• 검색 결과가 없습니다.

Single Focus Hypocycloidal Pinch X ê sV 8 ý X-ray U ê s û s Ú — ¤V R Ë

N/A
N/A
Protected

Academic year: 2021

Share "Single Focus Hypocycloidal Pinch X ê sV 8 ý X-ray U ê s û s Ú — ¤V R Ë"

Copied!
5
0
0

로드 중.... (전체 텍스트 보기)

전체 글

(1)

Single Focus Hypocycloidal Pinch X ê sV 8 ý X-ray U ê s û s Ú — ¤V R Ë

*

× <U  ý — ¡ · ) í <a : @¦  ·  ™ »( å ] 8 ;

î

ß –1 l x @ /† < Ɠ § Ó ü t o † < Æõ , î ß –1 l x 760-749 (2005¸   10 Z 4 15{ 9  ~ à Î6 £ §)

HCP (hypocycloidal pinch)  © œu _   Ï ? @ Òì  r`  ¦ „  F G Ü ¼– Ð  6   x # Œ ô  Ç > h_  œ í& h s  ë “ By • ¸2 Ÿ ¤ à º& ñ

% i  . ~ ½ ӄ   Û ¼0 Au   H IPS (inverse pinch switch)\  ¦  © œ‚ Ã Ì # Œ [ O + « > õ & ñ \ " f Û ¼0 Au _  õ \  ¦ ~ ½ Ót 

% i  .  Ø ÔŒ 4 H Û ¼_  · ú š§ 4 õ  ~ ½ ӄ  „  · ú š    o\    É r plasma focus + þ A$ í `  ¦ › ' a ¹ 1 Ï % i  . s   © œu – ÐÂ Ò '

 µ 1 ÏÒ q t   H X-ray _  µ 1 ÏÒ q t : £ ¤$ í `  ¦ › ¸  % i  .  Ø ÔŒ 4 H Û ¼· ú š§ 4  80 ∼ 130 mtorr, „  · ú š 9 ∼ 17 kV_ 

% ò

% i \ " f plasma focus ¸ ú ˜ + þ A$ í ÷ &% 3  . X-ray detector\  ¦ s 6   x # Œ 8 £ ¤& ñ  ) a Û ¼& 7 ˜à Ô! 3 `  ¦ ì  r$ 3 ô  Ç    õ

  © œ 0.18 ∼ 7.4 keV(0.16 ∼ 6.7nm) % ò % i _  X-ray µ 1 ÏÒ q t % i  .

PACS numbers: 52.25. Nr

Keywords: HCP, ƒ  " l oÛ ¼‚  ,  Ø ÔŒ 4 H Û ¼, % i — 2 ;u Û ¼0 Au 

I. " e  ] Ø

R. Kurzweil“ É r > í ß –l _  $ í 0 p x“ É r à Ô ½ ™t Û ¼'  > hµ 1 Ï÷ &

l

 š ¸A  „   Ò'  t à º& h Ü ¼– Ð 7 £ x ÷ &# Q M ® o    H  כ `  ¦ t 

&

h  €  " f 2020¸  \  s Ø Ô€   B j— ¸o ü < Û ¼x × ¼ €  \ " f “   ç

ß –_  ¿ ºö &\  s \  ¦  כ s  “ ¦ \ Vƒ   % i   [1]. 2000¸  @ /

œ

íì ø Í\   H CMOS _  > s à Ô_  U  ´s  0.13 µms ~    כ s  2013¸  \   H 13 nm \  s Ø Ô“ ¦ 2019¸  \   H 6.5 nm – Ð ×  ¦ # Q [

þ

t  כ s  “ ¦ ô  Ç  [2]. s  Qô  Ç õ & ñ \ " f [ j@ /_  lithog- raphy\  ¦ 0 A # Œ ] jî ß –  ) a ~ ½ ÓZ O _    soft X-‚  _  s 6   x s

 . { 9 ì ø Í& h “   X-‚  “ É r  © œ % ò % i  5 pm\ " f 10 nm  s 

\

 e ”   H „   l  – Ð" f Õ ª ×  æ 0.1 nm ˜ Ð  |    © œ_  X-

‚

 `  ¦ soft X-‚  s  “ ¦ ô  Ç . Soft X-‚  “ É r ì ø ͕ ¸^ ‰ } 9  ] j Œ •

`

 ¦ 0 Aô  Ç lithography, “ ¦^ ‰ Ó ü t o  z  ´+ « >, Y Us $  * 3 i ç (laser pumping), X-‚   ‰ & ³p  â , ×  æ$ í   Ò q tí ß – (neutron yield), { 9 



 beam_  ~ ½ ÓØ  ¦ 1 p x \  s 6   x ) a  . Soft X-‚  `  ¦ % 3 l  0 Aô  Ç

~

½ ÓZ O \   H „    q e ” s   Y Us $ \  ¦ F K5 Å q ³ ð€  \  Ø  æ   r  v

  H ~ ½ ÓZ O , synchrotron ~ ½ Ó  F g`  ¦ s 6   x   H ~ ½ ÓZ O , Õ ªo “ ¦

~

½ ӄ   õ & ñ \ " f µ 1 ÏÒ q t÷ &  H e  ¦  Û ¼ \  ¦ s 6   x   H ~ ½ ÓZ O  1 p x s

 e ”   [4,5].

IC í ß –\ O \ " f lithography_  t 5 Å q& h “   µ 1 τ  s  t ƒ  ÷ &“ ¦ e ”

  H s Ä »  H D h– Ðî  r  © œq \  ¦ • ¸{ 9    H X < } Œ •@ /ô  Ç q 6   x s 

€ 9

כ ¹ l  M :ë  H s  . s \  ¦ K    l  0 A # Œ s p  > hµ 1 Ï

 )

a # Œ Q ~ ½ ÓZ O  ×  æ \ " f ™ è½ ©— ¸ z  ´+ « >z  ´\ " f F g " é ¶ _  : £ ¤$ í ,

E-mail: [email protected] Tel : 054-820-5448, FAX: 054-823-1628

lithogrphy x 9 soft X-‚  _  6 £ x6   xz  ´+ « >`  ¦ ½ + É Ã º e ”   H  © œu 

 plasma focus  © œu s  . Plasma focus  © œu   H 1960¸  

@

/ p ² D G _  Matherü < ™ èº  _  Filippov 1 l x» ¡ ¤+ þ A e  ¦  Û ¼



  © œu \  ¦   + þ Ar †    כ Ü ¼– Ð ¿ º „  F G _  U  ´s  U  ´“ ¦ ì ø Í â s

  Œ •“ É r Mather+ þ Aõ  ¿ º „  F G _  U  ´s   ú ª“ ¦ ì ø Í â s   H Filippov+ þ AÜ ¼– Ð  Ð ü t à º e ”   [6–10]. 1977¸   p ² D G _  J.E.

Lee  H DPF (dense plasma focus)  © œu \  ¦ > h‚   # Œ HCP (hypocycloidal pinch)\  ¦ > hµ 1 Ï % i   [11]. { 9 ì ø Í& h “   e  ¦   Û

¼   © œu   H soft X-ray µ 1 ÏÒ q t r  hard X-ray 1 l x r \  µ 1 Ï Ò q

t >  ÷ &  H X <, HCP  © œu   H DPF  © œu \  q K  |   e  ¦   Û

¼  ´ n u r ç ß –õ   H e  ¦  Û ¼  ^ ‰& h Ü ¼– Ð “   # Œ soft X- ray µ 1 ÏÒ q ts  Ä »o  • ¸2 Ÿ ¤ “ ¦î ß –ô  Ç  © œu s   [3,4,11]. HCP



 H soft X-ray _  µ 1 ÏÒ q t\  B Ä º Ä »o ô  Ç & h `  ¦ t “ ¦ e ” Ü ¼ 

Š

© œÜ ¼– Ð  ) a 6 £ §F G ó ø Íõ   _  € ª œF G ó ø ÍÜ ¼– Ð “  K  focus Š © œ Ü

¼– Ð + þ A$ í  ) a    H é ß –& h s  e ” % 3  . s  ƒ  ½ ¨\ " f  H s  Qô  Ç é ß

–& h `  ¦ > h‚   # Œ  _  € ª œF G ó ø Íõ  6 £ §F G ó ø ÍÜ ¼– Ð HCP  © œ u

\  ¦ ½ ¨$ í # Œ ô  Ç > h_  focus + þ A$ í ÷ &>  % i Ü ¼ 9, Û ¼ 0

Au – Ѝ  H spark gap Û ¼0 Au \  ¦ > h‚  ô  Ç IPS(inverse pinch switch)\  ¦  6   x % i “ ¦ Arl ^ ‰_  ~ ½ ӄ  „  · ú šõ  Ar · ú š§ 4 _ 



  o\    É r e  ¦  Û ¼  focus_  + þ A$ í : £ ¤$ í `  ¦ › ¸  “ ¦, X- ray detector\  ¦ s 6   x # Œ soft X-ray_  µ 1 ÏÒ q t : £ ¤$ í `  ¦ › ¸ 

% i  .

II. ÷ m Ç] M ö U ê s0 n É

z 

´+ « >  © œu _  ½ ¨$ í “ É r ß ¼>  ”  / B N r Û ¼% 7 ›, ~ ½ ӄ   © œu , ~ ½ ӄ   Û

¼0 Au  x 9 \  -t  / B N/ å L  © œu “   „  " é ¶  Òü < & J r '  Ñ Ÿ ß ¼

-380-

(2)

–

Ð ½ ¨$ í % i  . \  -t  / B N/ å L  © œu   H W 1“ : r à Ô ½ ™Û ¼(20 kV, 20 mA) ü < “ ¦· ú š  s š ¸× ¼\  ¦  6   x # Œ ] j Œ • % i  . f ” § > =

ƒ

   ô  Ç ¿ º > h_  “ ¦· ú š  s š ¸× ¼(10 kV)\  ¦ ô  Ç › ¸– Ð   H Ú Ô o

t   r– Ð\  ¦ ½ ¨$ í # Œ þ j@ / „  · ú šs  20 kV t  Ø  ¦§ 4 ÷ &• ¸ 2

Ÿ

¤ % i  . ß ¼l  280 mm × 355 mm × 685 mm“   6   x

|

¾ Ó 6 µF(? /„  · ú š60 kV, Maxwell )_  » ¡ ¤„  l  2> h\  ¦ # î § > =

ƒ

    # Œ capacitor bank\  ¦ ½ ¨$ í % i  .

Fig. 1 \  HCP  © œu \  ¦ ç ß –é ß – >    ? /% 3  . { 9 ì ø Í& h 

“

  HCP  © œu \ " f  H lower electrode\  ¦ ×  æd ” Ü ¼– Ð  A  Â Ò ì

 r \  0 A_   Òì  r õ  ° ú  “ É r „  F G`  ¦ C u  # Œ @ /g A& h Ü ¼– Ð ~ ½ Ó

„

 s  { 9 # Q l  M :ë  H \  ~ ½ ӄ  r \  e  ¦  Û ¼  Ÿ í& Û ¼ @ / g A& h Ü ¼– Ð ë ß –[ þ t # Qt • ¸2 Ÿ ¤ “ ¦ s [ þ t`  ¦ # î \ P  ƒ     # Œ 1 l x



Œ

•r v   H r Û ¼% 7 ›`  ¦ : Ÿ x # Œ Y Us $ _  µ 1 ϔ  \   6   x % i 

~

   כ “  X <. s \  ¦ à º& ñ # Œ é ß –{ 9  Ÿ í& Û ¼ ë “ By • ¸2 Ÿ ¤ ô  Ç

 כ

s  . „  F G“ É r 813 × 360 × 13 mm

3

“   Aló ø Í`  ¦ # î § > =

ƒ

    # Œ  6   x % i Ü ¼ 9, F G ó ø Í  s _  ] X ƒ  `  ¦ 0 A # Œ # Œ



Q   _  mylar\  ¦  6   x % i  . HCP © œu _  " é ¶ ì ø Í+ þ A ~ ½ ӄ   F

G ó ø Í  s _  ç ß –  “ É r 26 mm – Ð" f 6 £ §F G _  ×  æd ”  Ò\  f ”  â 50 mm _  ½ ¨" í `  ¦ ë ß –[ þ t # Q Ÿ í& Û ¼\  ¦ › ' a ¹ 1 Ͻ + É Ã º e ” • ¸2 Ÿ ¤ 

%

i  . „  À Ó sheet focus\  ¦ + þ A$ í ½ + É M : „  F G _   — ¸\  ¦ ~ ½ Ó t

 “ ¦ X-‚  _  µ 1 ÏÒ q t`  ¦ 6   x s  >  l  0 A # Œ € ª œF G _  ×  æ d ”

 Ò\  f ”  â 50 mm_  " é ¶ ó ø Íõ  6 £ §F G _  = å Q  Òì  r \  “ ¦o  — ¸

€

ª œ_   9 `  ¦ ]  t o Ú ÔD ! pÜ ¼– Ð ] j Œ • # Œ y Œ •y Œ •  ҂ Ã Ì % i  . € ª œ  

ñô  Ç ] X ƒ  `  ¦ 0 A # Œ € ª œF G õ  6 £ §F G  s \  ¿ ºa  3 mm, ? /

 â

120 mm, ü @ â 163 mm“   $ 3 % ò Ä »o \  ¦ V , % 3  . " é ¶: Ÿ x+ þ A vacuum chamber  H stainless steel – Ð ë ß –[ þ t% 3 “ ¦ # Œ Q t  8

£ ¤& ñ l ½ ¨\  ¦ [ O u ½ + É Ã º e ” • ¸2 Ÿ ¤ ƒ  f ” ‚  õ  30

_  ~ ½ ӆ ¾ Ó\  4 > h_  ‚ ½ Ó(window)`  ¦, Õ ªo “ ¦ ƒ  f ”  © œ~ ½ Ó\  ô  Ç > h_  ‚ ½ Ó`  ¦ y

Œ

•y Œ • [ O u  % i  .

{ 9

ì ø Í& h Ü ¼– Ð  6   x ÷ &  H spark gap Û ¼0 Au _  é ß –& h `  ¦ ˜ Ð

¢ -

a l  0 A # Œ IPS(inverse pinch switch)\  ¦  6   x % i  .

Fig. 1. Cross-sectional view of the HCP device

Spark gap Û ¼0 Au _   â Ä º ~ ½ ӄ  s  { 9 # Q €   ~ ½ ӄ   „  À Ó

a

% v“ É r ~ ½ ӄ    ⠖ Ð\  ¦    â ìØ Ô>   ) a  . s  M : „  À Ó  ^ ‰

ë

ß –× ¼  H  l  © œ\  _ K  „  À Ól Ñ ü æ _  ×  æd ” » ¡ ¤`  ¦ † ¾ Ó # Œ „   À

Ó · ú š» ¡ ¤ ÷ &  H z-pinch \  _ K  Û ¼0 Au  „  F G _  ×  æd ”  Ò\ 

„

 À Ó | 9 5 Å q ) a  . Õ ª   õ – Ð „  À Ó x 9 • ¸ & t l  M :ë  H

\

 ² D G ™ è& h Ü ¼– Ð \ P ÷ &# Q „  F G s   — ¸÷ &€  " f „  F G ³ ð€  

\

 Ô  ¦í  HÓ ü t s  Ò q t$ í ÷ &# Q ~ ½ ӄ   / B N ç ß –s  a % v  t “ ¦, 5 Å q ) a s 

“

: r[ þ t _  Ø  æ  \  _ K  ~ ½ ӄ   Òì  r s  ’ < H  © œ  ) a  .

ì

ø ̀  \  IPS  H current sheet  „  F G ³ ð€  `  ¦    â ìØ Ô



 H r ç ß –s   ú ª“ ¦, 6 £ §F G s  ¿ º    6 f# Q4 R e ” # Q" f ì ø Í@ / ~ ½ ӆ ¾ Ó Ü

¼– Ð â ìØ Ô  H „  À Óz o  " f– Ð p   H j Ë µ`  ¦  # Œ „  À Ó_  | 9  5

Å

q`  ¦ ~ ½ ÓK ô  Ç . Õ ª   õ  spark gap Û ¼0 Au \  q  # Œ „   F

G õ  ] X ƒ  ^ ‰_  ’ < H  © œs  & h # Q Û ¼0 Au _  à º" î `  ¦  s `›   U  ´> 

½

+ É Ã º e ” `  ¦ ÷  r ë ß –  m  ,  Œ •“ É r „  À Ó x 9 • ¸ü < „  F G ³ ð€  \ 

"

f_  current sheet_  ’  5 Å q ô  Ç s 1 l x M :ë  H \  ~ ½ ӄ  „  À Ó\  ¦ 1 MA s  © œÜ ¼– Ð Z  } # Œ ×  ¦ à º e ” “ ¦, “ ¦Ä » “   ü ‡  Û ¼  Œ •  ~ ½ Ó

„

 _  š ¸2 £ § r ç ß –`  ¦  ú ª>  K  ×  ¦ à º e ”  . IPS  H S ! 1 l x Ü ¼– Ð ë

ß –[ þ t% 3   H X <, » ¡ ¤„  l _  (−)é ß – \  ƒ    ÷ &# Q e ”   H " é ¶: Ÿ x+ þ A ü

@ ҄  F G õ  » ¡ ¤„  l _  (+)é ß – \  ƒ     ) a ? / ҄  F G  s 

\

 [ j b ”  ] X ƒ  ^ ‰\  ¦ z 0 >" f › ¸w n  % i  . IPS ? / ҄  F G

×

 æd ”  Ò\  ½ ¨" í `  ¦ Ý ü Š # Q ”  / B N > : Ÿ x õ  ƒ     # Œ ”  / B N Û ¼0 A u

– Ð" f_  l 0 p x`  ¦ à º' Ÿ  • ¸2 Ÿ ¤ % i  .  À »  Òì  r`  ¦ ¿ ºa  10 mm“   È Ò" î  ß ¼w n =– Ð W = # Q ~ ½ ӄ  Ô  ¦y n C`  ¦ ^  ¦ à º e ” • ¸2 Ÿ ¤ 

%

i “ ¦ 8> h_  1 l x» ¡ ¤ cable`  ¦  6   x # Œ HCP  © œu ü < ƒ     

% i  .

~

½ ӄ  õ & ñ \ " f { 9 # Q   H IPS _  „  · ú š   o  H “ ¦· ú š „ à Рg Ë

>(high voltage probe, BK precision28; 1000 : 1)`  ¦ :

Ÿ

x # Œ 8 £ ¤& ñ “ ¦ „ à Ðg Ë >\ " f  š ¸  H ’    ñ\  ¦ š ¸z  ´– ÐÛ ¼ ï á

Ô(LECROY 9310M)\ " f { 9 # Q? /# Q ( Ž É Ó' \  { 9 § 4  “ ¦ l

2 Ÿ ¤ % i  . ”  / B N  Òì  r  © œé ß –_  window\  pin hole (pin- hole diameter;500 µm) õ  video camera( Œ ™$ í SV-H38)\  ¦ [ O

u  “ ¦, ND(neutral density) filter\  ¦ : Ÿ x õ r &  focus\  ¦ O É

Œ% ò % i  .

Fig. 2. Photograph of plasma focus through a 0.5 mm

pinhole with ND filter at Ar pressure 100 mtorr.

(3)

XR-100T(AMPTEK INC.)\  ¦  6   x # Œ HCP– РÒ' 

~

½ ÓØ  ¦ ÷ &  H X-‚  `  ¦  Ž Ø  ¦ % i  . XR-100T  H \ P „   & h Ü ¼

–

Ð Í ‰ ty Œ •  ) a Si-PIN photodiode\  ¦  6   x   H detector – Ð

"

f X-ray detector, á Ôo Ó  rá Ô, Í ‰ ty Œ •> : Ÿ x Ü ¼– Ð ÷ &# Q e ” Ü ¼ 9, soft X-ray ) ‡6   x # 3 0 A\ " f  6   x ÷ &  H ¿ ºa  25 µm_  Be window\  ¦  6   x ô  Ç . XR-100T_  „  " é ¶“ É r „  " é ¶  © œu  x 9

7 £ x; Ÿ ¤  © œu “   PX2T (AMPTEK INC.)\  ¦ : Ÿ x # Œ / B N /

å

L ) a  . PX2T\  ¦  6   x # Œ 8 £ ¤& ñ ô  Ç soft X-ray_  ’    ñ\  ¦ MCA8000(multichannel analyzer; AMP TEK) \  ˜ Ð? /“ ¦ MCA8000 \ " f % ƒo ô  Ç Ø  ¦§ 4 `  ¦ ( Ž É Ó' \  ƒ     # Œ ì  r$ 3 

• ¸2 Ÿ ¤ % i  . MCA8000_  X» ¡ ¤ \  -t  ° ú כs  i ” ! s q  Å 

!

Q– Ð    >  ÷ &# Q e ”   H X < s  ° ú כ[ þ t`  ¦ ³ ðï  r ~ ½ Ó ‚  " é ¶( s  z 

´+ « >\ " f  H

241

Am`  ¦  6   x % i  .)õ  q “ § # Œ ( Ž É Ó' – Ð

¨ 8

Š í ß – • ¸2 Ÿ ¤ ÷ &# Q e ”  .



r„   ”  / B N * 3 á Ô\  ¦  6   x # Œ HCP  © œu  ? / Ò_  ”  / B N • ¸

 40 mtorr & ñ • ¸ ÷ &% 3 `  ¦ M : 2 ∼ 3 r ~ ½ ӄ   r †   Ê ê  © œu 

?

/ Ò_  ”  / B N • ¸ 10 mtorr s  – Ð ? / 2 ; Ê ê\  Arl ^ ‰\  ¦ /

B

N/ å L % i  . HCP ? / Ò_  Ar l ^ ‰_  · ú š§ 4 õ  / B N/ å L „  · ú š

`

 ¦    o r & €  " f focus ë “ By   H Õ ªA á Ô\  ¦ › ' a ¹ 1 Ï “ ¦, focus  ”  `  ¦ window\  ¦ : Ÿ x # Œ O É Œ% ò “ ¦, focus  + þ A$ í

÷

&  H › ¸| `  ¦ ½ ¨ % i  .

III. + s ÇÊ Ý õ m Í w в  o

Ar _  l · ú šõ  „  · ú š`  ¦    o r & €  " f focus + þ A$ í `  ¦ › ¸



 % i  . Fig. 2  H 6 £ §F G \  Ý ü Š  9e ”   H t 2 £ § 50 mm _  " é ¶ + þ

A½ ¨" í \       H focus\  ¦ t 2 £ § 0.5 mm“   — 2 ; f . Ë`  ¦ : Ÿ x õ  r

&  q n š ¸ B j – Ð O É Œ% ò ô  Ç  ”  `  ¦    · p  כ s  .   Ø

Ԍ 4 H l ^ ‰_  · ú š§ 4  100 mtorr, “  „  · ú š 9 kV, 11 kV, 13 kV{ 9  M : Ò q t$ í  ) a œ í& h \  › ' a ô  Ç  כ s  .  Ø ÔŒ 4 H · ú š§ 4  100

Fig. 3. Voltage signal of the IPS operating at 13 kV and 80 mtorr

mtorr, “  „  · ú š 13 kV{ 9  M : œ í& h s  ¸ ú ˜ ë ß –[ þ t # Qt   H  כ Ü ¼

–

Ð › ' a ¹ 1 Ï÷ &% 3  .  Ø ÔŒ 4 H · ú š§ 4  200 mtorr s  _   â Ä º\  œ í

&

h s  ¸ ú ˜ + þ A$ í H † d`  ¦ ^  ¦ à º e ” % 3  .  Ø ÔŒ 4 H l ^ ‰_   â Ä º · ú š

§

4  80 mtorrs  , „  · ú š 8 kV s  \ " f  H œ í& h s  › ' a ¹ 1 Ï÷ &

t

 · ú §€ Œ ¤Ü ¼ 9, 9 kV\ " f Ò'  €  •ç ß –m ”  œ í& h s  ë ß –[ þ t # Qt “ ¦ 10 kV s  © œ \ " f  H B Ä º ¸ ú ˜ + þ A$ í H † d`  ¦ ^  ¦ à º e ” % 3  . · ú š§ 4  80 ∼ 130 mtorr, „  · ú š10 ∼ 17 kV\ " f œ í& h s  ¸ ú ˜ + þ A$ í ÷ &

%

3 “ ¦, œ í& h _  f ”  ⠓ É r 4 ∼ 8 mm & ñ • ¸% i  .

Ar · ú š§ 4  60 ∼ 400 mtorr, ~ ½ ӄ  „  · ú š 8 ∼ 17 kV t    



or v €  " f ~ ½ ӄ   r  IPS_  „  · ú š’    ñ + þ Aõ  e  ¦  Û ¼  focus _  + þ A$ í  © œI \  ¦ › ¸  % i  . Voltage spike\  ¦ 1 l x ì ø Í

  H € ª œ  ñô  Ç y Œ ™û Z”  1 l x + þ A[ þ t s   Ø ÔŒ 4 H · ú š§ 4  80 - 300 mtorr, ~ ½ ӄ   „  · ú š 10 ∼ 17 kV # 3 0 A\ " f › ' a ¹ 1 Ï÷ &% 3  . ~ ½ Ó

„

 õ & ñ \ " f { 9 # Q   H IPS _  „  · ú š   o\  ¦ „  l „ à Ðg Ë >(high voltage probe, BK precision28; 1000 : 1) \ " f 8 £ ¤& ñ ô  Ç ’    

ñ\  ¦ š ¸z  ´– ÐÛ ¼ ïá Ô(LECROY 9310M)\  ¦  6   x # Œ › ' a ¹ 1 Ï

# Œ % 3 “ É r Õ ªA á Ô\  ¦ ì  r$ 3  % i  . „  ^ ‰ % ò % i \ " f % 3 “ É r @ /

³

ðu – Ð" f Å Òl   H 8 µs, rising frequency  H 125 kHz y Œ ™û Z

“

  (damping factor) ፠ H 1.08 × 10

5

s

−1

– Ð 8 £ ¤& ñ ÷ &% 3 



. > í ß –  ) a inductance  H 133 nH s “ ¦  r– Ð_  e ” x ~  Û ¼  H 29 mΩ s  . Rise time“ É r t

r

= 2 µs s “ ¦ Peak „  À Ó i

p

=101 kA, s  .

241

Am`  ¦ X-ray detector(XR-100T) · ú ¡\  ¿ º“ ¦ 8 £ ¤& ñ 

#

Œ MCA8000_  X» ¡ ¤ _  channel à º\  ¦ \  -t (keV)– Ð ½ ¨

% i  .

241

Am _  Û ¼& 7 ˜à Ô! 3 \ " f peak\  K { © œ   H 59.54 keV, 26.36 keV, 24.94 keV, 1 p x 8 ú x 8 > h_  peak_  0 Au \  ¦ l

ï  r Ü ¼– Ð 8 £ ¤& ñ u \  ¦ ½ ¨ % i  . s M :_  ¨ 8 Š í ß –/ B Nd ” “ É r

y = 0.0291x + 0.1559

–

Ð" f y  H keV – Ð ¨ 8 Š í ß –ô  Ç \  -t , x  H cursor à º\  ¦ y Œ •y Œ •



 ? /“ ¦ e ”  . s d ” _   © œ › ' a > à º  H 1 – Ð   z Œ ¤ .

Fig. 4. X-ray spectra of plasma radiation from HCP at

Ar 10 kV - 80 mtorr, 12 kV - 80 mtorr and 15 kV - 85

mtorr.

(4)

Fig. 5. X-ray spectra of plasma radiation from HCP at input voltage 13 kV, He pressure 180, 190 and 200 mtorr.

Fig. 4  H Ar l ^ ‰ · ú š§ 4  80 mtorr, “  „  · ú š y Œ •y Œ • 10 kV, 12 kV“    â Ä ºü < Ar l ^ ‰ · ú š§ 4  85 mtorr, “  „  · ú š 15 kV, “    â Ä º\  @ /ô  Ç z  ´+ « >   õ \  ¦ y Œ •y Œ •   ? /“ ¦ e ”  .

y

Œ

• z  ´+ « >_   â Ä º\  5 r ~ ½ ӄ  r †   Ê ê\  8 £ ¤& ñ ô  Ç ° ú כ`  ¦ 2 [ 

%

i “ ¦

241

Am Û ¼& 7 ˜à Ô! 3 `  ¦ l ï  r Ü ¼– Ð # Œ y Œ • 8 £ ¤& ñ u \  K  {

© œ   H \  -t \  ¦ ½ ¨ % i  . s  Û ¼& 7 ˜à Ô! 3 Ü ¼– РÒ'  % 3 “ É r

 

õ   H µ 1 ÏÒ q t   H X‚  [ þ t s  0.5 nm Â Ò   H \ " f  © œ G ' p Ø  ¦

§ 4

`  ¦ ”   soft x-ray % ò % i _  4 Ÿ ¤  ‚  s  ~ ½ ÓØ  ¦ ÷ &  H  כ `  ¦  

? /“ ¦ e ”  . — 2 ;f . Ë B j \  ¦  6   x # Œ › ' a ¹ 1 Ïô  Ç   õ \ " f



 è ß –  כ õ  ° ú  s   Ø ÔŒ 4 H l ^ ‰ · ú š§ 4 s  80 mtorr ˜ Ð  ± ú 

“

¦ ~ ½ ӄ  „  · ú šs  8 kV s  _  % ò % i \ " f  H Ÿ í& Û ¼ ¸ ú ˜ ë “ B )

€t t  · ú §“ ¦ · ú š§ 4  80 ∼ 130 mtorr, ~ ½ ӄ  „  · ú š 10 ∼ 17 kV

“

  % i % i \ " f  H œ í& h s  ¸ ú ˜ ë “ By “ ¦ y Œ ™û Z”  1 l x + þ As  ¸ ú ˜ + þ A

$ í

 ) a · ú ¡ ‚   ƒ  ½ ¨_    õ ü < Ä » ô  Ç € ª œ © œ`  ¦   ? /“ ¦ e ” 6 £ §

`

 ¦ Û ¼& 7 ˜à Ô! 3  › ' a ¹ 1 Ï`  ¦ : Ÿ x # Œ S X ‰ “  ½ + É Ã º e ” % 3  .

HCP  © œu \  He l ^ ‰\  ¦ Å Ò{ 9  # Œ z  ´+ « >ô  Ç   õ \  ¦ Fig.

5 \    ? /% 3  .

He l ^ ‰\  ¦ Å Ò{ 9  # Œ 8 £ ¤& ñ ô  Ç  â Ä º\   H Ar l ^ ‰\  ¦  6   x ô

 Ç  â Ä º\  q  # Œ l ^ ‰ · ú š§ 4 s   8¹ ¡ ¤ Z  }“ É r % ò % i \ " f ~ ½ Ó

„

 s  ¸ ú ˜ { 9 # Qz Œ ¤  H X < Fig. 5\ " f › ' a ¹ 1 Ͻ + É Ã º e ”   H  כ % ƒ! 3  1

l x{ 9 ô  Ç „  · ú š`  ¦ K ŠҀ  " f · ú š§ 4 `  ¦    or v €  " f z  ´+ « >ô  Ç

 

õ  · ú š§ 4 s  & | 9 à º2 Ÿ ¤ Ø  ¦§ 4 _  [ jl  y Œ ™™ è   H % ò % i s  e ”

6 £ §`  ¦ ˜ Ð# ŒÅ ғ ¦ e ”  . s  Qô  Ç  ⠆ ¾ ӓ É r Ar l ^ ‰\  ¦  6   x ô  Ç

 â

Ä º\ " f• ¸ › ' a ¹ 1 Ïs  ÷ &“ ¦ e ”   H ‰ & ³ © œs  . : £ ¤ s ½ + É ë ß –ô  Ç   z 

´“ É r Ar l ^ ‰\  ¦  6   x   H  â Ä ºü < He\  ¦  6   x   H  â Ä º\  ¦ q

“ § % i `  ¦ M : Û ¼& 7 ˜à Ô! 3   © œ\ " f Ø  ¦§ 4 s  / å L  y  7 £ x  



 H % ò % i _  0 Au  ¿ º l ^ ‰ — ¸¿ º q 5 p w ô  Ç % ò % i e ” `  ¦ S X ‰ “  ½ + É Ã

º e ” % 3  . Õ ª s Ä »– Ð" f z  ´+ « >õ & ñ \ " f | 9 ™ è Û ¼ Ÿ í† < Ê

 )

a  כ s  s Ä »{ 9  à º• ¸ e ”    H & ñ \  | 9 ™ èl ^ ‰\  ¦ Å Ò{ 9 

# Œ z  ´+ « >`  ¦ à º' Ÿ  # Œ ˜ Ѐ Œ ¤ . Fig. 6\      e ”   H   ü

< ° ú  s  | 9 ™ è\  ¦ Å Ò{ 9  # Œ z  ´+ « >ô  Ç   õ  Û ¼& 7 ˜à Ô! 3 s  › ' a8 £ ¤

Fig. 6. X-ray spectra of plasma radiation from HCP at input voltage 10 kV, N

2

gas pressure 100, 120 and 125 mtorr.

÷

&  H % ò % i s  hard X-ray % ò % i Ü ¼– Ð `  …  4 R e ” 6 £ §`  ¦ ^  ¦ à º e ”

% 3  . s    õ \  ¦ ž Ð@ /– Ð | 9 ™ èl ^ ‰  H s  z  ´+ « >\ " f Å Ò  ) a

%

i ½ + É`  ¦ t  · ú §€ Œ ¤6 £ §`  ¦ S X ‰ “  ½ + É Ã º e ” % 3  .

IV. + s Ç Â ] Ø

HCP  © œu \  ¦ à º& ñ # Œ é ß –{ 9  œ í& h s  ë “ By   H / B M \ " f X- ray  µ 1 ÏÒ q t • ¸2 Ÿ ¤ “ ¦  © œu \  Arl ^ ‰ü < He l ^ ‰\  ¦ y Œ • y

Œ

• Å Ò{ 9  “ ¦ l ^ ‰_  · ú š§ 4 õ  ~ ½ ӄ  „  · ú š\    É r X-ray _  µ 1 Ï Ò q

t : £ ¤$ í `  ¦ › ¸  % i  . „  l „ à Ðg Ë >`  ¦  6   x # Œ 8 £ ¤& ñ ô  Ç „   l

’    ñ\  ¦ š ¸z  ´– ÐÛ ¼ ïá Ô\ " f { 9 # Q ~ ½ ӄ    © œI \  ¦ › ¸  % i 

“

¦, Ÿ í& Û ¼ ë “ By   H  כ `  ¦ 1 : 1 — 2 ; f . Ë õ  ND€ 9 ' \  ¦ : Ÿ x õ  ô

 Ç  ”  `  ¦ O É Œ% ò # Œ › ¸  % i  . soft X-ray_  µ 1 ÏÒ q t Û ¼& 7 ˜ à

Ô! 3 “ É r XR-100T X-ray detector\  ¦  6   x # Œ % 3 “ É r ’    ñ

\

 ¦ MCA8000`  ¦ : Ÿ x õ r v “ ¦ ( Ž É Ó' \ " f % ƒo ô  Ç  « і Ð Â

Ò'  2 [ % i  . HCP  © œu \ " f Ar · ú š§ 4  80 ∼ 130 mtorr,

~

½ ӄ  „  · ú š 10 ∼ 17 kV # 3 0 A\ " f IPS_  ~ ½ ӄ  „  · ú š ’    ñ\ 

"

f € ª œ  ñô  Ç y Œ ™û Z”  1 l x + þ Aõ  voltage spike   z Œ ¤Ü ¼ 9 s

 M : focus ¸ ú ˜ + þ A$ í ÷ &% 3  . XR-100T X-ray detector\  ¦



6   x # Œ › ¸ ô  Ç Û ¼& 7 ˜à Ô! 3 `  ¦ ì  r$ 3 ô  Ç   õ  · ú š§ 4  80 ∼ 130 mtorr, „  · ú š 10 ∼ 17 kV{ 9  M : 0.18 ∼ 7.4 keV(0.16 ∼ 6.7 nm) _  X-ray µ 1 ÏÒ q t % i  . He l ^ ‰\  ¦  6   x # Œ z  ´+ « >ô  Ç

 

õ   8¹ ¡ ¤ Z  }“ É r l ^ ‰ · ú š§ 4  \ " f• ¸ s % ò % i _  X-ray B  Ä

º € ª œ  ñ >  µ 1 ÏÒ q t† < Ê`  ¦ ^  ¦ à º e ” % 3  . Ä » ô  Ç z  ´+ « > › ¸| 

\ " f | 9 ™ èl ^ ‰\  ¦ Å Òe ”  # Œ z  ´+ « >ô  Ç   õ  @ / Òì  r hard X-ray % ò % i _  Ø  ¦§ 4 Û ¼& 7 ˜à Ô! 3 s   Ž Ø  ¦ ÷ &% 3  .

P

c p 8 ý ò k >

‘

: r ƒ  ½ ¨  H 2004¸  • ¸ î ß –1 l x @ /† < Ɠ § : £ ¤Z > t " é ¶ƒ  ½ ¨q  t " é ¶

\

 _  # Œ à º' Ÿ ÷ &% 3 6 £ §

(5)

Y

c p w Š à U Ø ”  ô

[1] R. Kurzweil, The Age of the spiritual Machine (Pen- guine Group, New York, 1999).

[2] H. Morko¸ c, Nanoscale Electronics and Optoelectron- ics (Academic Press, 2003).

[3] Guckel, H., T. R. Christenson and K. S Krobis, J.

Micromech. Microeng., 2, 225 (1992).

[4] J. M. Bayley, G. Decker, W. Kies, M. M¨ algig, F.

M¨ uller, P. R¨ owekmap, J. Westheide and Y. V. Sidel- nikov, J. Appl. Phys. 69, 613 (1991).

[5] E. Cullmann, T. K¨ unneth, W. Neff and K, H. Stefan, J. Vac, Sci. Technol. B 5, 638 (1987).

[6] J. W. Mather, Methods of Experimental Physics Vol.

9 B (Academic Press, New York, 1971), p. 187.

[7] N. V. Filippov, T. I. Filippova and V. P. Vinogradov, Nucl. Fusion Suppl. PT. 2, 577 (1962).

[8] J. H. LEE, D. F. Mcfarland and F. Hohl, Physics of Fluids 20, 313(1977).

[9] H. Herold, A. Jerzykiewicz, M. Sadowski and H.

Schmidt, Nuclear Fusion, 29, 1255 (1989).

[10] R. H. Lovberg, H. R. Griem : Methods of Experi- mental Physics Vol 9-part B.

[11] H. Kelly and Giadice. IEEE Trans Plasma Science 18, 646 (1990).

[12] D. Difz, J. Apply. Phys. 62, 2669 (1987).

[13] M. Rosenbluth and R.garwin, Los Alamos Sci. Lab.

Rep. LA-1850 (1954).

[14] T. N. Lee. A. W. Ali, E. A. Mclean and A. C. Kolb, Phys. Fluids 10, 1545 (1967).

[15] F. F Chen, Introduction to Plasma Physics, 1st ed., (Plenum Press, 1974). p. 304.

[16] L. Bilbao, H. A. Bruzzone, H, Kelly and M. Esper.

IEEE Trans. Plasma Science 13, 202 (1985).

Characteristics of X-ray Radiation from a Single Focus Hypocycloidal Pinch

Z. H. Yoon,

Y. K. Sohn and B. W. Lim Department of Physics, Andong 760-749

(Received 15 October 2005)

The argon-gas plasma-focus formation and soft X-ray characteristics of an improved single focus HCP (hypocycloidal pinch) with an IPS (inverse pinch switch) were investigated. The soft X-ray emission was detected by using an XR-100 X-ray detector and the voltage spike curve. For Ar gas pressures of 80 ∼ 130 mTorr and HCP electrode voltages of about 9 ∼ 17 kV the plasma focus formation curve and a photograph of the plasma focus were observed. The X-ray measurements showed thar the wavelengths of the soft X-rays were distributed in the region of 0.18 ∼ 7.4 keV (0.16 ∼ 6.7 nm).

PACS numbers: 52.25,Nr

Keywords: HCP, Soft X-ray, Ar gas, IPS

E-mail: [email protected]

수치

Fig. 1 \  HCP  © œu \  ¦ ç ß –é ß –
 &gt;    ? /% 3  . { 9 ì ø Í&amp; h 
Fig. 4. X-ray spectra of plasma radiation from HCP at Ar 10 kV - 80 mtorr, 12 kV - 80 mtorr and 15 kV - 85 mtorr.
Fig. 5. X-ray spectra of plasma radiation from HCP at input voltage 13 kV, He pressure 180, 190 and 200 mtorr.

참조

관련 문서

below

Surface morphology and chemical composition of samples were characterized by field emission scanning electron microscopy (FE-SEM), contact angle measurement and

XAFS: X-ray absorption fine structure XES: X-ray emission spectroscopy XRF: X-ray fluorescence.. Use of x-rays; a probe based

Excitation Detection X-ray photoelectron spectroscopy (XPS) Photons(X-ray) Electrons UV photoelectron spectroscopy (UPS) Photons (UV) Electrons

Most line searches used in practice are inexact: the step length is chosen to approximately minimize f along the ray {x + t∆x |t ≥ 0}, or to reduce f enough...

8.50… thin-walled, closed x-s of arbitrary shape subjected to an applied torque, assumed to be in a state of uniform torsion, axial strain and stress components vanish  n(s)

The structure and film optical properties were investigated by X-ray diffraction(XRD), the particle size and thickness were investigated by scanning

하고 있고 주력 에너지원인 화석연료 대부분을 수입하고 있기에 에너지 가격에 민감한 산업 구조를 가지고 있다. 따라서 에너지 가격이 산업의 경쟁력과 물가에