ º ~ à Ì} Œ • — ¸¿ º (002)€  õ  (103)€  Ü ¼– Ð Ä º‚   $ í  © œ ÷ &

“

¦ e ” t ë ß – ~ à Ì} Œ •\  / B N/ å L ) a 0 >_  [ jl  9 þ t à º2 Ÿ ¤ ~ à Ì} Œ •_ 

 

& ñ $ í “ É r a % ~  & ’  . s   H Fig. 1, 2 Õ ªo “ ¦ 3_    õ \ " f

˜

Ð1 p w s  7 £ x ‚ Ã Ì “ : r • ¸, 7 £ x ‚ à Ìr ç ß – Õ ªo “ ¦ / B N/ å L ) a 0 >_  [ jl 

 ~ à Ì} Œ •_    & ñ $ í õ  x 9 ] X ô  Ç › ' a > \  ¦ f ” `  ¦ ˜ Ð# ŒÅ ғ ¦ e ” 



.

Figure 4   HS300-50, S400-50 Õ ªo “ ¦ S450-50 ~ à Ì} Œ •_  XRD  ”  s  . 7 £ x ‚ Ã Ì “ : r • ¸ 7 £ x  H † d \    " f š ¸y  9 ~ Ã Ì }

Œ

•_    & ñ $ í “ É r ×  ¦ # Q [ þ t% 3  . s   H Fig. 1 _    õ ü < { 9 u 

% i  . q “ §& h  ± ú “ É r 0 >\  ¦ / B N/ å L ô  Ç ~ à Ì} Œ •\ " f  H “ : r • ¸

± ú

`  ¦ à º2 Ÿ ¤ ~ à Ì} Œ •_    & ñ $ í “ É r a % ~ € Œ ¤ . & h “ É r 7 £ x ‚ Ã Ì r ç ß –\ " f



 H “ : r • ¸ ± ú `  ¦ à º2 Ÿ ¤ / B N/ å L ÷ &  H 0 >_  [ jl   Œ •`  ¦ à º2 Ÿ ¤

~ Ã

Ì} Œ •_    & ñ $ í s  a % ~ € Œ ¤“ ¦, 7 £ x ‚ Ã Ì r ç ß –s  ß ¼   / B N/ å L ÷ &  H

Fig. 3. X-ray diffraction patterns of S300-50 and S300-75 thin films.

0 >_  [ jl  9 þ t à º2 Ÿ ¤ l ó ø Í_  7 £ x ‚ Ã Ì “ : r • ¸ 7 £ x  H † d \   



" f ~ à Ì} Œ •_    & ñ $ í s  a % ~  f ” `  ¦ ˜ Ð# ŒÅ ғ ¦ e ”  .

Figure 5  H S400-60 Õ ªo “ ¦S400-120 ~ à Ì} Œ •_  SEM ”   s

 . ~ à Ì} Œ •_  ¨ î ç  H { 9  _  ß ¼l   H 0.0125 \ " f 0.025 µm– Ð 7

£

x ‚ Ã Ì r ç ß –s  7 £ x  H † d \    " f { 9  _  ß ¼l  & & ’  . ¿ º

~ Ã

Ì} Œ • — ¸¿ º ß ¼“ ¦  Œ •“ É r { 9  [ þ t s  [ O # Œ e ”   H bi-modal+ þ AI 

\

 ¦ ˜ Ð% i  .

Figure 6“ É r S300-50, S450-50 Õ ªo “ ¦ S300-75~ à Ì} Œ •_  SEM  ”  s  . S300-50 Õ ªo “ ¦ S300-75~ à Ì} Œ •\ " f ˜ Ð1 p w s

 7 £ x ‚ Ã Ì “ : r • ¸  H ° ú  “ ¦ / B N/ å L ô  Ç 0 >_  [ jl   \  ¦ M : { 9 



_  ß ¼l   H 0.02 \ " f 0.12µmÜ ¼– Ð / å L  y  7 £ x ÷ &# Q" f ~ Ã Ì }

Œ

•_  { 9   ß ¼l  / B N/ å L ÷ &  H 0 >_  [ jl \  % ò † ¾ Ó`  ¦ Šғ ¦ e ”

6 £ §`  ¦ ˜ Ð# ŒÅ ғ ¦ e ”  . S300-50õ  S450-50 ~ à Ì} Œ •\ " f 7 £ x

‚ Ã

Ì “ : r • ¸ `  ¦  ° ú ˜ M : ~ à Ì} Œ •_  { 9   ß ¼l   H 0.02 \ " f 0.03 µm Ü ¼– Ð    o\  ¦ ˜ Ð# Œ ~ à Ì} Œ •_  { 9   ß ¼l  7 £ x ‚ Ã Ì “ : r • ¸\ 

% ò

† ¾ Ó`  ¦ ~ à Γ ¦ e ”   H  כ Ü ¼– Ð › ' a ¹ 1 Ï÷ &% 3  .

IV. + s Ç Â ] Ø

(4)

Fig. 4. X-ray diffraction patterns of S300-50, S400-50 and S450-50 thin films.

Fig. 5. SEM micrographs showing surface morphology of (a) S400-60and (b) S400-120 thin films.

ZnO

2

~ à Ì} Œ •“ É r 7 £ x ‚ à Ìr ç ß –, Ä »{ 9 ÷ &  H Û ¼€ ª œ, / B N/ å L ÷ &  H  0

>_  [ jl , ~ à Ì} Œ •_  7 £ x ‚ Ã Ì “ : r • ¸ ~ à Ì} Œ •_    & ñ $ í \  % ò † ¾ Ó`  ¦ p

u “ ¦ e ”   H  כ Ü ¼– Ð   z Œ ¤ . “ : r • ¸  7 £ x ‚ Ã Ì r ç ß –_  7 £ x 

 ~ à Ì} Œ •_    & ñ $ í \  % ò † ¾ Ó`  ¦ Šғ ¦ e ” % 3 t ë ß – q Y VK " f  © œ

› '

a› ' a > \  ¦ ° ú   H  כ Ü ¼– Ð    t  · ú § " f ~ à Ì} Œ •s  “ : r • ¸  7

£

x ‚ Ã Ì r ç ß – s ü @\    É r Ä »| ¾ Ó, 0 > [ jl  1 p x 4 Ÿ ¤ ½ + Ë& h “   ½ ¨

›

¸\  % ò † ¾ Ó`  ¦ ~ à Γ ¦ e ”   H  כ Ü ¼– Ð › ' a ¹ 1 Ï ÷ &% 3  . Õ ª Q  ~ Ã Ì }

Œ

• ³ ð€   { 9  _  ß ¼l   H “ : r • ¸, 7 £ x ‚ Ã Ì r ç ß –, 0 > [ jl , Ä »| ¾ Ó 1

p

x \  % ò † ¾ Ó`  ¦ ~ à Γ ¦ e ” 6 £ §`  ¦ ˜ Ð# ŒÅ ғ ¦ e ”  .

Fig. 6. SEM micrographs showing surface morphology

of (a) S300-50, (b) S450-50, and (c) S300-75 thin films.

(5)

Y

c p w Š à U Ø ”  ô

[1] S. B. Krupanidhi and M. Sayer, J. Appl. Phys. 56, 3308 (1984).

[2] P. Zu, Z. K. Tang, G. K. L. Wong, M. Kawasaki, A. Ohtomo, H. Koinuma and Y. Segawa, Solid State Commun. 103, 456 (1997).

[3] M. Liu, A. H. Kitai, P. Mascher and J. Luminesc. 54, 35 (1992).

[4] Z. X. Fu, C. X. Guo, B. X. Lin and G. H. Liao, Chin.

Phys. Lett. 15, 457 (1998).

[5] Z. X. Fu, B. X. Lin, G. H. Liao and J. Wu, J. Cryst.

Growth 193, 316 (1998).

[6] X. L. Xu, S. P. Lau, J. S. Chen, Z. Sun and B. K.

Tay, J. W. Chai, J. Mater. Sci. Process 4, 617 (2001).

[7] X. L. Xu, S. P. Lau, J. S. Chen, Z. Sun and B. K. J.

Cryst. Growth 223, 201 (2001).

수치

Table 1. The condition of ZnO 2 thin films.
Fig. 2. X-ray diffraction patterns of S400-120 and S450- S450-120 thin films. | ¨c M : 7£x ‚Ã Ì “:r • ¸ 7 £x  H†d \    &#34; f ~à Ì}Œ •_   &amp;ñ $í s  a%~  f” `¦ ˜ Ð# ŒÅ ғ ¦ e”  
Fig. 6. SEM micrographs showing surface morphology of (a) S300-50, (b) S450-50, and (c) S300-75 thin films.

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