Fig. 1. J. H. Han and C. G. Kim
UV Lamp
Quartz
Copper plate
Halogen Lamp
Main Vacuum Chamber specimen
Plasma Chamber
Mass Flow Controller RF Power Supply
Ar O2
Orifice
Heating coil
Refrigerator
0 20 40 60 80 100 120 -80
-60 -40 -20 0 20 40 60 80 100 120
Temperature(o C)
Time(min)
upper side lower side
Fig. 2. J. H. Han and C. G. Kim
2mm, 61 1mm, 154 1mm, 119 1mm, 69 0.7mm, 69 0.002
0.004 0.006 0.008 0.010 0.012 0.014 0.016 0.018 0.020 0.022 0.024
plasma chamber main chamber
Orifice Size
Plasma chamber pressure (Torr)
1.0x10-5 1.5x10-5 2.0x10-5 2.5x10-5 3.0x10-5 3.5x10-5
Main chamber pressure (Torr)
Fig. 3. J. H. Han and C. G. Kim
100 150 200 250 300 350 400 0.0
2.0x1013 4.0x1013 6.0x1013 8.0x1013 1.0x1014
Neutral density (/cm3 )
RF power (Watt)
O2 O O3 O2* O*
Ar Ar*
Fig. 4. J. H. Han and C. G. Kim
Orifice
Sample
Orifice diamete r AO beam
diameter on sample
Distance between orifice and sample
α
α = divergence angle
Fig. 5. J. H. Han and C. G. Kim
55mm
Fig. 6. J. H. Han and C. G. Kim
AO exposure synergistic LEO exposure 0.0
0.2 0.4 0.6 0.8 1.0 1.2 1.4 1.6
TML (%)
Fig. 7. J. H. Han and C. G. Kim
baseline (unexposed) AO exposure synergistic LEO exposure 0
500 2500 3000
Tensile strength (MPa)
Fig. 8. J. H. Han and C. G. Kim
baseline (unexposed) AO exposure synergistic LEO exposure 0
20 40 60 80 100 120 140 160
Tensile stiffness (GPa)
Fig. 9. J. H. Han and C. G. Kim
(a) graphite/epoxy composite specimen unexposed
(b) graphite/epoxy composite specimen exposed to AO
(c) graphite/epoxy composite specimen exposed to the synergistic LEO environment
Fig. 10. J. H. Han and C. G. Kim
