Korean Chemical Engineering Research

전체 글

(1)Korean Chem. Eng. Res., Vol. 43, No. 1, February, 2005, pp. 129-135. Ks WÇÓ (` £§ ósLÃ ´ Z . |/ / k. †. ãò¬H/ dHàHê ãò [wQ ÁÉ2 192-1 ¸ ö ³ [¤, 2004¸ 10ö 18³ >). 200-701 (2004 6 8. Efficient Desulfurization and Denitrification by Low Temperature Plasma Process Sung-Min Kim, Dong-Joo Kim and Kyo-Seon Kim† Department of Chemical Engineering, Kangwon National University, 192-1, Hyoza-2-dong, Chunchon, Kangwon-do 200-701, Korea (Received 8 June 2004; accepted 18 October 2004). ß È. á õCÑ2 :) U³÷ öM à_Ñ g SO Q SO /NO fMÁSs ~Gk, ñ6 à_¡¤Í fMÁ SÑ Ùj2 s ªJk³ Æ G. à_¡¤³ ¯ÍMF, :) ?²¤, ÍQÑ, äí ð, (NO, SO , NH , H O and O ) s ~G. ¯Íæ2 MF, :) ?²¤ 2 ÍQÑ« ÍWÑ ¶ 2 O Q H OÍ ÍöÑ ¶ SO fMÁSê SO /NO Q fMÁSo ÍG. K, NH ð, Í Í O¤´ SO /NO fMÁSo ÍG. « Y×J¯ êËo NO Q SO õ fMG, .K :) U³÷ öM à_ ßj ª ,ð É0³ Äî ¤ À. 2. 2. 3. 2. 2. 2. 2. 2. 2. 2. 3. x. 2. x. Abstract − In this study, we have analyzed the removal efficiencies of SO2 and SO2/NO by the pulsed corona discharge process and investigated the effects of several process variables on those removal efficiencies systematically. The effects of process variables such as applied voltage, pulse frequency, residence time, and initial concentrations of reactants (NO, SO2, NH3, H2O, and O2) on the removal efficiency were analyzed. As the applied voltage, the pulse frequency or the residence time increases or as the O2 or the H2O or the NH3 concentration in the inlet feed gas stream increases, the SO2 removal efficiencies and the simultaneous removal efficiencies of SO2/NO also increase. These experimental results can be used as a basis to design the pulsed corona discharge process to remove NOx and SOx. Key words: Desulfurization, Denitrification, Low Temperatune Plasma Process, Removal Efficiency. 1.. C «. s ³kE õÍ)Ñ ¯Wê 4zÍ) Ú 0dís fMG2 D¬« M Ë´ §ª ÎhÑ äfG2 Í) ÜÍÍ SO õ WÇGñ NO , VOC(volatile organic compound), CO Ùk³ e¬ öÑ !¶ G÷ Q)ÊÑ «Ë KgÍ)õ QÑ s-O ¤ À2 á D¬ y® « 4(Ê À[1-5]. « D¬ c® U8 s Ý

(2) , äDõ DÊ MD4,DQ ³K - ¶ gÆõ. ÄO ¤ À´ ðD ·ÉWÄ« kÎ IK ßYs äÊ Às O 4n¶ äD gÆ kÎ ÑG. K, 8_K ³÷Í ä D o òÑ U° æ, « âÑ Ñw( HÍ JÊ ~,fMÑ ÁêJ«. U¾, ¬äH ßjÍ ÍDG³ c³ õ Í) s-D¬³ íè« lè¾ «P´(Ê À[6-13]. Amirov Ù[14]o )T-Ë ³÷ äD Ñ NO÷ SO f MÑ ¶Ë s «·J/Y×Jk³ õgG2) OH, O , N Ù ¶Ë« NO÷ SO fMÑ s Âj2 ak³ ÝÊG . Park Ù[15]o ³÷ öM Q)Ês «ÄK NO fMÑ SO s õgGk SO Í CO Q ç« ÍöÑ !¶ NO . M ,hs y[k³ h äfÍ ¿j ãdæ

(3) h Æ« 21§D M¬ ÊzÍÍj Æk³ ¡1íÊ À. U¾ h Æ o ñ Æ~tQ õî « h ÆÑ ÿt« §ª f0Ñ )[J¯ s k _Í æÉ. ³÷ öM à_ Ñ K %z·%0 D¬o Eo õg íèDÑÑ gGÊ SO , NO ço ¬D1 í0s QÑ s-O ¤ À2 ßY Ñ DÊ ñ6 ör D¬J, fJ, h 1 éfYs ÝUg k ¤ À 2 D¬³ ÍæÊ À. ¬D y æ2 1òs k«D .g 2 ßDJ¯ óòÑ 1í fMßj íè Ú jÍ ®gæ 2) MÑ2 :) ³÷ öM à_s «Äg ¬D 1ís fMGD .K õgÍ lè¾ ,}æÊ À. I5 ñ¶ K %z ·%0 àro ¬DF ÆQÑ ñ¶ K öM. 2. 2. x. x. x. 2. 3. 2. 2. x. † To. whom correspondence should be addressed. E-mail: [email protected]. 2. 129. 2. x.

(4) 6 Æö6?ö6/. 130. fMÁS« ÍWs îûG. Kimê Hong[16]o KM ß ³÷ öMs 0K NO Q SO ~gõ Y×Gk, KM ß, äW gÆ, õ s- ÆQ ¡dõ 0g NO Q SO Í ~gæÊ fMÁS« ÍWs ÝÊG. DinelliQ Civitano[17]2 :) ³÷Ñ õ á Í)³z NO Q SO Q fMõ õgG k NO Q SO ðD , NH , äD Í) 5, Hydrated lime Ù« NO Q SO fMÁSÑ s c2 ak³ ÝÊG. Kim Ù[18, 19]o :) ³÷ öM à_s «ÄK NO fMÑ ñ¶ K dH Ú ½É ßs H1Rs ÄGñ õg GÊ tHJ¯ ½É U s ~G. (b( :) ³÷ öMs «ÄK SO Ú NO fM õg2 Q« ¤}æÉk÷ Q fMõ ÊsK ao í· à_¡¤ ¡d Í fMÁSÑ Âj2 s ªJk³ ~K õg2 4) £~ j :o =«. á õgÑ2 :) ³÷ öM äDõ «Ä K %z·%0Q à_¡¤ ¡dÑ !ñ %z·%0 U ê Q fM õ ªJ¯ Y×s 0g ~G. x. x. x. x. x. x. x. 3. x. x. x. x. x. 2.. x. .g äD gÑ Electro-Chemical Gas Analyzer(Digitron, GreenLine MK II)s jGñ +_G. ³÷ öM äDÑ @ ê ½É í0o gÑ õê ~D ½gÑ ÊÁS 1õ jGñ fMG. Y×o 5 FÑ }Gñ k, NO Ú SO fMQ à_¡ ¤ s <4ÝD .g ,gÆQk³ ¯ÍMFo 50 kV, : ) c²¤2 200 Hz, ÍQÑo 7.2 sec, SO ðD 2 800 ppm, NO ðD 2 100 ppms ÄG. ³÷ öM =2 ä D³ ¯Íæ2 MF, äD =(Y1

(5) Q «´ ) ), ÍQ Ñ Ú àD ÆQ(D 5, ¤~ ) ÙÑ ÊK[21]. á õgÑ2 )T-Ë ³÷ öMs «ÄK NO , SO fM Y ×s .g ¯ÍMFs 20-50 kV³ ¡dQZ. äD SO. 2 800-1,500 ppmk³, NO 2 100-300 ppmk³, NH 2 100-3,200 ppmk³ ¡dQZk ÍQÑo 2.94-7.2 sec³, : ) c²¤2 50-200 Hz³ ¡dQZ. HÇ Y× êËo 3¡ « Y× ¤} á +_K à èjõ ÄG. 2. 2. x. 2. 3. / . 3.. á õgÑ :) ³÷ öM äDõ «ÄK %z·%0 õg õ .g ÄK Y×ßj í÷2 Fig. 1ê ç. Y×ßj2 äí c½ Ú f´z, äD, Mtà Ú f´z -Ê Í ) +_z³ «P´ À. NO, SO , NH , N Ù D2 ÎÎ MFCõ «ÄGñ _

(6) àG. NO Ú SO fM Y×Q H O s ÊsGD .g ³_

(7) H Oõ bubblerõ ÄGñ O DÑ ¯dQE äD ³ àG. O DÑ ¯dê H O Í äD ³ àæD MÑ G2 as ö(GD .g ù s ÄGñ D 5õ ³_Gj K(QZ. äD³ àæ2 NH Í äD ³ àæD MÑ ñ DËê äG2 as ö (GD .g NH às ñ D àê ~-G. NO Ú SO fMõ .g á õgÑ ÄK :) ³÷ öM äD2 cylinder-wirek³ Y1

(8) o 5 cm«Ê L«2 38 cm« äD é0o Pyrex«. ³÷ è@ Mo äD yÑÑ jê )º¯-) () 0.5 mm)«, [(o äD Ñ )º¯-) ak³ jG. [(Mo ò0k³ L «2 30 cm«[20]. äDÑ ³÷õ è@QÿD .g ÊMF è@D(Kh Switching )õ ÄG. Y×Ñ ³÷ è@ MÑ àæ2 MF ¿DQ c²¤2 1Y³) é(Tektronix TDS 220)õ Ä Gñ +_G. ³÷ öM á NO Ú SO õ +_GD 2. 3. 2. 2. 2. 2. 2. 2. 2. 2. ûG Z +{. (< ? {Ã SO C» ¯ÍMF Ñ äD³ ¯Íæ2 MF« SO fMÑ Âj2 s ðD SO õ ¡dQÿ

(9) +_G. äD³ ¯Íæ2 : ) c²¤Q Í QÑo ,g ÆQk³ GÊ, äD³ ¯Íæ2 MFs 20-50 kV³ ¡dQZk, äD³ àæ2 ðD SO. Í 800, 1,200, 1,500 ppm³ A ÎÎÑ SO fM ÁSs + 3-1.. 2. 3-1-1. Fig. 2. 2. 2. 2. 2. 3. 3. 2. x. Fig. 1. Schematic of experimental set up.. ¤@¤ C43× C1 2005 2. x. Fig. 2. SO2 removal efficiencies for various initial SO2 concentrations as a function of applied voltage (pulse frequency=200 Hz, residence time=7.2 s)..

(10) I# ñ¶ K à_Ñ K z Ú 0. _G. äD³ ¯Íæ2 MF« ÍO¤´ MÉË« Í(2 èÑw(Í ÍGñ SO fM äÑ y®K l ¶Ë(O, O , OH, OH ) @ 2 ÍG³ ¶Ëê uñ dHä Ñ K SO fMÁSo ÍGÊ À. ¯ÍMF« 50 kV« Ê ðD SO Í 1,500 ppm ³ A2 SO fMÁS« 10%«É a« 800 ppm³ A2 SO fMÁS« 29%³ ÍG. «2 ðD SO Í s¤´ äD Ñ SO fMÑ ®gæ2 Ñ w(Í ¬Jk³ Q« 1®Gj æ´ SO fMÁS« ÝG 2 ak³ ~ê. 3-1-2. ÍQÑ Fig. 3o äD³ K½æ2 D Í QÑ(D K

(11) ) ¡d Í SO fMÑ Âj2 s ÷. äD³ ¯Íæ2 MF ê :) c²¤2 ,g ÆQk³ GÊ, ÍQÑo 2.94, 5.43, 7.2 sec³ ¡dQZs A ðD SO ¡dÑ !¶ SO fM ÁS s ÎÎ +_G. Í QÑ« ÍWÑ !¶ äD Ñ ê öM òÑ SO Í Ëå2 QÑ« L´(Ê

(12) 1Ú QÑ 8 dHäÑ g SO Í Mhæ³ SO fMÁS« Í GÊ À. Fig. 2ÑsF ðD SO Í ÍO¤´ SO f Mõ .K ~É¢ èÑw( o ÝG³ SO fMÁS « ÝGÊ À. 3-1-3. :) c²¤ Fig. 4Ñ2 äD³ ¯Íæ2 MF :) c²¤ ¡dÍ SO fMÑ Âj2 s ÷,. äD³ ¯Íæ2 MFê SO ð D 2 ,g ÆQk³ GÊ, :) c²¤õ ¡dQZs A ÍQÑ ¡dÑ !ñ SO fM U s <4ÝI. ¯ÍMF : ) c²¤Í ÍWÑ !¶ .QÑ¢ MÉÑ Íg(2 èÑ. 131. 2. 3. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. Fig. 4. SO2 removal efficiencies for various residence times as a function of pulse frequency ([SO2]0=800 ppm, applied voltage=50 kV).. 2. w(2 ÍGñ

(13) Qo l ¶Ë« @ æÊ l ¶ Ëê uñ dHäÑ g

(14) Qo SO Í fMæ ³ SO fMÁS« ÍGÊ À. Í QÑ« ÍWÑ

(15) H QÑ 8 dHäÑ g fMæ2 SO o ÍK as Ý«Ê À. 3-1-4. Í) Æ Fig. 52 D Æ ¡dÍ SO fMÑ Âj2 s ÷. äD³ ¯Íæ2 MF, :) c²¤, ðD SO 2 ,g ÆQ k³ GÊ, H OQ O ÍÑ !ñ SO fMÁSs Æ G. D Í QÑ« 7.2 sec ³ A, SO Q N DOs àGñ ³ ÷ öMGs A2 SO fMÁS« 10%«(O SO +N +O Ñ 2 SO fMÁS« 14%³, -Ê SO +N +O +H OÑ2 SO f MÁS« 29%³ ÍG. «2 ¤~ê Í ÍöÑ !¶ NO Ú SO H äÑ îñG2 d ¶(O, O , OH, OH ) Ë @

(16) « ÍGñ dHäÑ K SO H Í ÍG ³ SO fMÁS« ÍGD Aé«. äD³ SO +N O s Ä|s Î, SO 2 ÊÑw( MÉËê )[J £GM÷ (R 1) ñ ~ÉË(N , O)ê ä(R 2,3)Ñ g SO÷ SO ³ M hæ³ SO fM ÁS« 10% ÍK as Ý«Ê À[16, 22]. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 3. 2. 2. 2. 2. 2 * 2. 2. 3. 2. Fig. 3. SO2 removal efficiencies for various initial SO2 concentrations as a function of residence time (pulse frequency=200 Hz, applied voltage=50 kV).. e+SO2→SO+O+e. (1). N2* +SO2→N2+SO+O SO2+O→SO3. (2) (3). 3-2.. (< ? {Ã NO SO £ C» ðD 2. 3-2-1.. Korean Chem. Eng. Res., Vol. 43, No. 1, February, 2005.

(17) 6 Æö6?ö6/. 132. ÆQk³ GÊ, NO ðD õ 100, 200, 300 ppmk³, SO ðD õ 0, 800, 1,200, 1,500 ppmk³ ÎÎ ¡dQZ. á õgÑ ÄK à_ ¡¤Ñ +_ê NO 2 ðD NO. Ñ 1% _³ ÷

(18) . «2 NO³z NO Í @ æÉKÉ OH÷ OH ¶Ëê uñ äÑ g ¬z~ NO « HNO ³ dê ak³ ¶ê. !¶ á õgÑ2 NO. ¡dOs à_ ¡¤¡dÑ !¶ ÷,. ðD NO Í 100 ppm¯ Î, NO fMQÑ2 fMÁS« 68%³ +_æÉ k÷ SO õ 800 ppm « Í|s AÑ2 fMÁS« 89%³ u 21% Í. SO ÍÑ !ñ NO fM ÁS ÍÑ ¬K _eK èn o 4) äê àÍ Ç. K ÍD k³ á õ gÑsF H OQ ê

(19) O (10%)õ SO , NOQ Wÿ ³÷ öM äDÑ àK Î, {ê ço äÑ g NO fM ÁS« ÍO ¤ Àk÷ Ý áJ¯ fM èn ä« ® gê[7]. 2. 2. 2. 2. 2. 3. 2. 2. 2. 2. 2. 2NO+O2→2NO2 NO2+SO2+H2O→H2SO4+NO SO ðD Í 1,200, 1,500 ppm³ A NO fMÁSo NO fMQÝ2 ÍG(O ðD SO ÍÑ !ñ NO f MÁSo Æ ÝG2 as Ý«Ê À. «2 ðD SO Í ÍO¤´ NO fM O 4n¶ SO fMõ .K dHäÑ

(20) Qo ¶« ÄÞD Aé« êJk³ NO fMõ . K Mt Ñw( « ÝK a«. ðD NO Í ÍWÑ !¶ NO fMõ .K ~É¢ èÑw( o ÝGñ NO f MÁS« ÝGÊ À. 2. 2. 2. Fig. 5. SO2 removal efficiencies for various gas compositions as a function of residence time ([SO2]0=800 ppm, applied voltage=50 kV).. 2. Fig. 6. NO removal efficiencies for various initial NO concentrations as a function of initial SO2 concentration (applied voltage=50 kV, residence time=7.2 s).. o NOQ SO õ QÑ àGs A SO ðD ¡ dQ ðD ¡dÍ NO fMÑ Âj2 s ÝñcÊ À . äD³ ¯Íæ2 MF, :) c²¤, D ÍQÑo ,g Fig. 6 NO. 2. ¤@¤ C43× C1 2005 2. 2. Fig. 7. SO2 removal efficiencies for various initial NO concentrations as a function of initial SO2 concentration (applied voltage= 50 kV, residence time=7.2 s)..

(21) I# ñ¶ K à_Ñ K z Ú 0. Fig. 8. NO removal efficiencies for various initial NO concentrations as a function of applied voltage ([SO2]0=800 ppm, pulse frequency =200 Hz, residence time=7.2 s).. Fig. 7o Fig. 6ê ço à_ÆQÑ NOQ SO õ QÑ à Gs A NOQ SO ðD ¡dÍ SO fMÑ Âj2 s ÷. ðD SO Í 1,200, 1,500 ppm ³ A2 ðD NO. Í 0-300 ppmb( ¡g SO fMÁSÑ Ã s Ùj( :(O ðD SO Í 800 ppmk³ WGJ I ³ A2 SO fMÁS« WGJ j ÷÷Ê À. ðD NO « 100 ppmz ÍWÑ !¶ Fig. 6ÑQ ço «K³ SO fMõ .K . ~É¢ Ñw( o ÝG³ SO fMÁS« ÝGÊ À. ðD SO Í ÍWÑ !¶ SO fMõ .g

(22) Qo M tÑw(Í ®gös Ý«Ê À. 3-2-2. ÍQÑ Fig. 8Ñ2 äD³ K½æ2 D ÍQÑ« NOQ SO Q fMÑ Âj2 s ÷,. äD³ ¯Íæ2 MF, : )c²¤, SO ðD 2 ,g ÆQk³ GÊ, NO ðD õ 100, 200, 300 ppmk³, äD³ K½æ2 D ÍQÑs 2.947.2 sec³ ¡dQZ. Fig. 6ê 7ÑsF NOOs fM|s AÝ NOQ SO õ Q fM|s A NO fMÁS« ÍGÊ À . D ÍQÑ« ÍO¤´ äD Ñ

(23) H QÑ 8 NO HäÑ g NO fMÁS« ÍGÊ À. ðD NO. Í ÝWÑ !¶ NO fMõ .K ~É¢ èÑw( o ÍG NO fMÁS« ÍK as Ý«Ê À. 3-2-3. ¯ÍMF Fig. 92 äD³ ¯Íæ2 MF« NOQ SO Q fMÑ Âj2 s ÷. äD³ ¯Íæ2 :) c²¤, D Í QÑ, SO ðD 2 ,g ÆQk³ GÊ, äD³ ¯Í æ2 MFo 20-50 kV³, ðD NO 2 100, 200, 300 ppmk. 133. Fig. 9. NO removal efficiencies for various initial NO concentrations as a function of applied voltage ([SO2]0=800 ppm, pulse frequency =200 Hz, residence time=7.2 s).. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. Fig. 10. NO removal efficiencies for various initial NO concentrations as a function of pulse frequency ([SO2]0=800 ppm, applied Voltage=50 kV, residence time=7.2 s).. ³ ¡dQZ. Fig. 8ÑsF NOOs fM|s AÝ NOQ SO õ Q fM|s A NO fMÁS«

(24) j ÷÷ Ê À. äD³ ¯Íæ2 MF« ÍWÑ !¶ äD à 2. Korean Chem. Eng. Res., Vol. 43, No. 1, February, 2005.

(25) 6 Æö6?ö6/. 134. Fig. 11. NO removal efficiencies for various initial NH3 concentrations as a function of applied voltage (pulse frequency=200 Hz, residence time=7.2 s, [SO2]0=800 ppm, [NO]0=100 ppm).. æ2 Ñw(Í ÍGñ l ¶Ë @ 2 ÍG Ê NO fMõ .K dHäo }¶(³ NO fMÁS« Í GÊ À. 3-2-4. :) c²¤ Fig. 10Ñ2 äD³ ¯Íæ2 :) c²¤ ¡dÍ NO Ú SO Q fMÑ Âj2 s Ýñg. äD³ ¯Íæ2 MF, D Í QÑ, SO ðD 2 ,g ÆQk³ GÊ, äD³ ¯ Íæ2 :) c²¤2 50-200 Hz³, ðD NO 2 100, 200, 300 ppmk³ ¡dQZ. :) c²¤Í ÍWÑ !¶ .QÑ¢ àMt« ÍGñ MÉË« Í(2 èÑw(Í ÍG³ NO fMÁS« ÍGÊ À. 3-2-5. DHn4 Fig. 11ê 122 DHn4 ÍÑ !ñ NOQ SO fMU s ÎÎ ÷. äD³ ¯Íæ2 :) c²¤, D Í QÑ, SO ðD , NO ðD 2 ,g ÆQk³ GÊ, äD³ ¯ Íæ2 MFs 20-50 kV³, äD³ àæ2 ðD NH 2 0-2,400 ppmk³ ¡dQZ. ¯ÍMF« 50 kV ³ A, Fig. 11Ñ äD³ NH Í àæ( :s A2 NO fMÁSo 89%«É a« NH Í 2,400 ppmk³ àGs A2 NO fMÁS« 99.8%³ ÍGÊ Fig. 12Ñ NH õ àG( :s A2 SO fMÁSo 25%«É2) NH õ 2,400 ppmk³ àWÑ !¶ SO fMÁSo 71%³ ÍG. NH õ ÍWÑ !¶ NH Í SO Q uíj äGñ

(26) DH((NH ) SO Ù)s @ GÊ «Rj @ ê zDH ,

(27) Ñ NOÍ NH Q Wÿ ô äs ³kÿD AéÑ NO Ú SO fMÁS« ¿j ÍG2 ak³ ~ê. 2. 2. 2. 2. 3. 3. 3. 3. 2. 3. 2. 3. 2. 3. 4 2. 4. 3. 2. ¤@¤ C43× C1 2005 2. Fig. 12. SO2 removal efficiencies for various initial NH3 concentrations as a function of applied voltage (pulse frequency=200 Hz, residence time=7.2 s, [SO2]0=800 ppm, [NO]0=100 ppm).. 4.. û «. á õgÑ2 :) ³÷ öM äDõ «ÄGñ à_¡¤ ¡ dÍ SO fMQ NO Ú SO QfMÑ Âj2 s Y×J k³ ~Gk, à_ ¡¤ s ~GD .g ðD NO Ú SO , ¯ÍMF, D ÍQÑ, :) c²¤, D Æ , D Hn4 Ùs ¡dQZ. (1) äDÑ ¯Íæ2 MFê :) c²¤Í ÍO¤´, äD ³ K½æ2 D ÍQÑ« ÍO¤´ SO fMÁSo Í Gk, ðD SO Í ÝO¤´ äD³ àê SO fMÁSo ÍG. (2) SO +N HYÍ)Ñ ¤~ê Í ÍöÑ !¶ SO f MÁSo ÍG. (3) NO Ú SO Q fMQ SO Í2 NO fMÑ Ã s cÉ(O NO Í2 SO fMÑ Ã s c( :I. (4) NO Ú SO Q fMQ D ÍQÑê ¯ÍMF, :) c²¤Í Í O¤´ NO Ú SO fMÁSo ÍG. (5) NO Ú SO Q fMQ Íæ2 NH Í ÍO¤´ NO Ú SO fMÁSo ¿j ÍG2), U¾ NH Í 2,400 ppm³ A NO2 M fMæÉk SO Íß o f MÁSs á Y× p.Ñ »É. á õgÑ Y×Jk³ »´, ê2 à_ ÆQ ¡dÑ !ñ ªJ¯ ÁS ~ê Yf NO Ú SO fM à_Ñ ¬dGñ JÄWÑ À´ ÁSJ¯ ÒM ÆQ Ú Mt Ýõ .K ßj íè Ñ y®K _Ýõ fàO ¤ Às ak³ D¬ê. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 2. 3. 2. 3. 2. x. x.

(28) [ ÷. I# ñ¶ K à_Ñ K z Ú 0. « øéo 2002¸ KhH¬,é (òÑ Gñ õgæ É5n(KRF-2002-041-D00123).. +S 1. Clements, J. S., Mizuno, A., Wright, C. F. and Davis, R. H., “Combined Removal of SO2, NOX, and Fly Ash Simulated Flue Gas using Pulsed Streamer Corona,” IEEE Trans. Ind. Appl., 25(1), 63-69(1989). 2. Chang, J. S., Lawless, P. A. and Yamanoto, T., “Corona Discharge Process,” IEEE Trans. Ind. Appl., 19(6), 1152-1166(1991). 3. Marnix, A. T., van Hardeveld, R. and van Veldhuizen, E. M., “Reactions of NO in a Positive Streamer Corona Plasma,” Plasma Chem. Plasma Process., 17(4), 371-391(1997). 4. Masuda, S. and Hosokawa, S., “Control of NOx by Positive and Negative Pulsed Corona Discharge,” IEEE Trans. Ind. Appl., 29(4), 781-785(1993). 5. Nunez, C. M., Ramsey, G. H., Ponder, W. H., Abbott, James, H., and Hamel, L., “An Innvolative Control Technology for VOCs and Air Toxics,” AIR & WASTE, 43(2), 242-247(1993). 6. Tas, M. A., van Hardeveld, R. and van Veldhuisen, E. M., “Reactions of NO in a Positive Steamer Corona Plasma,” Plasma Chem. Plasma Process., 17(4), 371-391(1997). 7. van Veldhuisen, E. M., Zhou, L. M. and Rutgers, W. R., “Combined Effects of Pulsed Discharge Removal of NO, SO2 and NH3 from Flue Gas,” Plasma Chem. Plasma Process., 18(1), 91-111 (1998). 8. Yan, W., Wang, N., Zhu, Y. and Zhang, Y., “SO2 Removal from Industrial Flue Gases using Pulsed Corona Discharge,” J. Electrostatics, 44(1), 11-16(1998). 9. Oda, T., Yamashita, R., Takahashi, T. and Masuda, S., “Atmospheric Pressure Discharge Plasma Decomposition for Gaseous Air Contaminants-Trichlorotrifluoroethane and Trichloroethylene,” IEEE Trans. Ind. Appl., 32(2), 227-232(1996). 10. Urashima, K., Chang, J. S. and Ito, T., “Reduction of NOx from Combustion Flue Gases by Superimposed Barrier Discharge Plasma Reactors,” IEEE Trans. Ind. Appl., 33(4), 879-886(1997). 11. Mok, Y. S. and Nam, I. S., “Modeling of Pulsed Corona Dis-. 135. charge Process for the Removal of Nitric Oxide and Sulfur Dioxide,” Chem. Eng. J., 85(1), 87-97(2002). 12. Bromberg, L., Cohn, D. R., and Rabinovich, A., “Plasmatron Fuel Converter-Catalyst Systems for After Treatment of Diesel Vehicle Emissions,” International J. Vehicle Design, 25(4), 275-282(2001). 13. Nishikawa, K. and Nojima, H., “Air Purification Effect of Positively and Negatively Charged Ions Generated by Discharge Plasma at Atmospheric Pressure,” Jpn. J. Appl. Phys., 40(8), 835837(2001). 14. Amirov, R. H., Chae, J. O., Dessiaterik, Y. N., Filimonova, E. A. and Zhelezniak, M. B., “Removal of NOx and SO2 from Air Excited Streamer Corona: Experimental Results and Modeling,” Jpn. J. Appl. Phys.,, 37(6), 3521-3529(1998). 15. Park, J. Y., Kim, I. K., Koh, H. S., Kim, J. D., Lee, D. C. and Chang, J. S., “SO2 Effect on NOx Removal by Corona Discharge System,” Trans. KIEE., 47(11), 1979-1982(1998). 16. Kim, Y. H. and Hong, S. H., “NOx/SOx Decomposition of Flue Gases by AC Dielectric Barrier Corona Discharges,” Ungyong Mulli, 11(4), 393-400(1998). 17. Dinelli, G. L. and Civitano, M., “Industrial Experiments on Pulsed Corona Simultaneous Removal of NOx and SO2 from Flue Gas,” IEEE Trans. Ind. Appl., 26(4), 535-541(1990). 18. Kim, D. J., Choi, Y. R. and Kim, K. S., “Effects of Process Variables on NOx Conversion by Pulsed Corona Discharge Process,” Plasma Chem. Plasma Process., 21(4), 625-650(2001). 19. Kim, D. J. and Kim, K. S., “Analysis on Plasma Chemistry and Particle Growth in Corona Discharge Process for NOx Removal Using Discrete-Sectional Method,” IEEE Trans. Plasma Sci., 31(2), 227-235(2003). 20. Park, J. H, Kim, D. J. and Kim, K. S., “Analysis on NOx Conversion and Particle Characteristics in NOx Removal by Corona Discharge Process,” HWAHAK KONGHAK, 40(3), 351-356(2002). 21. Chang, J.-S., Pontiga, F., Atten, P. and Castellanos, A., “Hysterisis Effect of Corona Discharge in a Narrow Coaxial Wire-Pipe Discharge Tube with Gas Flow,” IEEE Trans. Ind. Appl., 32(6), 1250-1256(1996). 22. Chang, M. B., Balbach, J. H., Rood, M. J. and Kushner, M. J., “Removal of SO2 from Gas Streams Using a Dielectric Barrier Discharge and Combined Plasma Photolysis,” J. Appl. Phys., 69(8), 4409-4417(1991).. Korean Chem. Eng. Res., Vol. 43, No. 1, February, 2005.

(29)