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Manufacturing a Single Cell Gap Transflective Liquid Crystal Display by Using Ink Jet Printing Technology

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Manufacturing a Single Cell Gap Transflective Liquid Crystal Display by Using Ink Jet Printing Technology

Y. A. Sha*, P. J. Su, C. H. Hsieh, K. H. Chang, C. H. Chen, C. C. Hsiao, J.W. Shiu, S. Y. Fuh, W. Y. Cheng, Y. C. Liao, J. C. Yang, K. L. Lo, D. W. Lee,

K. C. Lee, and Y. P. Chang

Display Technology Center, Industrial Technology Research Institute, Chutung, Hsinchu, Taiwan 310, R.O.C.

Phone: +886-3-5913761, E-mail: simmon@itri.org.tw

Abstract

A novel single cell gap transflective liquid crystal display was developed. By using the ink jet printing technology, we fabricated a transflective liquid crystal display with the hybrid alignment in the reflective region and the homogeneous alignment in the transmission region. Compared with the traditional technologies, our technology provided the advantages of easy process, high yield, fast throughput, and less material usage. We also applied this technology to the 2.4 inch prototype. This panel could be implemented in the handheld product applications.

1. Introduction

The transflective liquid crystal displays have widely applied in the handheld market which includes digital camera, cell phone, mp3 player, and so on.

Traditionally, for the consumer market, there are several models to approach a transflective liquid crystal displays with good electro-optical properties.

The first is the dual cell gap which was proposed by Sharp1. However, this technology required accurate gap control in the reflective region and the manufacturing process was complicated. The second model is the single cell gap transflective liquid crystal display with dual TFT in one pixel which was proposed by ITRI2. The reflect region and transmission region were controlled by their own TFT.

However, the total amount of TFT was double. It is not quite easy to design and manufacture the device.

The driving system would be huge than other models.

The third one is the single cell gap transflective liquid crystal display with dual mode which was also proposed by ITRI3. In this model, we used the photoalignment technology to control the alignment properties of transmission and reflective regions.

This dual mode technology provided a simple way to make a transflective liquid crystal display with good performance. However, the UV dosage of photoalignment process had to perform about 8 joule.

So, the photoalignment process might take about 15 minutes for each substrate. This would be the drawback of the manufacturing throughput.

In this paper, we combined the advantages of polyimide ink jet printing and dual mode technologies.

We tried to reduce the throughput problem of dual mode. Combining the flexo printing and ink jet printing, the first alignment layer on the whole panel was applied by using flexo printing method, and the second alignment layer pattern on the first alignment was applied by using the ink jet printing method. In addition, we also proposed a novel design of “natural bank” structure for the ink jet printing approach in the color filter or array structure.

2. Experiment

Figure 1 (a) showed the structures of our dual mode transflective liquid crystal display. On the color filter (purchased from Fuji Film) side, the 1st PI alignment layer (vertical alignment layer, v-PI) (purchased from JSR) which was printed by flexo printing provided the vertical alignment properties of liquid crystal. The 2nd PI alignment layer (homogeneous alignment layer, h-PI) (purchased from Nissan Chemical) which was printed by ink jet printing provided the homogeneous alignment properties of liquid crystal.

The 3rd PI alignment layer which was made by flexo printing provided the same alignment properties as the 2nd PI. After the printing and baking process, both substrates were treated by usual rubbing process. In Figure 1(b), we also designed a similar structure on the TFT side. The gap between reflective region and

IMID/IDMC '06 DIGEST • 1533 37-4 / Y. A. Sha

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transmission region was a good natural bank structure too.

Substrate Over coat

Color Filter ITO

Substrate

2nd PI 1st PI

3rd PI Reflector

natural bank

Array

(a)

Substrate Over coat

Color Filter ITO

Substrate 1st PI

3rd PI 2nd PI

natural bank

Reflector Array

(b)

Figure 1. The side view of dual mode transflective liquid crystal display, structure designed on (a) color filter side and (b) TFT side.

3. Results

The height of over coat is 1ȝm which could be made by transparent positive photoresist (PC403, purchased from JSR) or negative photoresist (TG6102, purchased from TopGiga Material). Based on the over coat structure, the thickness of color filter was 0.75ȝm in the reflective area and 1ȝm in the transmissive area. The thinner color filter structure would provide the advantage of higher transmittance of environment light and good reflectance in reflective region. Furthermore, this over coat not only applied to improve image quality but also provided a gap between the reflective area and transmissive area.

The gap was about 0.7~0.8ȝm. This thickness difference would also provide a “natural bank”

structure for PI ink jet printing.

PI alignment film printing on the whole substrate by using ink jet printing technology has been studied by several liquid crystal display makers for several years4. For optimized PI film printing quality, jet ability of PI material (solid content: 2%~4%, surface

tension: 30~38 mN/m, viscosity: 7.0~12.0 cp) and surface status of substrate (contact angle< 5o, between PI ink/ substrate) become the main issues5, 6.

In this topic, the main issues were different from the whole substrate PI printing. Based on the optical design of transflective liquid crystal display, pattern proper PI material in the correct position was quite important. Similar to the PLED and CF ink jet printing technology, bank structures, ink properties, and surface treatment would be mainly concerned7. The bank structure was used to define the region for jetting. As described in the prior section of display structure, the natural bank structure was formed by the over coat or reflector structure. For the concern of ink jet ability, the PI material was diluted by r- butyrolactone (r-BL). Driving voltage was about 40 volt. The temperature of print head was controlled under 35oC. The thermal controlling system would improve the reliability of jetting. Sometimes, the jet ability would change due to the fluid property of ink change under different temperatures. This system was necessary because it provided the benefit to avoid the ambient temperature variation. The ink jet frequency of this ink could achieve over 2 kHz. The ink jet velocity was about 4 meter/sec, and the drop size of each drop was around 18~20 pL.

For the requirement of landing accuracy of ink drops, the surface properties had to be controlled. For the case of PLED and CF ink jet printing technology, the substrate had to be treated by CF4/ O2 plasma.

And the contact angle between ink and substrate had to be larger than ~30o. In our case, the surface treatment process was eliminated depending on the surface tension difference between homogeneous and vertical alignment PI materials. The surface tension of homogeneous alignment layer was about 35 dyne/cm and vertical alignment layer was about 43 dyne/cm. Depending on the surface tension difference between h-PI and v-PI, the control of landing accuracy became easy. Table 1 shows the contact angle between the PI ink and substrate. The h-PI ink and pure r-butyrolactone on v-PI film presented large contact angle. These contact angles were around 40o. According to these data, the surface properties between the PI ink and substrate were suitable for PI patterning. Furthermore, the contact angle between ink and substrate could be modified by adjusting the solvent system of PI materials.

1534 • IMID/IDMC '06 DIGEST 37-4 / Y. A. Sha

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Table 1. The contact angle between the PI ink and substrate Contact angle (degree)

PI Solvent Wt % of

h-PI Ink on baked v-PI

h-PI - 100% 37

- r-BL 0% 46

h-PI r-BL 33% 43

h-PI r-BL 25% 44

The h-PI ink jetted on v-PI alignment layer with nature bank structure was shown in Figure 2. For this nature bank structure, the line width was 50ȝm and the line space was 100ȝm. After jetting process, the v-PI was filled into nature bank structure. The overflow problem was also been observed. This problem would be solved by the modification of ink material. Figure 2 presented the observation of jetted PI after drying process which showed the good flatness of the alignment layer. And the residual ink material on the top of nature bank structure was slid down to the bottom area due to the surface energy difference between the ink (2nd PI/ h-PI) and the v-PI alignment layer.

The photograph of our 2.4 inch LCD prototype by using ink jet printing technology was presented in Figure 3. The white straight line was the defect of the liquid crystal alignment problem. Because the nozzles stopped jetting during the process, several pixels were not filled with 2nd PI. Changing the printing recipe of the jetting process might be helpful to overcome this issue.

The detailed specification of this panel was listed in Table 2. The design of this panel meets the requirement of cell phone and digital camera applications.

(a)

(b)

Figure 2. The jetted h-PI ink on v-PI (a) before and (b) after drying process.

Figure 3. The prototype of 2.4 inch transflective LCD.

4. Conclusion

Based on the general concept of transflective liquid crystal display with combining the advantages of dual mode and ink jet printing technologies, a novel method, structure, and process were developed. By using the natural bank structure, and PI film as treatment layer, the basic requirement of traditional ink jet printing technology of extra photolithography

IMID/IDMC '06 DIGEST • 1535 37-4 / Y. A. Sha

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process and surface modified process were not necessary. In addition, the advantages of high throughput and less material usage were also provided.

Table 2. The specification of the 2.4 inch transflective LCD

Size 2.4 inch

Type Transflective, single cell gap Resolution QVGA(320 x RGBx 240) Back plane LTPS TFT

Pixel size 150ȝm x 150ȝm

Color 8 bit

T : R ratio 1 : 2 Cell gap 3.9ȝm 5. Acknowledgements

The authors would like to thank Fuji Film, JSR, Nissan Chemical, and TopGiga Material for materials

providing. And the authors would also like to thank Nitto Denko for optical films providing.

6. References

[1] M. Kubo, Y. Narutaki, A. Ban, and et.al., US6195140, 2001

[2] C. Y. Chen and Y. R. Shen, US6806929, 2004 [3] Y. Y. Fan, H. C. Chiang, T. Y. Ho, and et. al.,

SID ’04, p. 647, 2004.

[4] F. L. Hsu, K. H. Chen, P. Y. Liu, and et. al., IDW ’05, p. 303, 2005.

[5] N. Teruyuki, O. Yasuhiro, and N. Hideyuki, JP 2001042330, 2001.

[6] A. Takeshi, T. Hitoshi, H. Makoto, and et. al., JP09105937, 1997

[7] I. Yudasaka, US6755983, 2004

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