3 Z 4 14{ ~ Ã Î6 4 Z 4 17{ Ã º& ñ ~ Ã Î6 5 Z 4 7{ > F X ñ
É
r ¸{ 9 ~ Ã Ì} ` ¦ Ä »o ó ø Í 0 A\ Û ¼ 2 ; ïh A` ¦ s 6 x # ] j ¦ 532 nm_ Nd:YAG Y Us $ ü < á Ô
Ð# o F g < Ær Û ¼% 7 ` ¦ s 6 x # ½ ©g Ë :& h H [ þ t \ @ / # 30C » ¡ ¤ è ) a p [ j J ' _ ç ` ¦ % 3 ` ¦ Ã º e
% 3 . Y Us $ _ é ß { 9 ` O Û ¼ \ -t ü < á Ô Ð# o E $ Ý ¼ü < ~ à Ì} _ o 1 p x` ¦ à º Ð # þ j& h J ' _ ç
¸| ` ¦ ½ ¨ % i . ¢ ¸ô Ç / B G \ @ /ô Ç J ' _ ç ` ¦ 0 AK · ú À Òp ³ o u ~ Ã Ì} ` ¦ ] j ¸ ¦ & 7 Ð íY Us $ Ð /
B
N # Û ¼ß ¼\ ¦ ] j % i ¦ s \ ¦ 6 x # 10 um s _ ; ¤` ¦ ° ú H J ' _ ç \ $ í / B N % i .
Ù þ
d # Q: É r ¸ { 9 , Y Us $ J ' _ ç , Nd:YAG Y Us $ , í Ð Û ¼ß ¼, F g á Ô Ð# o
Laser Patterning of Nanoparticulate Silver Thin Film by Using an Optical Projection System
Jung-Hyun Choi · Ki-Soo Lim ∗
Department of Physics, Chungbuk National University, Cheongju 361-763 (Received 14 March 2012 : revised 17 April 2012 : accepted 7 May 2012)
We fabricated a silver-nanoparticle film by using the spin-coating method and obtained an ∼10 µm fine patterning on the film with a 30 times reduction of the periodic lines by using a 532 nm Nd:YAG laser pulse and an optical projection system. We optimized the fine pattern conditions by changing the laser’s pulse energy, and the distance between the projection lens and the thin film. We also fabricated an aluminum photomask by using a femtosecond laser and obtained laser patterning of curved characters with linewidths of less than 10 µm.
PACS numbers: 42.82.Cr, 42.30.Va, 42.88.+h, 78.66.Bz,78.20.Nv
Keywords: Silver nanoparticles, Laser patterning, Nd:YAG laser, Photo-mask, Optical projection
I. " e  ] Ø
&
³F _ © u \ " f F K5 Å q ~ Ã Ì} _ J É r F G 1 p x & ³ F
l l \ " f Å Ò 9 כ ¹ô Ç > r F s . s J [ þ t É r Ð :
x l © 7 £ x Ã Ì Ê ê \ g A` ¦ s 6 x K J ' _ ç H í Ðo ÐÕ ª A
x l Õ ü t Ð ë ß [ þ t # Q . í Ðo ÐÕ ªA x l Õ ü t É r Z } É r K
© ¸\ ¦ t m t ë ß ¦ : r, / B N x 9 é ß > _ 4 ¤ ¸ ú ô Ç / B N& ñ
`
¦ כ ¹½ ¨ Ù ¼ Ð r ç ß õ q 6 x _ 8 £ ¤ \ " f q ´ òÖ ¦& h { 9 ÷ r
∗