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Properties of Inductively coupled Ar/CH4 plasma based on plasma diagnostics with fluid simulation

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210 한국진공학회

PT-P018

고속 전기변색 소자의 구동 방법에 대한 연구 (Driving mechanism of high

speed electrochromic devices by using patterned array)

김태엽*, 김한나, 조성목, 아칠성, 류호준, 김주연, 김용해 자연모사I/O 인터페이스연구실, 정보통신부품소재연구소, 한국전자통신연구원 전기변색 소자는 가시광선의 투과도 조절이 가능하며 또한 메모리특성 이라는 독특한 특성 때문에 최 근 많은 연구자들이 주목하고 있다. 이러한 전기변색 소자는 전기변색 물질에 따라 스마트 윈도우, 투명 디스플레이 그리고 자동차용 룸 밀러 등 다양한 분야에 응용이 가능하다. 본 논문에서는 높은 변색 속도 와 안전성 (durability)를 가지는 전기변색 소자를 제작하였다. 제작된 소자는 4 Hz (125 ms)구동 속도에서 약 30,000 cycles 구동에도안정적으로 작동하며 투과도 변화폭은 약 50% 이다. Keywords: 고속 전기변색 소자, 스마트 원도우, 투명 디스플레이, 자동차용 룸 밀러 PT-P019

Properties of Inductively coupled Ar/CH4 plasma based

on plasma diagnostics with fluid simulation

차주홍, 손의정, 윤용수, 한문기, 김동현, 이호준 부산대학교 전기전자컴퓨터공학과

An inductively coupled plasma source was prepared for the deposition of a-C:H thin film. Properties of the inductively coupled plasma source are investigated by fluid simulation including Navier-Stokes equations and home-made tuned single Langmuir probe. Signal attenuation ratios of the Langmuir probe harmonic frequency were 13.56Mhz and 27.12Mhz. Dependencies of plasma parameters on process parameters were accord with simulation results. Ar/CH4 plasma simulation results shown that hydrocarbon radical densities have their lowest value at the vicinity of gas feeding line due to high flow velocity. For input power density of 0.07W/cm3, CH radical density qualitatively follows electron density distribution. On the other hand, central region of the chamber become deficient in CH3 radical due to high dissociation rate accompanied with high electron density. The result suggest that optimization of discharge power is important for controlling deposition film quality in high density plasma sources.

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