† *
305-600 100
*
136-709 5 1 (2003 1 15! "#, 2003 3 25! $%)
Influence of Fluorination on Surface and Dielectric Characteristics of Polyimide Thin Film
Soo-Jin Park†, Ki-Sook Cho and Sung-Hyun Kim*
Advanced Materials Division, Korea Research Institute of Chemical Technology, 100 Jang-dong, Yuseong-gu, Daejeon 305-600, Korea
*Department of Chemical Engineering, Korea University, 1, 5-ka, Anam-dong, Sungbuk-gu, Seoul 136-709, Korea (Received 15 January 2003; accepted 25 March 2003)
X-ray photoelectron spectroscopy (XPS) !" #$%&, '(·)*( + thermogravimetric analysis (TGA) ,-./0 &
5 AB C%1. D6 45 EFG 7 HIJ (electron polarization) C
KL&, M NO@ ," HNO0 =7KP>@Q CKR ST6 ,H@ UV6 W
>@ XYG1. Z6 23 '(·)*( M [\ E] ^+ W #$_ ` ab1.
Abstract−In this work, the effects of fluorine treatment of polyimide thin film on surface and dielectric characteristics were studied using X-ray photoelectron spectroscopy (XPS) and dielectric constant, respectively. And, their thermal and mechanical properties of the polyimide film were characterized by thermogravimetric analysis (TGA) and tensile strength, respectively.
The fluorine content of the polyimide film was increased with increasing the amount of the treatment gas, resulting in decreas- ing the dielectric constant of the film. It was explained that the replacement of fluorine led to the decrease of the local electron polarization of polyimide, or to the increase of the free volume which can be attributed to the relatively large volume of flu- orine. Nevertheless, the fluorination didn’t significantly affect thermal or mechanical properties of the polyimide film under a mild condition in this system.
Key words: Polyimide, Fluorination, Dielectric Constant, Thermal Properties, Mechanical Properties
1.
-O-, -NH-, -CO- !" #, $% &
300oC' ()* +,- ./0 12 345 67 &
12 89:; /< = >?@ =[1-2]. A B
CDE 9!·9 F GH, I, JK, L*
MF NO, PQRF NO, STU F =.
EA VWFX) YZ [ \] .^$/ L*M
& 9 VW2 N ' !_`a b c d- ef ag
h ILD (interlayer dielectric) B# i !_' `a j
k/ =. ILD B# ) 89l mn 8 op, q r) st/' uN, vp, :t stw (cross-talk) /, xp, stw / ry*' z. C q$/NP$ . , {p, NP$ q$ .|}u & ~ ' ! : . , c
=p, 9!·9 F GH Q r;
h 0 3 r & y* J- h
& !!, s, ', F 9 F . 8=[3-4].
L 89l 89M, Q*M' 9!C d-
mn d N @
+−moment2 bQ) ¡ 9 "' ¢£$ ¤¥ ¦§
(polarization)¨=. ©ª bQ 9 "' $ «w B# Q'
†To whom correspondence should be addressed.
E-mail: psjin@krict.re.kr
41 4 2003 8
+− moment. ¦§ ,*; 89l¬ ®h =[5]. A 89l- UD nC2 op, N$*' $, vp, 8Q¯
(free volume)' $, xp, ¦§' ,* (polarizability); [ =
[6]. A ° !CDE ±Z ILDB# N; ²8³´
' µ2 ¦§5 ¶ 8Q¯ Cw 12 89:; ·
}B# i . j ¸ / =. df 12 89 l, ¹!" # Cw ILD B#) ; F Nº» i . j k ¼=[7-9].
N =½ ¾ ¢DE ¸= ¶ 9 ¿$*¾ ($
potential- ./ 0, . À2 9! Á*; ./ =½
$ÂB5' LÃ Ä ÅD=. L NÆ! D) B#
- Çh È N N¾ º»DÉ mÂ
conjugated bond N 'w) Ê$¨=. A N =½ N
¾ ÂDE a, Ë Ì}, 9! d, ST, ' d- Í Î2 X) F/ =[10-12].
Ϭ) Ð ) N$ Ç ' GH' Ñd
5 c Ͻ 89l' $; iÒDÓ=[13-14]. Ð °Ô) Â
¨ ÕÖV' $ ,*; Fourier Transform-IR (FT-IR); w iÒDÓ0, N$ Ç ' GH' Ñ & 89d- XPS
¾ 89l ×,- w ØCDÓ=. Ù ·!" d2 TGA¾ CÅ* ×,- DE ÒDÓ=.
2.
2-1.
Ð °Ô F¨ dianhydride (3,3',4,4'-benzophenonetetracarboxylic dianhydride; D BTDA)¾ diamine (4,4'-oxydianiline; DODA)2
Aldrich) ÚV ÛÜM; ÝÞ$ß ,U; DE FDÓ=.
FÄ Aldrich' N-methyl-1-pyrrolidinone (NMP, anhydrous quality);
FDÓ0, ÛÜM & FÄ' $% à- Fig. 1 á=.
' N$ ÑÇ º UµDE FDÓ0 N
F2 .â; FDÓ=.
' 9MC ÕÖV(polyamic acid; PAA) FI- Â
D! Æw 3 ã¬âä; #N purging å, NMP diamine- æ
ç' dianhydride; è9f æE 24³éê+ Lóë ÂDÓ
=. ¨ ÕÖV FI' M#Ül2 15 wt% }DÓ=.
¨ ÕÖV FI- substrate F¨ 8ì Æ applicator (Sheen Instrument, S220403); FDE í± îK' ïð. 50µm
*ñ òâó å FÄ; za³ô! Æw 80oC) 24³é ê+
prebakingDÓ=. Fig. 2 õ (*Û" ÕÖV- ö$³ë í± îK- U DÓ0, ö$ Û"÷ $%à- Fig. 3
á=.
U¨ GH Ñ S N$ ÇD! 9
GH- øùú ^) ûÁü ýþ!; Fw ýþ å GH' ÿ E- UD! Æw ) Dk: ³ë) FDÓ=.
GH- N$ ÑÇD! Æw #N.â fluorination reactor line- purging å < boat GH- reaction tube <
boat; TDÓ=. < boat; - ³ reaction tube [. V N¾ - UD! Æw =³ #N.â purging =Á reaction line- r9Ý 10−2 torr / J!³=. GH- ÑÇD!
Æw reaction line N.â; 0 kPa(D F0), 5 kPa(F5), 10 kPa(F10), 30 kPa(F30), 50 kPa(F50) DE N .âÜ- }DÓ
0, :() 10 ê+ Ló å r9Ý >k
- 5³ë 10−2 torr / J!³=.
Fig. 1. Chemical structures of dianydride, dianiline, and solvent.
Fig. 2. Heating cycles for thermal imidization of polyamic acid.
Fig. 3. Preparation of polyimide via polyamic acid precuror solution.
2-2.
Ð °Ô) Â ' $ ,*; ØCD! Æw
ÕÖV FI5 ö$¨ GH- KRS-5 reflection element . QT¨ Digilab FTS-165 spectrometer; Fw) wave number 4,000-400 cm−1' FT-IR â DÓ=.
2-3.
U¨ GH- N$ Ç Ï½ GH' $% 2 XPS (ESCALAB MK-II); DE DÓ0, XPS ×, F¨
X-ray source Mg Kα; FDÓ0, chamber' 2 10−1-10−9 torr }DÓ=.
2-4.
GH' N$ Ç 9·å' 89(*' $ DSC (Dupont 9,900: model 2,910); FDE Þ(^* 10oC/min :(
) 400oC / ×,DÓ0, d' $ #NÆ! D) Þ(^* 10oC/min :() 800oC / TGA (Dupont 9,900:
model 2,950); FDE ×,DÓ=.
N$ Ç Ï½ CÅ* O ³Ô!(Universal Testing Machine, Lloyd LR5K); FDE ASTM D412 DE ³
¦- UµDÓ0, cross head speed 50 mm/min ×,DÓ=. × ,2 ' ³¦ «DE 10r ×,DE c - FDÓ=.
2-5.
Ð °Ô) N$ Ç 9·å' GH' 89l $;
×,D! Æw Dielectric Spectrometer (Novocontrol GmbH, Model:
CONCEPT 40)- FDE ×,DÓ=. 89l ×, 2 :()
ü; 101 HzQ âò à 106 Hz / $³ôÑ) 89 l- ×,DÓ=.
3.
3-1.
Fig. 4 ' $ ,*; ØCD! Æw ÕÖV5
ö$,- U¨ GH' FT-IR spectra 5=. L KV' $ ³ =Á5 2 ï Û"' ,-
¿=. op, ï ÛÜM; FÄ æÑ BTDA' . Ñ) ODA
¾ `»m Là ÕÖV FI- ÂDÉ ¨=. vp, `
»m 'w Ú¨ B . 'w za, ï ÛÜM .¢
; k ' $. ± Ý=[15].
A 5,Q ÕÖV FI' FT-IR spectra; Fig. 4(a)
; iÒDÑ, c) ¸ ¾ `»Là ' ÕÖV F I' d ¯äC !³V' O-H (3,400-2,400 cm−1)¾ Õ"' N-H (3,500-3,100 cm−1); ØCh 0, dianydride' C=O (1,660, 1,535 cm−1)¾ C6H5' C=C (1,513 cm−1) ' ¯ä. õ #- ØCh á=[6, 16].
LÑ ÕÖV FI- 80oC) 24³éê+ FÄ; za³ô
prebaking ,- ¿ å 50oC) 290oC / Û"÷ ö$,-
¿ GH' FT-IR spectra; Fig. 4(b) á=. Ð °Ô
5, ÕÖV) õ O-H (3,400-2,400 cm−1)¾ N-H (3,500- 3,100 cm−1). $ÂLÃ 'w B ; Ú³ô 'w
$. Ý%Ñ) ¯ä. ¬Ý #- ØCh á0, A 5,
Cw Ú¨ (725 cm−1); iÒh á=. Ù ,
' 9PC d¯äC C=O (1,780, 1,720 cm−1), C-N (1,370 cm−1) c (OC)2NC (1,100 cm−1) ' ¯ä. Ú¨ #- iÒh
á0[6, 16], A 5Q $. 100% Ý%áÁ- Ø Ch á=.
3-2.
N$ Ç9·å' Ñ' i ! - ýf &'¸
! ÆDE GH' XPS spectra; Fig. 5 á=. c
5 Ç ' ö Â(/ 285 eVQY) ùN ¯ä,
404 eVQY) #N¯ä c 532 eVQY) VN ¯ä. õ
#- ØCh á=. LÑ N$ Ç ö 694 eV QY) N ¯ä. )*É +0, NÇ .â z.hñ, Ç
.âÜ z.hñ ' N ¯äý!. z.D #- iÒh á=. A ' $%- Table 1
5, N$ Ç 'w ' ùN, #N, VN' ²Ü2 Ç
.â Ϭ uND LÑ, N' ²Ü2 z.D #- ØC
Fig. 4. FT-IR spectra of polyamic acid and cured polyimide thin film.
Fig. 5. XPS survey scan spectra of polyimide thin film.
Table 1. Chemical composition of polyimide thin film
C1S N1S O1S F1S F1S/C1S
F00 F50 F10 F30 F50
69.7 55.0 56.0 49.5 49.1
10.30 8.0 5.7 4.6 4.7
20.0 24.0 21.7 16.0 13.0
0 13.0 16.6 29.9 33.2
0 23.6 29.6 60.4 67.6
41 4 2003 8
h á=.
L N =½ ¸= ¶ 9 ¿$*¾ ($
potential- ./ 0, . À2 9! Á*; ./ ,
=½ $ÂB5' LÃ Ä ÅD=. df F2.â Là -) .^- ʲ «Q' $ÂB5 LÃD0, df ùN$ÂB5 Ía
LÃD0 LÃ- aÚ³=. 5* LÃ aÚÑ (*
:Þ Cw C-C  w \ äÉ Â = >?@
=[10-12]. , NÆ! D) B#- ÑÇDÑ B# Ñ' +, Â // LÃ À2 ¬01 Ú N¾ º
»DÉ 0, m conjugated bond N 'w) Ê$ ¨
= >?@ =[12]. cA, GH Ñ N; ²8 µF!; 2 \ :ýf D! Æw) XPS carbon 1S core level
scan spectra ' !#- ¢ DE Fig. 6 á=.
Ð °Ô5, N$ ÇD/ 32 GHC Fig. 6(a)' ö
284.6 eV (C=C), 285.6 eV (C-N), 286.2 eV (C-O-C) c 289.2 eV
(C=C)) ' 9PC d¯ä; ØCh á=. N
$ Ç ö ' Nº» 'w Fig. 6(b)¾ (c)) )
*É 288.7 eV (C-F)¾ 291.1 eV (CF2)' ¯ä. Ú¨ #- ØCh á0, Ù Fig. 6(d)¾ (e)' ö 288.7 eV¾ 291.1 eVb 290.5 eV (CF2 in trifulorobenzene)) ¯ä. Ú¨ #- iÒh á=. A 5 F2.â; FDE GH- N$ Ç ³ :
!) 45 N' Là ø-<65 ¾ N ' Là C-F Ù CF2 º»¨ #- ØCh
á=. Ù Fig. 6(d)¾ (e)) 7 ª N.â 30 kPa
:C ö º»¨ N²Ü äÉ z.DE C=C
¯ä¸= C-F ¯ä. \ äÉ a8D 5; á0 È' F1S/C1S. Table 1) ØCh ª 60.4%¾ 67.6% =
½ GH' ö w ¶ - #- iÒh á=.
3-3.
N$ Ç Ï½ ' DSC9- Fig. 7 á=.
c 5, Ç ' Tg (glass transition temperature). 283.6oC Fig. 6. High resolution C1S XPS spectra of polyimide thin film with fluori-
nation concentration; (a) F0 (b) F5, (c) F10, (d) F30, and (e) F50.
Table 2. Mechanical properties of polyimide thin film
Tensile strength [MPa] Ultimate elongation [%]
F00 F50 F10 F30 F50
116±10.7 115±13.5 115±11.0 118±14.5 118±12.3
33±4.3 34±3.1 32±2.9 38±4.5 37±3.2
+0 N$ Ç ö F50' Tg. 282.7oC uN 5;
ØCh á=. L Tg :- º C ) Ü, mÂM, ,$*, $% , 0, A C ['
$ Cw ' 8Q¯. z.DÑ c : 'w Tg. uN = >?@ =[17]. :! XPS 5) Ò ¾ ,
º»¨ N ' Q¯. N ùN¸= ä! È; ' 8Q¯; z.³´ Fig. 7) õ ¾ Tg. u N # ìÛ¨=.
Fig. 82 ' TGA9- 5=. A TGA9
Q Table 3 IDT (initial decomposition temperature);
á=. c 5, F0' ö IDT. 555oC +0 N$ Ç
ö F5¾ F10' ö ¶ ; / 3< F30' ö =N uNDÓ0 F50' ö û! w `³ (*. äÉ uN #- ØCh á=. L
-O-, -NH-, -CO- !"
# & 300oC' ()* +,- = >?@ =
[1-2]. cA 5Ü' N¾ LÃ Cw :! NLÃ ø-<6
) 45DÓª '  =/Ñ) F50 ' º»¨ C-F ¯ä. äÉ z. Cw û! w (*. ä É uN # ìÛ¨=[6, 16, 18]. cA F50- Ub =½
' ö, N$ Ç ³ N²Ü 30% D º»¨
NÇ 'w +, ¶ :- º/ 3/ N² Ü 30% :C ' ö +, =N uN #- i Òh á=.
N$ Ç 9·å' GH' CÅ*(tensile strength)¾ üÛ sl(ultimate elongation)- Table 2 á=. Ð °Ô5 Ç C F0' CÅ* 116 MPa, üÛ sl2 33%
á0, N$ Ç GH' ö Ç GH'
5 ¢DE ¶ $; / 32 #- ØCh á=. A 5 S N$ Ç 'w * ¨ N.
' !" B ¶ :- º/ 32 # ìÛ¨=
[6, 9, 19].
3-4.
89d2 (* & ü Ϭ c J' ±£ & ®: 8¬Ý
= >?@ =[5]. Ð °Ô) NÇ 9·å ' 89 l- :() ü; 101 HzQ 106 Hz / $³ôÑ) ×,D Ó0 c 5; Fig. 8 á=. Ð °Ô5, Ç
C F0' ö 89l ü>Æ Ï¬ 3.1-2.9' Ê; ¸ Ó0 ×, 3.04 9PC ' - á
=[13-14]. cA N$ Ç GH' ö :! Ñi ! 5
) Ò ¾ Ç.â z.DE * ¨ N²Ü z .hñ 5 GH' 89l uND ö- iÒh á=. , ×,¨ ü >Æ) 89l F5=2.99, F10=2.68, F30=2.67 c F50=2.55 ®Ëf uN #- ØCh á=.
:! )?) 45 ¾ 89l2 N$*, 8Q¯, ¦§
' ý ./ nC äÉ :- @0 N$*¾ ¦§5 A D0 8Q¯¾ LA =[6, 8-9]. Ð °Ô) GH S N
$ Ç; ² * ¨ N Cw 8Q¯ z.D ¦§2 uNDE 5 89l uN #
ìÛ¨=. A 8 op, DSC5) Ò ¾ N$ Ç 'w º»¨ N . '
8Q¯; z.³ë 89l uN # iÒ¨=[20].
vp, 9 . B) C D@ 9 . B ÅDÉ E
¸= \ FÉ ¦§D, 9 [ B G ÛÛDÉ E
N ' ¦§2 µ=. Ù , ù$N 2 Ü- . Fig. 7. DSC diagrams of polyimide thin film.
Fig. 8. TGA thermograms of polyimide thin film.
Table 3. Thermal stability parameter of polyimide thin film
F0 F5 F10 F30 F50
IDT [oC] 555 549 550 533 395
Fig. 9. Dielectric constants of polyimide thin film.
41 4 2003 8
Ý ù$N¾ ¢h È Ä Hb IJ 10 A 8 K) 45 « N Ä 12 ¦§ È; van der
Waals C Õ µÕ/! È;=. cA, C-F Â' 9 ¦§
C-H Â ¢DE ¸= µ! È; N$ Ç
' 89l uN # ìÛ¨=[20].
4.
Ð ) ILD (interlayer dielectric) B# L F
' 89l- uN³ô! Æw N$ ÇDE GH' Ñd
& 89d- iÒDÓ=. Ð °Ô5 N$ Ç 'w =Á5 2 5; iÒ h á=.
(1) U¨ GH Æ N$ Ç; DÓ0, °Ô5 Ç.â z.hñ, Ç .âÜ z.hñ GH * ¨ N²Ü z. #- ØCh á=.
(2) ' ·!" d' ö NÇ. GH' B
äÉ :- º/ 32 #- iÒh á=. LÑ F50' ö IDT . =½ ³¦ w äÉ uNDÓ, û! w `³ (*. F30 / 530oC :) d- #- ØCh
á=.
(3) N$ ÇDE GH * ¨ N Cw ' ¦§- uN³ô 8Q¯; z.³ë 5 8 9l uN #- iÒh á=.
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